Search Results - "Ko, Changhee"

Deposition of SiOC by plasma-free ultra-low-temperature ALD (ULT-ALD) and its passivation on p-type silicon by Meixi Chen, Noda, Naoto, Rochat, Raphael, Iyer, Abhishek, Hack, James H., Changhee Ko, Dussarrat, Christian, Opila, Robert L.

“…SiOC thin films have been successfully deposited using carbosilane compounds with ultra-low-temperature ALD (ULT-ALD) around 50°C to 70°C. This plasma-free…”
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Polymer characterization by temperature gradient interaction chromatography by Chang, Taihyun, Lee, Hee Cheong, Lee, Wonmok, Park, Soojin, Ko, Changhee

“…Thermodynamic principles and some applications of the temperature gradient interaction chromatography (TGIC) recently developed for the characterization of…”
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Pure Co films of low resistivity and high conformality by low temperature thermal CVD/ALD using novel Co precursors by Rochat, Raphael, Oschchepkov, Ivan, Changhee Ko

“…A new family of highly volatile alkylsilyl-functionality Co precursors, R 3 SiCo(CO) 4 , has been synthesized. One of them, Et 3 SiCo(CO) 4 , has been…”
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Substrate Dependent Growth Behaviors of Plasma-Enhanced Atomic Layer Deposited Nickel Oxide Films for Resistive Switching Application by Song, Seul Ji, Lee, Sang Woon, Kim, Gun Hwan, Seok, Jun Yeong, Yoon, Kyung Jean, Yoon, Jung Ho, Hwang, Cheol Seong, Gatineau, Julien, Ko, Changhee

“…In this study, NiO thin films were deposited via a plasma-enhanced atomic layer deposition (PEALD) on metal (Pt, Ru, and W) substrates using a…”
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Growth of Conductive SrRuO3 Films by Combining Atomic Layer Deposited SrO and Chemical Vapor Deposited RuO2 Layers by Han, Jeong Hwan, Lee, Woongkyu, Jeon, Woojin, Lee, Sang Woon, Hwang, Cheol Seong, Ko, Changhee, Gatineau, Julien

“…SrRuO3 (SRO) film was deposited by sequential executions of atomic layer deposition of SrO and chemical vapor deposition of RuO2 layers at a low growth…”
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Synthesis and PEALD evaluation of new Nickel precursors by Gatineau, Satoko, Changhee Ko, Gatineau, Julien, Lansalot-Matras, Clement, Chang-Fang Hsiao

“…A new family of oxygen and fluorine free Nickel (Ni) precursors, which are based on allyl and alkylpyrrolylimine ligands [Ni(allyl)(PCAI-R)], has been…”
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Growth of Conductive SrRuO 3 Films by Combining Atomic Layer Deposited SrO and Chemical Vapor Deposited RuO 2 Layers by Han, Jeong Hwan, Lee, Woongkyu, Jeon, Woojin, Lee, Sang Woon, Hwang, Cheol Seong, Ko, Changhee, Gatineau, Julien

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Characterization of polydisperse poly(vinyl chloride) by temperature gradient interaction chromatography by Park, Soojin, Ko, Changhee, Choi, Heungyeal, Kwon, Kyoon, Chang, Taihyun

“…Temperature gradient interaction chromatography (TGIC) was employed to fractionate a commodity polymer, poly(vinyl chloride) (PVC) with wide molecular weight…”
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Efficient flexible devices using a statistical copolymer of oxadiazole containing PPV by Christian-Pandya, Hermona K., Vaidyanathan, Subramanian, Ko, Changhee, Beyer, Frederick L., Galvin, Mary E.

“…Flexible light-emitting diodes, with simple device architectures, fabricated using a random copolymer of hole transporting dialkoxy-substituted…”
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Thin nickel films growth using plasma enhanced atomic layer deposition from η3-2-methylallyl N, N'-diisopropylacetamidinate nickel(II) by Yokota, Jiro, Lansalot, Clement, Changhee Ko

“…Plasma enhanced atomic layer deposition (PEALD) using the novel η 3 -2-methylallyl N,N'-diisopropylacetamidinate nickel(II) precursor has been investigated. NH…”
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