Search Results - "Knopfmacher, O."

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  1. 1

    Nernst Limit in Dual-Gated Si-Nanowire FET Sensors by Knopfmacher, O, Tarasov, A, Fu, Wangyang, Wipf, M, Niesen, B, Calame, M, Schönenberger, C

    Published in Nano letters (09-06-2010)
    “…Field effect transistors (FETs) are widely used for the label-free detection of analytes in chemical and biological experiments. Here we demonstrate that the…”
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    Journal Article
  2. 2

    Signal-to-noise ratio in dual-gated silicon nanoribbon field-effect sensors by Tarasov, A., Fu, W., Knopfmacher, O., Brunner, J., Calame, M., Schönenberger, C.

    Published in Applied physics letters (03-01-2011)
    “…Recent studies on nanoscale field-effect sensors reveal the crucial importance of the low-frequency noise for determining the ultimate detection limit. In this…”
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    Journal Article
  3. 3

    True Reference Nanosensor Realized with Silicon Nanowires by Tarasov, A, Wipf, M, Bedner, K, Kurz, J, Fu, W, Guzenko, V. A, Knopfmacher, O, Stoop, R. L, Calame, M, Schönenberger, C

    Published in Langmuir (26-06-2012)
    “…Conventional gate oxide layers (e.g., SiO2, Al2O3, or HfO2) in silicon field-effect transistors (FETs) provide highly active surfaces, which can be exploited…”
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    Journal Article
  4. 4

    Signal-to-noise ratio in dual-gated silicon nanoribbon field-effect sensors by Tarasov, A, Fu, W, Knopfmacher, O, Brunner, J, Calame, M, Schönenberger, C

    Published 06-01-2011
    “…Appl. Phys. Lett. 98, 012114 (2011) Recent studies on nanoscale field-effect sensors reveal the crucial importance of the low frequency noise for determining…”
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    Journal Article
  5. 5

    Sensing with liquid-gated graphene field-effect transistors by Wangyang Fu, Nef, C., Tarasov, A., Wipf, M., Stoop, R., Knopfmacher, O., Weiss, M., Calame, M., Schonenberger, C.

    “…Liquid-gated graphene field-effect transistors (GFETs) with reliable performance are developed. It is revealed that ideal defect-free graphene should be inert…”
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    Conference Proceeding