Search Results - "Knoops, H. C. M"

Corrigendum #2 to “Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells” by Creatore, M., Schropp, R. E. I., Bakker, Klaas, Kniknie, B. J., Knoops, H. C. M., Mittal, A., Williams, B. L., Sharma, K., Kessels, W. M. M.

“…In the article titled “Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells” [1], there was an error in the references…”
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Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells by Creatore, M., Schropp, R. E. I., Bakker, Klaas, Kniknie, B. J., Knoops, H. C. M., Mittal, A., Williams, B. L., Sharma, K., Kessels, W. M. M.

“…Aluminium-doped zinc oxide (ZnO:Al) grown by expanding thermal plasma chemical vapour deposition (ETP-CVD) has demonstrated excellent electrical and optical…”
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Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate by Arts, K., Deijkers, J. H., Faraz, T., Puurunen, R. L., Kessels, W. M. M. (Erwin), Knoops, H. C. M.

“…This work provides evidence that plasma-assisted atomic layer deposition (ALD) of SiO2, a widely applied process and a cornerstone in self-aligned multiple…”
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Enhanced Doping Efficiency of Al-Doped ZnO by Atomic Layer Deposition Using Dimethylaluminum Isopropoxide as an Alternative Aluminum Precursor by Wu, Y, Potts, S. E, Hermkens, P. M, Knoops, H. C. M, Roozeboom, F, Kessels, W. M. M

“…Atomic layer deposition offers the unique opportunity to control, at the atomic level, the 3D distribution of dopants in highly uniform and conformal thin…”
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Corrigendum to “Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells” by Creatore, M., Schropp, R. E. I., Bakker, Klaas, Kniknie, B. J., Knoops, H. C. M., Mittal, A., Williams, B. L., Sharma, K., Kessels, W. M. M.

“…In the paper titled “Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells,” in the third paragraph in Experimental, some…”
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Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy by Kessels, W. M. M., Knoops, H. C. M., Dielissen, S. A. F., Mackus, A. J. M., van de Sanden, M. C. M.

“…Infrared spectroscopy was used to obtain absolute number information on the reaction products during atomic layer deposition of Pt from…”
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Co3O4 as anode material for thin film micro-batteries prepared by remote plasma atomic layer deposition by DONDERS, M. E, KNOOPS, H. C. M, KESSELS, W. M. M, NOTTEN, P. H. L

“…Cobalt oxide thin films have been deposited with remote plasma atomic layer deposition (ALD) within a wide temperature window (100-400 degree C), using CoCp2…”
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Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes by Mackus, A. J. M., Heil, S. B. S., Langereis, E., Knoops, H. C. M., van de Sanden, M. C. M., Kessels, W. M. M.

“…In this note it is demonstrated that optical emission spectroscopy (OES) is an easy-to-implement and valuable tool to study, optimize, and monitor thin film…”
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Atomic layer deposition for nanostructured Li-ion batteries by Knoops, H. C. M., Donders, M. E., van de Sanden, M. C. M., Notten, P. H. L., Kessels, W. M. M.

“…Nanostructuring is targeted as a solution to achieve the improvements required for implementing Li-ion batteries in a wide range of applications. These…”
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Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma by Vos, M. F. J., Knoops, H. C. M., Synowicki, R. A., Kessels, W. M. M., Mackus, A. J. M.

“…Metal fluorides typically have a low refractive index and a very high transparency and find many applications in optical and optoelectronic devices. Nearly…”
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“Zero-charge” SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition by van de Loo, B.W.H., Knoops, H.C.M., Dingemans, G., Janssen, G.J.M., Lamers, M.W.P.E., Romijn, I.G., Weeber, A.W., Kessels, W.M.M.

“…To achieve high conversion efficiencies, advanced silicon solar cell architectures such as interdigitated back contact solar cells demand that defects at both…”
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Reaction mechanisms of atomic layer deposition of TaN x from Ta(NMe 2 ) 5 precursor and H 2 -based plasmas by Knoops, H. C. M., Langereis, E., van de Sanden, M. C. M., Kessels, W. M. M.

“…The reaction mechanisms of plasma-assisted atomic layer deposition (ALD) of TaN x using Ta(NMe 2 ) 5 were studied using quadrupole mass spectrometry (QMS). The…”
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Reaction mechanisms of atomic layer deposition of TaN x from Ta(NMe2)5 precursor and H2-based plasmas by Knoops, H. C. M., Langereis, E., van de Sanden, M. C. M., Kessels, W. M. M.

“…The reaction mechanisms of plasma-assisted atomic layer deposition (ALD) of TaNx using Ta(NMe2)5 were studied using quadrupole mass spectrometry (QMS). The…”
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Surface reactions during atomic layer deposition of Pt derivedfrom gas phase infrared spectroscopy by Kessels, W. M. M., Knoops, H. C. M., Dielissen, S. A. F., Mackus, A. J. M., van de Sanden, M. C. M.

“…Infrared spectroscopy was used to obtain absolute number information on the reaction products during atomic layer deposition of Pt from…”
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Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating by Saadaoui, M., van Zeijl, H., Wien, W. H. A., Pham, H. T. M., Kwakernaak, C., Knoops, H. C. M., Erwin Kessels, Wilhelmus M. M., van de Sanden, R. M. C. M., Voogt, F. C., Roozeboom, F., Sarro, P. M.

“…One of the critical steps toward producing void-free and uniform bottom-up copper electroplating in high aspect-ratio (AR) through-silicon vias (TSVs) is the…”
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