Search Results - "Klimov, A.Yu"

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  1. 1

    Microwave Cooled Microbolometers Based on Cermet Si–Cr Films by Vdovichev, S. N., Vdovin, V. F., Klimov, A. Yu, Mukhin, A. S., Nozdrin, Yu. N., Rogov, V. V., Udalov, O. G.

    “…We present the results of creating a cooled microbolometer based on the cermet films of the silicon and chromium mixture. This material is used for…”
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    Journal Article
  2. 2

    Influence of the microcrystalline structure on the magnetic properties of ferromagnetic films and structures on their base by Gusev, S. A., Tatarskiy, D. A., Klimov, A. Yu, Rogov, V. V., Skorokhodov, E. V., Sapozhnikov, M. V., Gribkov, B. A., Nefedov, I. M., Fraerman, A. A.

    Published in Physics of the solid state (01-03-2013)
    “…This paper presents the results of investigating the crystal structure of thin films of the Co 40 Fe 60 composition obtained by magnetron sputtering on their…”
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    Journal Article
  3. 3

    Control of the magnetic state of arrays of ferromagnetic nanoparticles with the aid of the inhomogeneous field of a magnetic-force-microscope probe by Mironov, V. L., Fraerman, A. A., Gribkov, B. A., Ermolayeva, O. L., Klimov, A. Yu, Gusev, S. A., Nefedov, I. M., Shereshevskii, I. A.

    Published in Physics of metals and metallography (01-12-2010)
    “…The work presents a survey of the results of studies of the processes of magnetization reversal of ferromagnetic nanoparticles under the action of the field of…”
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    Journal Article
  4. 4

    Near-field optical lithography method for fabrication of the nanodimensional objects by Dryakhlushin, V.F., Klimov, A.Yu, Rogov, V.V., Vostokov, N.V.

    Published in Applied surface science (30-07-2005)
    “…A new method of contact scanning near-field optical lithography has been developed to enable fabrication of elements with characteristic dimensions of 30–50…”
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    Journal Article
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    High-sensitivity accelerometer based on cold emission principle by Shashkin, V.I., Vostokov, N.V., Vopilkin, E.A., Klimov, A.Yu, Volgunov, D.G., Rogov, V.V., Lazarev, S.G.

    Published in IEEE sensors journal (01-04-2004)
    “…A possibility for fabrication of a high-sensitivity accelerometer is considered. The linear acceleration of a sensor causes displacement of the proof mass…”
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    Journal Article
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    Probes for a scanning near-field optical microscope on the base single-mode fiber by Dryakhlushin, V.F., Klimov, A.Yu, Rogov, V.V.

    “…Probes for a scanning near-field optical microscope on the base a single-mode adiabatically tapered optical fiber have been fabricated by the chemical etching…”
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    Conference Proceeding
  10. 10

    Method of the near-field optical nanolithography using tapered optical fiber by Dryakhlushin, V.F., Klimov, A.Yu, Rogov, V.V., Vostokov, N.V.

    “…A method of contact scanning near-field optical lithography has been developed to enable fabrication of elements with characteristic dimensions of about 30 -…”
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    Conference Proceeding
  11. 11

    Method of scanning near-field optical lithography by Dryakhlushin, V.F., Vostokov, N.V., Klimov, A.Yu, Rogov, V.V., Shashkin, V.I.

    “…A contact scanning near-field optical lithography method has been developed to enable fabrication of different nanoelements; (metal, dielectric, etched in…”
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    Conference Proceeding
  12. 12

    Investigation of nanocontact electron properties to the semiconductor islands by Vostokov, N.V., Dryakhlushin, V.F., Klimov, A.Yu, Novikov, A.V., Khrykin, O.I., Shashkin, V.I.

    “…Distribution of charge in semiconductor islands of InAs on GaAs surface and Ge/sub x/Si/sub 1-x/ on Si surface are investigated by atomic-force microscopy…”
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    Conference Proceeding
  13. 13

    Fabrication of nanodimensional objects by atomic-force lithography methods by Vostokov, N.V., Volgunov, D.G., Dryakhlushin, V.F., Klimov, A.Yu, Rogov, V.V., Sukhodoev, L.V., Shashkin, V.I.

    “…An atomic-force lithography method yielding individual elements of <100 nm size has been developed. It involves deformation of the masking layer with an…”
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    Conference Proceeding
  14. 14

    Development of back-to-back connected edge diodes for THz multipliers by Shashkin, V.I., Vaks, V.L., Vopilkin, E.A., Daniltsev, V.M., Klimov, A.Yu, Kuznetsov, M.I., Murel, A.V., Rogov, V.V., Khrykin, O.I.

    “…A technology for fabrication of back-to-back connected diodes with edge (nonplanar) Schottky contacts to epitaxial layer (or heterolayers) on semi-insulating…”
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    Conference Proceeding