Search Results - "Klejna, Sylwia"

Halogen-containing semiconductors: From artificial photosynthesis to unconventional computing by Klejna, Sylwia, Mazur, Tomasz, Wlaźlak, Ewelina, Zawal, Piotr, Soo, Han Sen, Szaciłowski, Konrad

“…•Iodide-containing semiconductors are core materials in biomimetic research.•Artificial photosynthesis and unconventional computing require tailorable…”
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Synthesis and characterisation of new silicon-perfluoropropenyl compounds by Alluhaibi, Lulu, Brisdon, Alan, Klejna, Sylwia, Muneer, Abeer

“…Novel, stable silicon-pentafluoropropane compounds have been synthesised from the direct reaction of hydrofluorocarbons Z -CFH&z.dbd;CFCF 3 ( Z -HFC-1225ye)…”
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Role of the Oxidizing Co-Reactant in Pt Growth by Atomic Layer Deposition Using MeCpPtMe3 and O2/O3/O2‑Plasma by Li, Jin, Klejna, Sylwia, Minjauw, Matthias M., Dendooven, Jolien, Detavernier, Christophe

“…Atomic layer deposition (ALD) of Pt using MeCpPtMe3 and the O2/O3/O2-plasma (O2*) at 300 °C is investigated with in vacuo X-ray photoelectron spectroscopy…”
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Role of the Oxidizing Co-Reactant in Pt Growth by Atomic Layer Deposition Using MeCpPtMe 3 and O 2 /O 3 /O 2 -Plasma by Li, Jin, Klejna, Sylwia, Minjauw, Matthias M., Dendooven, Jolien, Detavernier, Christophe

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First-Principles Modeling of the “Clean-Up” of Native Oxides during Atomic Layer Deposition onto III–V Substrates by Klejna, Sylwia, Elliott, Simon D

“…The use of III–V materials as the channel in future transistor devices is dependent on removing the deleterious native oxides from their surface before…”
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Decomposition of Metal Alkylamides, Alkyls, and Halides at Reducible Oxide Surfaces: Mechanism of ‘Clean-up’ During Atomic Layer Deposition of Dielectrics onto III–V Substrates by Klejna, Sylwia, Elliott, Simon D

“…The pairing of high-k dielectric materials with high electron mobility semiconductors for transistors is facilitated when atomic layer deposition (ALD) is used…”
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Reversible Cation‐Mediated Anionic Redox in Defect Spinel Structure for High Power Batteries by Bakierska, Monika, Chudzik, Krystian, Świętosławski, Michał, Klejna, Sylwia, Kubicka, Marcelina, Marciszko‐Wiąckowska, Marianna, Gajewska, Marta, Walas, Stanisław, Molenda, Marcin

“…With ever‐increasing energy demand, more efforts are dedicated to designing innovative electrode materials providing higher storage capability and power…”
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Triiodide Organic Salts: Photoelectrochemistry at the Border between Insulators and Semiconductors by Wlaźlak, Ewelina, Kalinowska‐Tłuścik, Justyna, Nitek, Wojciech, Klejna, Sylwia, Mech, Krzysztof, Macyk, Wojciech, Szaciłowski, Konrad

“…The intriguing properties of triiodide organic salts ([(C6H5)3AsO]2H+I3−, (C6H5CH2)3NH+I3− ⋅C6H5CH3, and [(C6H5CH2)3NO]2H+I3−) have been analyzed in detail…”
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Mechanisms for Substrate-Enhanced Growth during the Early Stages of Atomic Layer Deposition of Alumina onto Silicon Nitride Surfaces by Lamagna, Luca, Wiemer, Claudia, Perego, Michele, Spiga, Sabina, Rodríguez, Jesús, Santiago Coll, David, Grillo, Maria Elena, Klejna, Sylwia, Elliott, Simon D

“…The atomic layer deposition (ALD) of aluminum oxide (Al2O3) from trimethylaluminium and water on silicon nitride was studied on as-received and HF-cleaned…”
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First principles modelling of nucleation and growth during atomic layer deposition onto III-V substrates by Klejna, Sylwia

“…Atomic layer deposition (ALD) is now used in semiconductor fabrication lines to deposit nanometre-thin oxide films, and has thus enabled the introduction of…”
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