Search Results - "Kishino, Seigô"

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  1. 1

    Barrier height of InP Schottky diodes prepared by means of UV oxidation by NAKAMURA, J, NIU, H, KISHINO, S

    Published in Japanese Journal of Applied Physics (01-02-1993)
    “…Schottky diodes of Au/oxide/InP are fabricated by means of UV oxidation and evaluated by means of current-voltage ( I-V ) and capacitance-voltage ( C-V )…”
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    Journal Article
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    ICTS of MOS interface states enhanced by gold diffusion by YOSHIDA, H, NIU, H, KISHINO, S

    Published in Japanese Journal of Applied Physics (01-07-1991)
    “…An enhancement of interface states of Si MOS diode by gold diffusion is observed by the isothermal capacitance transient spectroscopy (ICTS) measurement. The…”
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  3. 3

    Precise angle and position detection utilizing optical interference on metal-oxide-semiconductor-type position-sensitive detectors by NIU, H, SHIRAISHI, T, YOSHIDA, H, MATSUDA, T, KISHINO, S

    “…The optical interference effect is applied to the previously presented metal-oxide-semiconductor (MOS)-type position-sensitive detector (PSD) to achieve more…”
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    Chemical Composition of Al 2 O 3 /InP Metal-Insulator-Semiconductor Interfaces Improved by Plasma and Ultraviolet Oxidation by Matsuda, Tetsuro, Yoshida, Haruhiko, Nara, Naoki, Hirohiko Niu, Hirohiko Niu, Seigô Kishino, Seigô Kishino

    Published in Japanese Journal of Applied Physics (01-10-1994)
    “…Plasma and ultraviolet (UV) oxidation are used to obtain insulating films for the fabrication of an InP metal-insulator-semiconductor diode. A thin Al film is…”
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  5. 5

    MOS-type one-dimensional position-sensitive detectors with a linearly detectable face of 30 mm long by MATSUBARA, Y, KODAI, T, YOSHIDA, H, NIU, H, MATSUDA, T, KISHINO, S

    Published in Japanese Journal of Applied Physics (01-04-1991)
    “…Experiments have been conducted for the MOS-type position-sensitive detector (PSD) to make one-dimensional PSDs of large detection range, based on the previous…”
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    Thermally Induced Microdefects in Czochralski-Grown Silicon: Nucleation and Growth Behavior by Kishino, Seigô, Matsushita, Yoshiaki, Kanamori, Masaru, Iizuka, Takashi

    Published in Japanese Journal of Applied Physics (01-01-1982)
    “…The current understanding of thermally induced microdefects in Czochralski-grown silicon crystals is briefly reviewed and our investigations of the defects are…”
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  7. 7

    Anomalous Transmission in Bragg-Case Diffraction of X-Rays by Kishino, Seigô

    Published in Journal of the Physical Society of Japan (01-01-1971)
    “…Anomalous enhancement of a transmitted X-ray beam in Bragg-case diffraction is studied experimentally for the case that the direction of the diffracted beam…”
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    Carbon and oxygen role for thermally induced microdefect formation in silicon crystals by Kishino, Seigô, Matsushita, Yoshiaki, Kanamori, Masaru

    Published in Applied physics letters (01-08-1979)
    “…Thermally induced microdefect formation phenomena are investigated in connection with oxygen and carbon in silicon crystals by using x-ray diffraction,…”
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    An MOS-type two-dimensional PSD using the AC photovoltage phase by NIU, H, MAEDA, M, MATSUBARA, Y, YOSHIDA, H, MATSUDA, T, KISHINO, S

    Published in Japanese Journal of Applied Physics (01-11-1989)
    “…A simulation and experiments have been conducted to develop a two-dimensional position-sensitive detector (PSD) from the previously presented MOS-type PSD. The…”
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    Suppression of oxidation-stacking-fault generation by preannealing in N2 atmosphere by Kishino, Seigô, Isomae, Seiichi, Tamura, Masao, Maki, Michiyoshi

    Published in Applied physics letters (01-01-1978)
    “…Suppression of oxidation-stacking-fault (OSF) generation is studied by x-ray section topography, etching technique, and transmission electron microscopy (TEM)…”
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    Heavy Metal Gettering by an Intrinsic Gettering Technique Using Microdefects in Czochralski-Grown Silicon Wafers by Kishino, Seigô, Nagasawa, Kazutoshi, Iizuka, Takashi

    Published in Japanese Journal of Applied Physics (01-01-1980)
    “…The ability of an intrinsic gettering (IG) using microdefects in Czochralski silicon wafers is verified on copper diffused wafers with the help of a neutron…”
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  15. 15

    Theoretical Considerations on Bragg-case Diffraction of X-rays at a Small Glancing Angle by Kishino, Seigô, Kohra, Kazutake

    Published in Japanese Journal of Applied Physics (01-01-1971)
    “…X-ray diffraction phenomenon, for which the glancing angle of the incident beam is so small that the effect of specular reflection can not be neglected, is…”
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    A New Technique of X-Ray Diffraction Microscopy of Scanning Type by Kishino, Seigô, Sugita, Yoshimitsu, Kohra, Kazutake

    Published in Japanese Journal of Applied Physics (01-01-1967)
    “…A new technique of the scanning method is proposed for obtaining an undistorted image in the X-ray diffraction microscopy, where, in contrast to the usual Lang…”
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    Shapiro-like steps from a weakly coupled junction prepared with high- T c superconducting materials by Kishino, Seigô, Kuroda, Hideaki, Shibutani, Tuneo, Niu, Hirohiko

    Published in Applied physics letters (08-08-1994)
    “…A trilayer junction composed of YBa2Cu3Oy/La0.7Ca0.3MnOz/YBa2Cu3Oy is prepared and the current-voltage (I-V) characteristics are examined with and without…”
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