Search Results - "Kishino, Seigô"
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Barrier height of InP Schottky diodes prepared by means of UV oxidation
Published in Japanese Journal of Applied Physics (01-02-1993)“…Schottky diodes of Au/oxide/InP are fabricated by means of UV oxidation and evaluated by means of current-voltage ( I-V ) and capacitance-voltage ( C-V )…”
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ICTS of MOS interface states enhanced by gold diffusion
Published in Japanese Journal of Applied Physics (01-07-1991)“…An enhancement of interface states of Si MOS diode by gold diffusion is observed by the isothermal capacitance transient spectroscopy (ICTS) measurement. The…”
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Precise angle and position detection utilizing optical interference on metal-oxide-semiconductor-type position-sensitive detectors
Published in Japanese Journal of Applied Physics (1995)“…The optical interference effect is applied to the previously presented metal-oxide-semiconductor (MOS)-type position-sensitive detector (PSD) to achieve more…”
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Chemical Composition of Al 2 O 3 /InP Metal-Insulator-Semiconductor Interfaces Improved by Plasma and Ultraviolet Oxidation
Published in Japanese Journal of Applied Physics (01-10-1994)“…Plasma and ultraviolet (UV) oxidation are used to obtain insulating films for the fabrication of an InP metal-insulator-semiconductor diode. A thin Al film is…”
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5
MOS-type one-dimensional position-sensitive detectors with a linearly detectable face of 30 mm long
Published in Japanese Journal of Applied Physics (01-04-1991)“…Experiments have been conducted for the MOS-type position-sensitive detector (PSD) to make one-dimensional PSDs of large detection range, based on the previous…”
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Thermally Induced Microdefects in Czochralski-Grown Silicon: Nucleation and Growth Behavior
Published in Japanese Journal of Applied Physics (01-01-1982)“…The current understanding of thermally induced microdefects in Czochralski-grown silicon crystals is briefly reviewed and our investigations of the defects are…”
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Anomalous Transmission in Bragg-Case Diffraction of X-Rays
Published in Journal of the Physical Society of Japan (01-01-1971)“…Anomalous enhancement of a transmitted X-ray beam in Bragg-case diffraction is studied experimentally for the case that the direction of the diffracted beam…”
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Carbon and oxygen role for thermally induced microdefect formation in silicon crystals
Published in Applied physics letters (01-08-1979)“…Thermally induced microdefect formation phenomena are investigated in connection with oxygen and carbon in silicon crystals by using x-ray diffraction,…”
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Enhanced Sensitivity of Anomalously Transmitted Intensity to Lattice Defects in Asymmetric Bragg-Case Diffraction of X-Rays
Published in Japanese Journal of Applied Physics (01-01-1974)Get full text
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10
An MOS-type two-dimensional PSD using the AC photovoltage phase
Published in Japanese Journal of Applied Physics (01-11-1989)“…A simulation and experiments have been conducted to develop a two-dimensional position-sensitive detector (PSD) from the previously presented MOS-type PSD. The…”
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Suppression of oxidation-stacking-fault generation by preannealing in N2 atmosphere
Published in Applied physics letters (01-01-1978)“…Suppression of oxidation-stacking-fault (OSF) generation is studied by x-ray section topography, etching technique, and transmission electron microscopy (TEM)…”
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Determination of the Mole Fraction of GaP in GaAsP Single Crystal by A New X-Ray Diffraction Technique
Published in Japanese Journal of Applied Physics (01-01-1971)Get full text
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14
Heavy Metal Gettering by an Intrinsic Gettering Technique Using Microdefects in Czochralski-Grown Silicon Wafers
Published in Japanese Journal of Applied Physics (01-01-1980)“…The ability of an intrinsic gettering (IG) using microdefects in Czochralski silicon wafers is verified on copper diffused wafers with the help of a neutron…”
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15
Theoretical Considerations on Bragg-case Diffraction of X-rays at a Small Glancing Angle
Published in Japanese Journal of Applied Physics (01-01-1971)“…X-ray diffraction phenomenon, for which the glancing angle of the incident beam is so small that the effect of specular reflection can not be neglected, is…”
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The Enhancement of Anomalously Transmitted X-Ray Intensity by Asymmetric Diffraction and Its Application to Si Wafer Evaluation
Published in Japanese Journal of Applied Physics (01-01-1978)Get full text
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17
Correlation between Photoluminescence Lifetime and Interface Trap Density in Silicon-on-Insulator Wafers
Published in Japanese Journal of Applied Physics (15-04-2003)Get full text
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A New Technique of X-Ray Diffraction Microscopy of Scanning Type
Published in Japanese Journal of Applied Physics (01-01-1967)“…A new technique of the scanning method is proposed for obtaining an undistorted image in the X-ray diffraction microscopy, where, in contrast to the usual Lang…”
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Lattice Parameters of Ion-Implanted Silicon Crystals
Published in Japanese Journal of Applied Physics (01-01-1971)Get full text
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Shapiro-like steps from a weakly coupled junction prepared with high- T c superconducting materials
Published in Applied physics letters (08-08-1994)“…A trilayer junction composed of YBa2Cu3Oy/La0.7Ca0.3MnOz/YBa2Cu3Oy is prepared and the current-voltage (I-V) characteristics are examined with and without…”
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