Search Results - "Kim, Woo‐Hee"

2D Transition Metal Dichalcogenide Heterostructures for p‐ and n‐Type Photovoltaic Self‐Powered Gas Sensor by Kim, Youngjun, Lee, Sangyoon, Song, Jeong‐Gyu, Ko, Kyung Yong, Woo, Whang Je, Lee, Suk Woo, Park, Minwoo, Lee, Hoonkyung, Lee, Zonghoon, Choi, Hyunyong, Kim, Woo‐Hee, Park, Jusang, Kim, Hyungjun

“…2D transition metal dichalcogenides (TMDs) have attracted much attention for their gas sensing applications due to their superior responsivity at typical room…”
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Inherently Area‐Selective Atomic Layer Deposition of SiO2 Thin Films to Confer Oxide Versus Nitride Selectivity by Lee, Jinseon, Lee, Jeong‐Min, Oh, Hongjun, Kim, Changhan, Kim, Jiseong, Kim, Dae Hyun, Shong, Bonggeun, Park, Tae Joo, Kim, Woo‐Hee

“…Area‐selective atomic layer deposition (AS‐ALD) offers tremendous advantages in comparison with conventional top‐down patterning processes that atomic‐level…”
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Efficient access to general α-tertiary amines via water-accelerated organocatalytic multicomponent allylation by Goswami, Prithwish, Cho, Sung Yeon, Park, Jin Hyun, Kim, Woo Hee, Kim, Hyun Jin, Shin, Myoung Hyeon, Bae, Han Yong

“…A tetrasubstituted carbon atom connected by three sp 3 or sp 2 -carbons with single nitrogen, i.e., the α-tertiary amine (ATA) functional group, is an…”
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A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation by Kim, Woo-Hee, Minaye Hashemi, Fatemeh Sadat, Mackus, Adriaan J. M, Singh, Joseph, Kim, Yeongin, Bobb-Semple, Dara, Fan, Yin, Kaufman-Osborn, Tobin, Godet, Ludovic, Bent, Stacey F

“…Area-selective atomic layer deposition (AS-ALD) is attracting increasing interest because of its ability to enable both continued dimensional scaling and…”
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The effects of La substitution on ferroelectric domain structure and multiferroic properties of epitaxially grown BiFeO3 thin films by Kim, Woo-Hee, Yeog Son, Jong

“…We report the influence of La substitution in epitaxial BiFeO3 thin films prepared by pulsed layer deposition on a Nb-doped SrTiO3 substrate, focusing on…”
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Hydrogen barrier performance of sputtered La2O3 films for InGaZnO thin-film transistor by Lee, Yujin, Lee, Chong Hwon, Nam, Taewook, Lee, Sanghun, Oh, Il-Kwon, Yang, Joon Young, Choi, Dong Wook, Yoo, Choongkeun, Kim, Ho-jin, Kim, Woo-Hee, Kim, Hyungjun

“…We report the hydrogen barrier performance of sputtered La 2 O 3 thin films for the device stability of amorphous indium–gallium–zinc–oxide (a-IGZO) thin-film…”
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Thermal adsorption-enhanced atomic layer etching of Si3N4 by Kim, Woo-Hee, Sung, Dougyong, Oh, Sejin, Woo, Jehun, Lim, Seungkyu, Lee, Hyunju, Bent, Stacey F.

“…Atomic layer etching (ALE) is an alternative method for nanopatterning in which atomic layers of material are removed by sequential self-limiting surface…”
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A Strategy for Wafer‐Scale Crystalline MoS2 Thin Films with Controlled Morphology Using Pulsed Metal–Organic Chemical Vapor Deposition at Low Temperature by Choi, Jeong‐Hun, Ha, Min‐Ji, Park, Jae Chan, Park, Tae Joo, Kim, Woo‐Hee, Lee, Myoung‐Jae, Ahn, Ji‐Hoon

“…2D semiconductor materials with layered crystal structures have attracted great interest as promising candidates for electronic, optoelectronic, and sensor…”
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Analysis of Defect Recovery in Reduced Graphene Oxide and Its Application as a Heater for Self-Healing Polymers by Kim, Hyun Gu, Oh, Il-Kwon, Lee, Seungmin, Jeon, Sera, Choi, Hyunyong, Kim, Kwanpyo, Yang, Joo Ho, Chung, Jae Woo, Lee, Jaekwang, Kim, Woo-Hee, Lee, Han-Bo-Ram

“…Reduced graphene oxide (RGO) obtained from graphene oxide has received much attention because of its simple and cost-effective manufacturing process. Previous…”
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Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor by Jung, Hanearl, Kim, Woo-Hee, Oh, Il-Kwon, Lee, Chang-Wan, Lansalot-Matras, Clement, Lee, Su Jeong, Myoung, Jae-Min, Lee, Han-Bo-Ram, Kim, Hyungjun

“…The deposition of high-quality SiO₂ films has been achieved through the use of both plasma-enhanced chemical vapor deposition (PE-CVD) and plasma-enhanced…”
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Area‐Selective Atomic Layer Deposition Using Vapor Dosing of Short‐Chain Alkanethiol Inhibitors on Metal/Dielectric Surfaces by Lee, Jeongbin, Lee, Jeong‐Min, Ahn, Ji‐Hoon, Park, Tae Joo, Kim, Woo‐Hee

“…Area‐selective atomic layer deposition (AS‐ALD) has enormous potential for selective formation of thin films in a bottom‐up additive fashion on predefined…”
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Confinement of Ferroelectric Domain-Wall Motion at Artificially Formed Conducting-Nanofilaments in Epitaxial BiFeO3 Thin Films by Kim, Woo-Hee, Son, Jong Yeog, Jang, Hyun Myung

“…We report confinement of ferroelectric domain-wall motion at conducting-nanofilament wall in epitaxial BiFeO3 thin film on Nb-doped SrTiO3 substrate. The…”
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Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode by Park, Sang-Joon, Kim, Woo-Hee, Lee, Han-Bo-Ram, Maeng, W.J., Kim, H.

“…Ruthenium thin films were grown by thermal and plasma-enhanced atomic layer deposition (PE-ALD) using O 2 and ammonia (NH 3) plasma, respectively. RuCp 2 and…”
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Uniform color coating of multilayered TiO2/Al2O3 films by atomic layer deposition by Kim, Woo-Hee, Kim, Hyungjun, Lee, Han-Bo-Ram

“…Thin film optics, based on light interference characteristics, are attracting increasing interest because of their ability to enable a functional color coating…”
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Triangular ferroelectric domains of highly (111)-oriented NaNbO3 thin film on a glass substrate by Kim, Woo-Hee, Son, Jong Yeog

“…Highly (111)-oriented polycrystalline NaNbO 3 (NNO) thin films were deposited on Pt/Ta/glass substrates by pulsed laser deposition. To obtain a…”
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Area-selective atomic layer deposition of Ru thin films by chemo-selective inhibition of alkyl aldehyde molecules on nitride surfaces by Lee, Jinseon, Oh, Jieun, Kim, Jiwon, Oh, Hongjun, Shong, Bonggeun, Kim, Woo-Hee

“…[Display omitted] •Chemoselective adsorption of aldehydes on –NH2 functional groups is confirmed.•Chemisorption of aldehydes on –NH2 and –OH was investigated…”
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Selective nitride passivation using vapor-dosed aldehyde inhibitors for area-selective atomic layer deposition by Park, Haneul, Oh, Jieun, Lee, Jeong-Min, Kim, Woo-Hee

“…[Display omitted] •Comparative evaluation of deposition selectivity with SAM and SMI was conducted.•Selective chemisorption of aldehyde was confirmed on TiN…”
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Area-selective atomic layer deposition of high-quality Ru thin films by chemo-selective adsorption of short alkylating agents by Lee, Jeong-Min, Lee, Seo-Hyun, Oh, Jieun, Kim, Woo-Hee

“…[Display omitted] •Blocking capability of DEATMS was confirmed against high-quality Ru ALD process.•The effect of surface modification on dielectric/metal…”
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Ge nanowire photodetector with high photoconductive gain epitaxially integrated on Si substrate by Otuonye, Ugo, Kim, Hee Woo, Lu, Wei D.

“…Efficient nanoscale photodetectors are desirable for future applications such as on-chip optical interconnect systems. High density integration, ideally at the…”
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Area-selective atomic layer deposition of Ru thin films using phosphonic acid self-assembled monolayers for metal/dielectric selectivity by Lee, Seo-Hyun, Lee, Jeong-Min, Lee, Ji Hun, Kwak, Junghun, Chung, Sung-Woong, Kim, Woo-Hee

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