Search Results - "Kikuchi, Hidekazu"

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  1. 1

    Fabrication and stacking of through-silicon-via array chip formed by notchless Si etching and wet cleaning of first metal layer by Watanabe, Naoya, Kikuchi, Hidekazu, Yanagisawa, Azusa, Shimamoto, Haruo, Kikuchi, Katsuya, Aoyagi, Masahiro, Nakamura, Akio

    Published in Japanese Journal of Applied Physics (01-06-2019)
    “…We combined a "via-last through-silicon via (TSV) process consisting of notchless Si etching and wet cleaning of the first metal layer" with the solder bonding…”
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    Journal Article
  2. 2

    Development of a high-yield via-last through silicon via process using notchless silicon etching and wet cleaning of the first metal layer by Watanabe, Naoya, Kikuchi, Hidekazu, Yanagisawa, Azusa, Shimamoto, Haruo, Kikuchi, Katsuya, Aoyagi, Masahiro, Nakamura, Akio

    Published in Japanese Journal of Applied Physics (01-07-2017)
    “…A high-yield via-last through silicon via (TSV) process has been developed using notchless Si etching and wet cleaning of the first metal layer. In this…”
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    Journal Article
  3. 3

    Experimental thermal resistance evaluation of a three-dimensional (3D) chip stack by Matsumoto, Keiji, Ibaraki, Soichiro, Sueoka, Kuniaki, Sakuma, Katsuyuki, Kikuchi, Hidekazu, Orii, Yasumitsu, Yamada, Fumiaki

    “…To propose an appropriate cooling solution for a three-dimensional (3D) chip stack at the design phase, it is necessary to estimate the total thermal…”
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    Conference Proceeding
  4. 4

    Experimental thermal resistance evaluation of a three-dimensional (3D) chip stack, including the transient measurements by Matsumoto, K., Ibaraki, S., Sueoka, K., Sakuma, K., Kikuchi, H., Orii, Y., Yamada, F.

    “…For the thermal management of three-dimensional (3D) chip stack, its thermal resistance needs to be clearly understood. In this study, 3D stacked test chips…”
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    Conference Proceeding
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    Additive value of the right parasternal view for the assessment of aortic stenosis by Shimamura, Toshio, Izumo, Masaki, Sato, Yukio, Shiokawa, Noriko, Uenomachi, Nina, Miyauchi, Motoki, Miyamoto, Junko, Kikuchi, Hidekazu, Shinoda, Junko, Okamura, Takanori, Akashi, Yoshihiro J.

    Published in Echocardiography (Mount Kisco, N.Y.) (01-10-2022)
    “…Background Although Doppler evaluation using a multiplanar method is recommended to assess the severity of aortic stenosis (AS) with transthoracic…”
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    Journal Article
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    A 3D Stacked Memory Integrated on a Logic Device Using SMAFTI Technology by Kurita, Y., Matsui, S., Takahashi, N., Soejima, K., Komuro, M., Itou, M., Kakegawa, C., Kawano, M., Egawa, Y., Saeki, Y., Kikuchi, H., Kato, O., Yanagisawa, A., Mitsuhashi, T., Ishino, M., Shibata, K., Uchiyama, S., Yamada, J., Ikeda, H.

    “…A general-purpose 3D-LSI platform technology for a high-capacity stacked memory integrated on a logic device was developed for high-performance,…”
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    Conference Proceeding
  10. 10

    Thermal design guidelines for a three-dimensional (3D) chip stack, including cooling solutions by Matsumoto, Keiji, Ibaraki, Soichiro, Sueoka, Kuniaki, Sakuma, Katsuyuki, Kikuchi, Hidekazu, Orii, Yasumitsu, Yamada, Fumiaki, Fujihara, Kohei, Takamatsu, Junichi, Kondo, Koji

    “…The thermal resistance of a three-dimensional (3D) chip stack is evaluated, based on the measured thermal resistances of 3D stacked thermal test chips which…”
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    Conference Proceeding
  11. 11

    Wet cleaning process for high-yield via-last TSV formation by Watanabe, Naoya, Shimamoto, Haruo, Kikuchi, Katsuya, Aoyagi, Masahiro, Kikuchi, Hidekazu, Yanagisawa, Azusa, Nakamura, Akio

    “…The backside via-last through silicon via (TSV) process is a simple and cost-effective approach for three-dimensional integration. However, it has two…”
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    Conference Proceeding
  12. 12

    Metal Contamination Evaluation of Via-Last Cu TSV Process Using Notchless Si Etching and Wet Cleaning of the First Metal Layer by Watanabe, Naoya, Shimamoto, Haruo, Kikuchi, Katsuya, Aoyagi, Masahiro, Kikuchi, Hidekazu, Yanagisawa, Azusa, Nakamura, Akio

    “…To confirm the effectiveness of the via-last through silicon via (TSV) process consisting of notchless Si etching and wet cleaning of the first metal layer, we…”
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    Conference Proceeding
  13. 13

    A 1-bit serial transceiver chip set for full-color XGA pictures by Kikuchi, Hidekazu, Suzuki, Norihito, IIzuka, Hiroshi, Takesita, Tohru

    “…A 1‐bit serial transceiver chip set for the full‐color moving picture was developed. It introduced a new data coding for the serial transmission and novel…”
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    Journal Article
  14. 14

    Thermal design guideline and new cooling solution for a three-dimensional (3D) chip stack by Matsumoto, Keiji, Ibaraki, Soichiro, Sueoka, Kuniaki, Sakuma, Katsuyuki, Kikuchi, Hidekazu, Mori, Hiroyuki, Orii, Yasumitsu, Yamada, Fumiaki, Fujihara, Kohei, Takamatsu, Junichi, Kondo, Koji

    “…In ASET (Association of Super Advanced Electronics Technologies), the thermal resistances of three-dimensional (3D) chip stacks have been measured by using 3D…”
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    Conference Proceeding
  15. 15

    TSV diagnostics by X-ray microscopy by Sueoka, K., Yamada, F., Horibe, A., Kikuchi, H., Minami, K., Orii, Y.

    “…TSV (Through Silicon Via) is one of the key elements for building 3D integrated silicon devices with high bandwidth interconnections. In this paper, we propose…”
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    Conference Proceeding
  16. 16

    Gigabit Video Interface: A Fully Serialized Data Transmission System For Digital Moving Pictures by Kikuchi, Fukuzaki, Tamaki, Takeshita

    “…A I -bit serial 1.56Gb/s data transceiver chip set for base band transmission of XGA moving pictures was developed. It integrates PLLs, ENC/ DEC, cable…”
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    Conference Proceeding
  17. 17

    Three-dimensional integration scheme using hybrid wafer bonding and via-last TSV process by Takeda, K., Aoki, M., Hozawa, K., Furuta, F., Yanagisawa, A., Kikuchi, H., Mitsuhashi, T., Kobayashi, H.

    Published in 2012 2nd IEEE CPMT Symposium Japan (01-12-2012)
    “…A wafer-level three-dimensional (3D) integration scheme for forming via-last through-silicon vias (TSVs) was developed. This scheme includes wafer-to-wafer…”
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    Conference Proceeding
  18. 18

    Thermal resistance evaluation of a three-dimensional (3D) chip stack by Matsumoto, K, Ibaraki, S, Sakuma, K, Sueoka, K, Kikuchi, H, Orii, Y, Yamada, F

    “…Three-dimensional (3D) chip stacks are receiving more attention for system performance enhancements, due to their higher interconnect density and shorter…”
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    Conference Proceeding
  19. 19

    High density 3D integration by pre-applied Inter Chip Fill by Horibe, A, Sueoka, K, Sakuma, K, Kohara, S, Matsumoto, K, Kikuchi, H, Orii, Y, Mitsuhashi, T, Yamada, F

    “…28,561 bumps/die were electrically connected by Stack Joining method using pre-applied Inter Chip Fill resin…”
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    Conference Proceeding