Search Results - "Kichai, V. N."

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  1. 1

    Synthesis and Properties of Thin Films Formed by Vapor Deposition from Tetramethylsilane in a Radio-Frequency Inductively Coupled Plasma Discharge by Rumyantsev, Yu. M., Chagin, M. N., Shayapov, V. R., Yushina, I. V., Kichai, V. N., Kosinova, M. L.

    Published in Glass physics and chemistry (01-05-2018)
    “…Thin films of hydrogenated silicon carbide (SiC x :H) and carbonitride (SiC x N y :H) are synthesized in a reactor with inductively coupled RF plasma with the…”
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  2. 2

    Synthesis and properties of dielectric (HfO2)1 − x(Sc2O3)x films by Yakovkina, L. V., Smirnova, T. P., Borisov, V. O., Kichai, V. N., Kaichev, V. V.

    Published in Inorganic materials (01-02-2013)
    “…(HfO 2 ) 1 − x (Sc 2 O 3 ) x films have been grown by chemical vapor deposition (CVD) using the volatile complexes hafnium…”
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  3. 3

    CRYSTAL TEXTURE AND MECHANICAL STRESSES IN VO2 FILMS OBTAINED BY MOCVD by Shayapov, V. R., Kichai, V. N., Yakovkina, L. V., Korolkov, I. V.

    Published in Journal of structural chemistry (01-02-2022)
    “…The texture of crystallites and mechanical stresses are investigated in polycrystalline VO 2 films obtained by MOCVD from vanadyl acetylacetonate vapor at…”
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  4. 4
  5. 5

    Hydrogenated silicon oxycarbonitride films. Part II. Physicochemical and functional properties by Fainer, N. I., Plekhanov, A. G., Rumyantsev, Yu. M., Yushina, I. V., Shayapov, V. R., Kichai, V. N.

    Published in Glass physics and chemistry (01-11-2014)
    “…The optical, and electrophysical characteristics of hydrogenated silicon oxycarbonitride films synthesized by the plasma enhanced chemical vapor decomposition…”
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  6. 6

    Plasma Deposition and Properties of Silicon Carbonitride Films by Smirnova, T. P., Badalyan, A. M., Borisov, V. O., Kaichev, V. V., Bakhturova, L. F., Kichai, V. N., Rakhlin, V. I., Shainyan, B. A.

    Published in Inorganic materials (01-07-2005)
    “…A variety of advanced analytical techniques were used to characterize silicon carbonitride films grown from new volatile nitrogen-rich silyl derivatives of…”
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  7. 7

    Preparation and Properties of Thin HfO2 Films by Yakovkina, L. V., Kichai, V. N., Smirnova, T. P., Kaichev, V. V., Shubin, Yu. V., Morozova, N. B., Zherikova, K. V., Igumenov, I. K.

    Published in Inorganic materials (01-12-2005)
    “…HfO2 layers were grown on silicon by metalorganic chemical vapor deposition using (C5H5)2Hf(CH3)2, (C5H5)2Hf(N(C2H5)2)2, and Hf(dpm)4 as volatile precursors…”
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  8. 8

    Growth, chemical composition, and structure of thin LaxHf1 − xOy films on Si by Smirnova, T. P., Yakovkina, L. V., Borisov, V. O., Kichai, V. N., Kaichev, V. V., Saraev, A. A.

    Published in Inorganic materials (01-02-2014)
    “…The chemical structure, phase composition, and crystal structure of La x Hf 1 − x O y films grown on Si using volatile metalorganic compounds as Hf and La…”
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  9. 9
  10. 10

    Growth, chemical composition, and structure of thin La sub( x )Hf sub(1 - x )O sub( y )films on Si by Smirnova, T P, Yakovkina, LV, Borisov, VO, Kichai, V N, Kaichev, V V, Saraev, A A

    Published in Inorganic materials (01-02-2014)
    “…The chemical structure, phase composition, and crystal structure of La sub( x )Hf sub(1 - x )O sub( y )films grown on Si using volatile metalorganic compounds…”
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  11. 11

    Structure of HfO2 films and binary oxides on its base by Smirnova, T. P., Yakovkina, L. V., Borisov, V. O., Kichai, V. N., Kaichev, V. V., Kriventsov, V. V.

    Published in Journal of structural chemistry (01-07-2012)
    “…The chemical composition and structure of HfO 2 films and binary oxides formed by their doping with aluminum and scandium are analyzed. It is shown that…”
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  12. 12

    Structure and properties of films based on HfO2-Sc2O3 double oxide by Yakovkina, L. V., Smirnova, T. P., Borisov, V. O., Jeong-Hwan, S., Morozova, N. B., Kichai, V. N., Smirnov, A. V.

    Published in Journal of structural chemistry (01-08-2011)
    “…The results of the investigation of the chemical constitution and structure of (HfO 2 ) x (Sc 2 O 3 ) 1− x thin films are reported. The films are obtained by…”
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