EUV laser produced plasma source development

This paper describes the development of a LPP EUV source using a CO 2 laser with tin droplet targets. Burst power of 100 W and average power of 25 W has been achieved. Collector mirrors have been fabricated with >50% reflectivity and show stable EUV images. Multiple debris mitigation techniques p...

Full description

Saved in:

Bibliographic Details
Published in:	Microelectronic engineering Vol. 86; no. 4; pp. 509 - 512
Main Authors:	Farrar, Nigel R., Brandt, David C., Fomenkov, Igor V., Ershov, Alex I., Bowering, Norbert R., Partlo, William N., Myers, David W., Bykanov, Alexander N., Vaschenko, Georgiy O., Khodykin, Oleh V., Hoffman, Jerzy R., Chrobak, Christopher P.
Format:	Journal Article Conference Proceeding
Language:	English
Published:	Amsterdam Elsevier B.V 01-04-2009 Elsevier
Subjects:	Exact sciences and technology Fundamental areas of phenomenology (including applications) Gas lasers including excimer and metal-vapor lasers Lasers Optics Physics Reflectivity Production system Ultraviolet laser Laser-produced plasma Commutators Extreme ultraviolet radiation Carbon dioxide lasers
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!

Description
Summary:	This paper describes the development of a LPP EUV source using a CO 2 laser with tin droplet targets. Burst power of 100 W and average power of 25 W has been achieved. Collector mirrors have been fabricated with >50% reflectivity and show stable EUV images. Multiple debris mitigation techniques preserve mirror reflectivity. Manufacturing of the first production systems is in progress.
Bibliography:	ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23
ISSN:	0167-9317 1873-5568
DOI:	10.1016/j.mee.2008.10.020