Search Results - "Khan, Mumit"
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1
Extreme ultraviolet holographic lithography: Initial results
Published in Applied physics letters (08-01-2007)“…The authors report the initial results from a holographic lithography technique using extreme ultraviolet (EUV) radiation. This approach removes the need for…”
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Journal Article -
2
Modeling Clear Phase-Mask Materials for Sub-50 nm X-Ray Application
Published in Japanese Journal of Applied Physics (01-06-2004)“…This paper presents a powerful modeling approach to the X-ray exposure operating space of a silicon nitride clear phase-shifter mask to produce sub-50 nm…”
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Journal Article -
3
Investigation of mask pattern proximity correction to reduce image shortening in X-ray lithography
Published in Microelectronic engineering (01-03-1998)“…Previous experimental studies of proximity x-ray lithography for complex patterning at 75–125 nm linewidths have indicated that image shortening is significant…”
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Journal Article Conference Proceeding -
4
Grouping of Handwritten Bangla Basic Characters, Numerals and Vowel Modifiers for Multilayer Classification
Published in 2012 International Conference on Frontiers in Handwriting Recognition (01-09-2012)“…For better performance in multilayer or hierarchical classification of handwritten text, appropriate grouping of similar symbols is very important. Here we aim…”
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Conference Proceeding -
5
Comprehensive model of electron energy deposition
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-2002)“…We present our effort in developing a complete model of electron energy transfer from fast electrons (0.1–100 keV) to the photoresist. Our model is based on…”
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Conference Proceeding -
6
Stochastic modeling of high energy lithographies
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-2003)“…We present our progress in developing a comprehensive stochastic model that taking into account the energy redistribution from the incoming radiation, the…”
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Conference Proceeding -
7
Technique for 25 nm x-ray nanolithography
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-2001)“…The image-forming limit of x-ray lithography is said to be ∼70 nm using existing devices and technologies. This article presents methods to extend the limit to…”
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Conference Proceeding Journal Article -
8
Can proximity x-ray lithography print 35 nm features? Yes
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-2001)“…We report on the results of our effort to extend proximity x-ray lithography (PXL) to 35 nm using a harder energy spectrum, and choosing the appropriate…”
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Conference Proceeding Journal Article -
9
Revisiting phase shifting masks in x-ray lithography
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-1997)“…In this article, we describe a framework for selecting the materials for phase shift masks (PSMs) in x-ray lithography to yield the optimal exposure latitude…”
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Conference Proceeding -
10
Virtual lithography laboratory: A software framework for physics-based modeling and simulation
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Dissertation -
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Modeling image formation: Application to mask optimization
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-1994)“…From an image formation point of view, the design of x‐ray masks has been optimized for realistic exposure systems using synchrotron radiation. The analysis…”
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Conference Proceeding -
12
Virtual lithography laboratory: A software framework for physics -based modeling and simulation
Published 01-01-2003“…This rapid pace of technology development in the semiconductor sector has been greatly aided by advances in modeling and simulation tools. With optical…”
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Dissertation -
13
X-ray lithography for ⩽ 100 nm ground rules in complex patterns
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-1997)“…Complex patterns with 75–125 nm feature sizes exposed with x-ray lithography are shown. Lithographic results for 75–125 nm lines with varying pitch are…”
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Conference Proceeding -
14
Extendibility of x‐ray lithography to ⩽130 nm ground rules in complex integrated circuit patterns
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-11-1996)“…Previous experimental and theoretical evidence indicates that x‐ray lithography can be used to pattern ≤180 nm features. In order to be used in manufacturing,…”
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Conference Proceeding -
15
Night mode prohibitory traffic signs detection
Published in 2013 International Conference on Informatics, Electronics and Vision (ICIEV) (01-05-2013)“…Prohibitory traffic signs play an important role in guiding, warning and regulating traffic system. As driving over the speed limit is often the major cause of…”
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Conference Proceeding -
16
An Open Source Tesseract Based Optical Character Recognizer for Bangla Script
Published in 2009 10th International Conference on Document Analysis and Recognition (01-07-2009)“…BanglaOCR is currently the only open source optical character recognition (OCR) software for the Bangla (Bengali) script developed by the Center for Research…”
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Conference Proceeding -
17
Automatic will enabled system of multi-modal operation
Published in 2013 International Conference on Informatics, Electronics and Vision (ICIEV) (01-05-2013)“…AWESOMMO(Automatic Will Enabled System of Multi-Modal Operation)uses Sony PS3 Eye image sensor for high speed image processing and a microphone for voice…”
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Conference Proceeding -
18
Night mode face recognition using adaptively weighted sub-pattern PCA
Published in 2012 15th International Conference on Computer and Information Technology (ICCIT) (01-12-2012)“…The face recognition problem is made difficult by the great variability in head rotation and tilt, lighting intensity and angle, facial expression, aging,…”
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Conference Proceeding -
19
Building a foundation of HPSG-based treebank on Bangla language
Published in 2007 10th international conference on computer and information technology (01-12-2007)“…Now a day, the importance of a large annotated corpus for NLP researchers is widely known. In this paper, we describe an initial phase of developing a…”
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Conference Proceeding -
20
A Double Metaphone encoding for Bangla and its application in spelling checker
Published in 2005 International Conference on Natural Language Processing and Knowledge Engineering (2005)“…We present a Double Metaphone encoding for Bangla that can be used by spelling checkers to improve the quality of suggestions for misspelled words. The complex…”
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Conference Proceeding