Search Results - "Kanjolia, Ravindra K."

Rapid Wafer-Scale Growth of Polycrystalline 2H-MoS2 by Pulsed Metal–Organic Chemical Vapor Deposition by Kalanyan, Berc, Kimes, William A, Beams, Ryan, Stranick, Stephan J, Garratt, Elias, Kalish, Irina, Davydov, Albert V, Kanjolia, Ravindra K, Maslar, James E

“…High-volume manufacturing of devices based on transition metal dichalcogenide (TMD) ultrathin films will require deposition techniques that are capable of…”
Get full text

Indium Oxide Thin Films by Atomic Layer Deposition Using Trimethylindium and Ozone by Mane, Anil U, Allen, Amy J, Kanjolia, Ravindra K, Elam, Jeffrey W

“…We investigated the atomic layer deposition (ALD) of indium oxide (In2O3) thin films using alternating exposures of trimethylindium (TMIn) and a variety of…”
Get full text

Atomic Layer Deposition of Cobalt Silicide Thin Films Studied by in Situ Infrared Spectroscopy by Bernal-Ramos, Karla, Saly, Mark J, Kanjolia, Ravindra K, Chabal, Yves J

“…Atomic layer deposition of cobalt silicide (CoSi2) thin films on H-terminated Si(111) surfaces, using the cobalt-based precursor…”
Get full text

Semiconductor-to-metal transition in atomic layer deposition (ALD) of VO2 films using VCl4 and water by Ganesan, Jeya Prakash, Dev, Durjoy, Krishnaprasad, Adithi, Feit, Corbin, Moser, Daniel, Kanjolia, Ravindra K., Roy, Tania, Banerjee, Parag

“…The semiconductor-to-metal transition of vanadium dioxide (VO2) films is studied using temperature-dependent Raman, optical, and electrical measurements. The…”
Get full text

Self-Catalyzed, Low-Temperature Atomic Layer Deposition of Ruthenium Metal Using Zero-Valent Ru(DMBD)(CO)3 and Water by Gao, Zhengning, Le, Duy, Khaniya, Asim, Dezelah, Charles L, Woodruff, Jacob, Kanjolia, Ravindra K, Kaden, William E, Rahman, Talat S, Banerjee, Parag

“…Ruthenium (Ru) films are deposited using atomic layer deposition (ALD), promoted by a self-catalytic reaction mechanism. Using zero-valent,…”
Get full text

Role of Initial Precursor Chemisorption on Incubation Delay for Molybdenum Oxide Atomic Layer Deposition by Nanayakkara, Charith E, Vega, Abraham, Liu, Guo, Dezelah, Charles L, Kanjolia, Ravindra K, Chabal, Yves J

“…In an effort to grow metal oxide films (e.g., MoO3) at low temperatures, a novel molybdenum precursor, Si­(CH3)3CpMo­(CO)2(η3-2-methylallyl) or MOTSMA, is used…”
Get full text

Substrate Selectivity of (tBu-Allyl)Co(CO)3 during Thermal Atomic Layer Deposition of Cobalt by Kwon, Jinhee, Saly, Mark, Halls, Mathew D, Kanjolia, Ravindra K, Chabal, Yves J

“…Tertbutylallylcobalttricarbonyl (tBu-AllylCo­(CO)3) is shown to have strong substrate selectivity during atomic layer deposition of metallic cobalt. The…”
Get full text

Characterization of bubbler performance for low-volatility liquid precursor delivery by Maslar, James E., Kimes, William A., Sperling, Brent A., Kanjolia, Ravindra K.

“…The performance of a bubbler to deliver the low-volatility, liquid cobalt precursor μ2-η2-(tBu-acetylene) dicobalthexacarbonyl (CCTBA) for reduced-pressure…”
Get full text

Selective Atomic Layer Deposition Mechanism for Titanium Dioxide Films with (EtCp)Ti(NMe2)3: Ozone versus Water by Klesko, Joseph P, Rahman, Rezwanur, Dangerfield, Aaron, Nanayakkara, Charith E, L’Esperance, Thomas, Moser, Daniel F, Peña, L. Fabián, Mattson, Eric C, Dezelah, Charles L, Kanjolia, Ravindra K, Chabal, Yves J

“…The need for the conformal deposition of TiO2 thin films in device fabrication has motivated a search for thermally robust titania precursors with noncorrosive…”
Get full text

Nondispersive Infrared Gas Analyzer for Vapor Density Measurements of a Carbonyl-Containing Organometallic Cobalt Precursor by Maslar, James E., Kimes, William A., Sperling, Brent A., Kanjolia, Ravindra K.

“…A nondispersive infrared (NDIR) gas analyzer was demonstrated for measuring the vapor-phase density of the carbonyl-containing organometallic cobalt precurso…”
Get full text

MoS2 thin films from a (NtBu)2(NMe2)2Mo and 1-propanethiol atomic layer deposition process by Kalanyan, Berc, Beams, Ryan, Katz, Michael B., Davydov, Albert V., Maslar, James E., Kanjolia, Ravindra K.

“…Potential commercial applications for transition metal dichalcogenide (TMD) semiconductors such as MoS2 rely on unique material properties that are only…”
Get full text

Reaction Mechanisms of the Atomic Layer Deposition of Tin Oxide Thin Films Using Tributyltin Ethoxide and Ozone by Nanayakkara, Charith E, Liu, Guo, Vega, Abraham, Dezelah, Charles L, Kanjolia, Ravindra K, Chabal, Yves J

“…Uniform and conformal deposition of tin oxide thin films is important for several applications in electronics, gas sensing, and transparent conducting…”
Get full text

Rapid Wafer-Scale Growth of Polycrystalline 2H-MoS2 by Pulsed Metalorganic Chemical Vapor Deposition by Kalanyan, Berc, Kimes, William A, Beams, Ryan, Stranick, Stephan J, Garratt, Elias, Kalish, Irina, Davydov, Albert V, Kanjolia, Ravindra K, Maslar, James E

“…High volume manufacturing of devices based on transition metal dichalcogenide (TMD) ultra-thin films will require deposition techniques that are capable of…”
Get full text

Reductive Elimination of Hypersilyl Halides from Zinc(II) Complexes. Implications for Electropositive Metal Thin Film Growth by Sirimanne, Chatu T, Kerrigan, Marissa M, Martin, Philip D, Kanjolia, Ravindra K, Elliott, Simon D, Winter, Charles H

“…Treatment of Zn(Si(SiMe3)3)2 with ZnX2 (X = Cl, Br, I) in tetrahydrofuran (THF) at 23 °C afforded [Zn(Si(SiMe3)3)X(THF)]2 in 83–99% yield. X-ray crystal…”
Get full text

Comparison of saturator designs for delivery of low-volatility liquid precursors by Maslar, James E., Kimes, William A., Khromchenko, Vladimir B., Sperling, Brent A., Kanjolia, Ravindra K.

“…•Saturator designs were compared for delivery of low-volatility precursors.•The performance of a bubbler and flow over vessel were characterized.•Mass…”
Get full text

Synthesis of Micron-Sized WS 2 Crystallites Using Atomic Layer Deposition and Sulfur Annealing by Mullapudi, Kamesh, Addou, Rafik, Dezelah, Charles. L., Moser, Daniel F., Kanjolia, Ravindra K., Woodruff, Jacob H., Conley, John. F.

Get full text

Synthesis of Micron-Sized WS2 Crystallites Using Atomic Layer Deposition and Sulfur Annealing by Mullapudi, Kamesh, Addou, Rafik, Dezelah, Charles. L., Moser, Daniel F., Kanjolia, Ravindra K., Woodruff, Jacob H., Conley, John. F.

“…The synthesis of micron-sized WS2 crystallites via atomic layer deposition (ALD) is reported for the first time using…”
Get full text

Nondispersive Infrared Gas Analyzer for Partial Pressure Measurements of a Tantalum Alkylamide During Vapor Deposition Processes by Maslar, James E., Kimes, William A., Sperling, Brent A., Kanjolia, Ravindra K.

“…A nondispersive infrared gas analyzer was demonstrated for investigating metal alkylamide precursor delivery for microelectronics vapor deposition processes…”
Get full text

Characterization of vapor draw vessel performance for low-volatility solid precursor delivery by Maslar, James E., Kimes, William A., Sperling, Brent A., Kanjolia, Ravindra K.

“…Low volatility precursors are widely utilized in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. Compared to gases and high…”
Get full text

Plasma-enhanced atomic layer deposition of WO3-SiO2 films using a heteronuclear precursor by Mullapudi, Kamesh, Holden, Konner E. K., Peterson, Jessica L., Dezelah, Charles L., Moser, Daniel F., Kanjolia, Ravindra K., Tweet, Douglas J., Conley, John F.

“…Tungsten oxide–silicon dioxide (WOx–SiOy) composite thin films were deposited for the first time via the remote oxygen plasma-enhanced atomic layer deposition…”
Get full text