Search Results - "Kanghoon Jeon"
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Si tunnel transistors with a novel silicided source and 46mV/dec swing
Published in 2010 Symposium on VLSI Technology (01-06-2010)“…We report a novel tunneling field effect transistor (TFET) fabricated with a high-k/metal gate stack and using nickel silicide to create a special…”
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Conference Proceeding -
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Comprehensive Study of Quasi-Ballistic Transport in High- \kappa/Metal Gate nMOSFETs
Published in IEEE electron device letters (01-11-2011)“…We study quasi-ballistic transport in nanoscale high-κ/metal gate nMOSFETs based on radio-frequency (RF) S -parameter analysis. An RF S -parameter-based simple…”
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Journal Article -
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on-State Performance Enhancement and Channel-Direction-Dependent Performance of a Biaxial Compressive Strained \hbox\hbox Quantum-Well pMOSFET Along \langle \hbox \rangle and \langle \hbox \rangle Channel Directions
Published in IEEE transactions on electron devices (01-04-2011)“…pMOSFET performance of high Ge content (~50%) biaxial compressive strained SiGe heterostructure channel pMOSFETs is characterized, and performance between 〈110…”
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Palladium/silicon nanowire Schottky barrier-based hydrogen sensors
Published in Sensors and actuators. B, Chemical (04-03-2010)“…This work presents the design, fabrication, and characterization of a hydrogen sensor based on a palladium/nanowire Schottky barrier field-effect transistor…”
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Journal Article -
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A Low Voltage Steep Turn-Off Tunnel Transistor Design
Published in 2009 International Conference on Simulation of Semiconductor Processes and Devices (01-09-2009)“…A new tunneling transistor structure is introduced that offers several advantages over prior designs. Notably, tunneling area is substantially increased. Turn…”
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Conference Proceeding -
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Prospect of tunneling green transistor for 0.1V CMOS
Published in 2010 International Electron Devices Meeting (01-12-2010)“…Well designed tunneling green transistor may enable future VLSIs operating at 0.1V. Sub-60mV/decade characteristics have been convincingly demonstrated on 8"…”
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Conference Proceeding -
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Low-voltage green transistor using ultra shallow junction and hetero-tunneling
Published in Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08) (01-05-2008)“…A novel hetero-tunnel transistor (HtFET) with a heterostructure and ultra shallow junction parallel to the dielectric interface is proposed for low-voltage…”
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Conference Proceeding -
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High mobility CMOS transistors on Si/SiGe heterostructure channels
Published in Microelectronic engineering (01-09-2012)“…We have demonstrated high mobility CMOS transistors on Si/SiGe heterostructure channels selectively grown on a Si (100) substrate. Electron and hole mobility…”
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Journal Article -
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Band-to-Band Tunnel Transistor Design and Modeling for Low Power Applications
Published 01-01-2012“…As the physical dimensions of the MOSFET have been scaling, the supply voltage has not scaled accordingly and thus the power density has been continuously…”
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Dissertation -
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Tri-gate bulk MOSFET design for improved robustness to random dopant fluctuations
Published in 2008 IEEE Silicon Nanoelectronics Workshop (01-06-2008)“…Atomistic 3D device simulations of 20nm-gate-length planar vs. tri-gate bulk MOSFETs with identical nominal retrograde-well and source/drain doping profiles…”
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Conference Proceeding -
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on-State Performance Enhancement and Channel-Direction-Dependent Performance of a Biaxial Compressive Strained [Formula Omitted] Quantum-Well pMOSFET Along [Formula Omitted] and [Formula Omitted] Channel Directions
Published in IEEE transactions on electron devices (01-04-2011)“…pMOSFET performance of high Ge content ([Formula Omitted]50%) biaxial compressive strained SiGe heterostructure channel pMOSFETs is characterized, and…”
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Journal Article -
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on-State Performance Enhancement and Channel-Direction-Dependent Performance of a Biaxial Compressive Strained hbox Si 0.5 hbox Ge 0.5 Quantum-Well pMOSFET Along < hbox 110 > and < hbox 100 > Channel Directions
Published in IEEE transactions on electron devices (01-04-2011)“…pMOSFET performance of high Ge content ( similar to 50%) biaxial compressive strained SiGe heterostructure channel pMOSFETs is characterized, and performance…”
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Highly scaled (Lg∼56nm) gate-last Si tunnel field-effect transistors with ION>100μA/μm
Published in Solid-state electronics (01-11-2011)“…Planar band-to-band tunneling FETs (TFETs) have been fabricated on silicon-on-insulator (SOI) substrates using conventional CMOS technologies with a highly…”
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Journal Article Conference Proceeding -
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Comparison of Ohmic contact resistances of n- and p-type Ge source/drain and their impact on transport characteristics of Ge metal oxide semiconductor field effect transistors
Published in Thin solid films (31-10-2011)“…We report the results of a systematic study to understand low drive current of Ge-nMOSFET (metal–oxide–semiconductor field-effect transistor). The poor…”
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Journal Article -
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Comprehensive Study of Quasi-Ballistic Transport in High-[Formula Omitted]/Metal Gate nMOSFETs
Published in IEEE electron device letters (01-11-2011)“…We study quasi-ballistic transport in nanoscale high-[Formula Omitted]/metal gate nMOSFETs based on radio-frequency (RF) [Formula Omitted] -parameter analysis…”
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Journal Article -
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Highly scaled (L sub(g [approx] 56 nm) gate-last Si tunnel field-effect transistors with I) sub(O)N 100 mu A/ mu m
Published in Solid-state electronics (01-12-2011)“…Planar band-to-band tunneling FETs (TFETs) have been fabricated on silicon-on-insulator (SOI) substrates using conventional CMOS technologies with a highly…”
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Journal Article -
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Sub-5nm All-Around Gate FinFET for Ultimate Scaling
Published in 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers (2006)“…Sub-5nm all-around gate FinFETs with 3nm fin width were fabricated for the first time. The n-channel FinFET of sub-5nm with 1.4nm HfO 2 shows an I Dsat of…”
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Conference Proceeding -
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Band-to-Band Tunnel Transistor Design and Modeling for Low Power Applications
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Dissertation