Search Results - "Kanda, Yasushi"

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    Activation of Silicon Implanted with Phosphorus and Boron Atoms by Infrared Semiconductor Laser Rapid Annealing by Ukawa, Kan, Kanda, Yasushi, Sameshima, Toshiyuki, Sano, Naoki, Naito, Masao, Hamamoto, Nariaki

    Published in Japanese Journal of Applied Physics (01-07-2010)
    “…We report the activation of silicon implanted with phosphorus and boron atoms by infrared semiconductor laser annealing using carbon films as an optical…”
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    Journal Article
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