Search Results - "Kalkhoran, N.M."

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  1. 1

    Nanostructured surface modification of ceramic-based microelectrodes to enhance biocompatibility for a direct brain-machine interface by Moxon, K.A., Kalkhoran, N.M., Markert, M., Sambito, M.A., McKenzie, J.L., Webster, J.T.

    “…Many different types of microelectrodes have been developed for use as a direct Brain-Machine Interface (BMI) to chronically recording single neuron action…”
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    Journal Article
  2. 2

    Suppression of parasitic bipolar effects and off-state leakage in fully-depleted SOI n-MOSFET's using Ge-implantation by Hua-Fang Wei, Chung, J.E., Kalkhoran, N.M., Namavar, F.

    Published in IEEE transactions on electron devices (01-12-1995)
    “…This work demonstrates a well-controlled technique of channel defect engineering, by implanting germanium into the channel of a Silicon-On-Insulator (SOI)…”
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    Journal Article
  3. 3

    Photoluminescence and cathodoluminescence of ion implanted ZnS and ZnGa{sub 2}O{sub 4} phosphors by Kalkhoran, N.M., Halverson, W.

    Published 31-12-1996
    “…Photoluminescence (PL) and cathodoluminescence (CL) characteristics of ion implanted ZnS and ZnGa{sub 2}O{sub 4} phosphors have been investigated. The authors…”
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    Conference Proceeding
  4. 4

    Photoluminescence and cathodoluminescence of ion implanted ZnS and ZnGa/sub 2/O/sub 4/ phosphors by Kalkhoran, N.M., Halverson, W.

    “…Summary form only given. Photoluminescence (PL) and cathodoluminescence (CL) characteristics of ion implanted ZnS and ZnGa/sub 2/O/sub 4/ phosphors have been…”
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    Conference Proceeding
  5. 5

    Nanostructured porous silicon scaffolds for improved biocompatibility of thin film microelectrodes by Moxon, K.A., Kalkhoran, N.M.

    “…The promise of multichannel thin film microelectrodes for closed-loop neural prosthetic control has been hindered by the inability of these electrodes to…”
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    Conference Proceeding
  6. 6

    Charged particle radiation effects on bulk silicon and SIMOX SOI photodiodes by Kalkhoran, N.M., Burke, E.A., Namavar, F.

    Published in IEEE transactions on nuclear science (01-12-1995)
    “…We report the fabrication of the first n-on-p photodiodes on silicon-on-insulator (SOI) substrates produced using the SIMOX (separation by implantation of…”
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    Journal Article
  7. 7

    "Camocell" technology: a new surface texturing process for high efficiency color-matched silicon solar cells by Kalkhoran, N.M., Murphy, P.F.

    “…This paper introduces a simple approach for producing textured surfaces with a wide range of colors on single and multi-crystalline silicon wafers. We call the…”
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    Conference Proceeding
  8. 8

    Improvement of radiation hardness in fully-depleted SOI n-MOSFETs using Ge-implantation by Hua-Fang Wei, Chung, J.E., Kalkhoran, N.M., Namavar, F., Annamalai, N.K., Shedd, W.M.

    “…This work demonstrates a well-controlled technique of channel defect engineering by implanting germanium into the channel of a silicon-on-insulator (SOI)…”
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    Journal Article Conference Proceeding
  9. 9

    Lateral and vertical isolation by arsenic implantation into MOCVD-grown GaAs layers by Namavar, Fereydoon, Kalkhoran, N. M., Claverie, A., Liliental-Weber, Z., Weber, E. R., Sekula-Moisé, P. A., Vernon, S., Haven, V.

    Published in Journal of electronic materials (01-12-1993)
    “…We have demonstrated the formation of arsenic precipitates in GaAs using arsenic implantation and annealing. Electrical measurements show that very high…”
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    Journal Article
  10. 10

    High performance porous silicon solar cell development by Vernon, S.M., Kalkhoran, N.M., Maruska, H.P., Halverson, W.D.

    “…We have fabricated Si solar cells from porous Si/bulk Si structures. Two cell types, having the junction within the porous Si or within the bulk Si, were…”
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    Conference Proceeding
  11. 11

    Improvement of breakdown voltage and off-state leakage in Ge-implanted SOI n-MOSFETs by Wei, H.F., Kalkhoran, N.M., Namavar, F., Chung, J.E.

    “…This work demonstrates a well-controlled technique of channel defect engineering, by implanting Ge into the SOI device channel to act as a minority carrier…”
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    Conference Proceeding
  12. 12

    Effect of implantation energy on surface pitting of SIMOX by Namavar, F., Cortesi, E., Manke, J.M., Kalkhoran, N.M., Buchanan, B.L., Pinizzotto, R.F., Yang, H.

    “…A systematic study to determine the effect of dose and dose rate on implanting oxygen at 80 and 160 keV is reported. Samples were produced by implanting oxygen…”
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    Conference Proceeding
  13. 13

    Characterization of low energy SIMOX (LES) structures by Namavar, F., Cortesi, E., Kalkhoran, N.M., Manke, J.M., Buchanan, B.L.

    “…Formation of ultra-thin SOI material using the SIMOX process is addressed. Research has been carried out to determine the effect of total dose, dose step, dose…”
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    Conference Proceeding
  14. 14

    Epitaxial GeSi strained layer on SIMOX for confinement of threading dislocations by Cortesi, E., Namavar, F., Kalkhoran, N.M., Manke, J.M., Buchanan, B.L.

    “…Improvement of the crystalline quality of epitaxial silicon grown on separation by implantation of oxygen (SIMOX) material was investigated by confining the…”
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    Conference Proceeding