Search Results - "Kakati, H."

Effect of impinging ion energy on the substrates during deposition of SiOx films by radiofrequency plasma enhanced chemical vapor deposition process by CHOUDHURY, Aj, BARVE, S. A, CHUTIA, Joyanti, KAKATI, H, PAL, A. R, JAGANNATH, MITHAL, N, KISHORE, R, PANDEY, M, PATIL, D. S

“…Radiofrequency (13.56MHz) plasma enhanced chemical vapor deposition process is used for deposition of SiOx films on bell metal substrates using…”
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Deposition of nanostructured crystalline and corrosion resistant alumina film on bell metal at low temperature by rf magnetron sputtering by Kakati, H., Pal, A.R., Bailung, H., Chutia, Joyanti

“…Aluminium oxide films deposited by rf magnetron sputtering for protective coatings have been investigated. The alumina films are found to exhibit grainy…”
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Studies of physical and chemical properties of styrene-based plasma polymer films deposited by radiofrequency Ar/styrene glow discharge by Choudhury, A.J., Chutia, Joyanti, Barve, S.A., Kakati, H., Pal, A.R., Jagannath, Mithal, N., Kishore, R., Pandey, M., Patil, D.S.

“…Styrene-based plasma polymer (SPP) films having thickness in the range of 900–1800 nm are deposited from radiofrequency (RF) Ar/styrene glow discharge…”
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Radiating dirac source with cylindrical symmetry by Krori, K. D., Kakati, H.

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Effect of impinging ion energy on the substrates during deposition of SiO x films by radiofrequency plasma enhanced chemical vapor deposition process by Choudhury, A.J., Barve, S.A., Chutia, Joyanti, Kakati, H., Pal, A.R., Jagannath, Mithal, N., Kishore, R., Pandey, M., Patil, D.S.

“…Radiofrequency (13.56 MHz) plasma enhanced chemical vapor deposition process is used for deposition of SiO x films on bell metal substrates using…”
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Pressure mediated reduction of nitro to amino functionality with FeSO4/NH3/H2O/EtOH system by HARI SANKAR KAKATI, DIBAKAR CHANDRA DEKA

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