Search Results - "Kainlauri, M."

Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition by Puurunen, R.L., Häärä, A., Saloniemi, H., Dekker, J., Kainlauri, M., Pohjonen, H., Suni, T., Kiihamäki, J., Santala, E., Leskelä, M., Kattelus, H.

“…Atomic layer deposition (ALD) can be used to grow pinhole-free nanometer-thin conformal inorganic films at low temperatures, making it of interest for many…”
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Reducing stiction in Microelectromechanical Systems by nanometer-scale films grown by atomic layer deposition by Puurunen, R. L., Haara, A., Ritala, H., Dekker, J., Kainlauri, M., Pohjonen, H., Suni, T., Kiihamaki, J., Santala, E., Leskela, M., Kattelus, H.

“…Stiction during device operation remains one of the mechanisms leading to permanent failure of operating silicon-based MEMS devices (MicroElectroMechanical…”
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