Search Results - "KWON, K. H"

Gene-microbiota interactions contribute to the pathogenesis of inflammatory bowel disease by Chu, Hiutung, Khosravi, Arya, Kusumawardhani, Indah P., Kwon, Alice H. K., Vasconcelos, Anilton C., Cunha, Larissa D., Mayer, Anne E., Shen, Yue, Wu, Wei-Li, Kambal, Amal, Targan, Stephan R., Xavier, Ramnik J., Ernst, Peter B., Green, Douglas R., McGovern, Dermot P. B., Virgin, Herbert W., Mazmanian, Sarkis K.

“…Inflammatory bowel disease (IBD) is associated with risk variants in the human genome and dysbiosis of the gut microbiome, though unifying principles for these…”
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An observational study of hydrodynamic impact on water mass transport due to tidal power generation by Kim, J.W., Woo, S.-B., Song, J.I., Kwon, H.-K.

“…The world's largest Sihwa Tidal Power Plant (TPP), located on the west coast of Korea, was built in 2011 for the purpose of improving water quality and…”
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Unbalanced sediment transport by tidal power generation in Lake Sihwa by Kim, J.W., Ha, H.K., Woo, S.-B., Kim, M.-S., Kwon, H.-K.

“…An in-situ observational study was conducted to understand the sediment transport processes disturbed by the flood generation type of Sihwa tidal power plant…”
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Parameters of Gaseous Phase and Kinetics of Reactive Ion Etching of SiO2 in CF4/C4F8/Ar/He Plasma by Efremov, A. M., Kwon, K.-H.

“…The electrophysical parameters of plasma, concentrations of fluorine atoms, and kinetics of reactive-ion heterogeneous processes in the CF 4 + C 4 F 8 + Ar +…”
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Concentration of Fluorine Atoms and Kinetics of Reactive-Ion Etching of Silicon in CF4 + O2, CHF3 + O2, and C4F8 + O2 Mixtures by Efremov, A. M., Bobylev, A. V., Kwon, K.-H.

“…A comparative study of the electrophysical parameters of the plasma, the fluorine atom concentrations, and the kinetics of reactive-ion etching of silicon in…”
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Kinetics of Reactive Ion Etching of Si, SiO2, and Si3N4 in C4F8 + O2 + Ar Plasma: Effect of the C4F8/O2 Mixing Ratio by Efremov, A. M., Kwon, K.-H.

“…The kinetics of reactive ion etching of an Si, SiO 2 , and Si 3 N 4 in the C 4 F 8 + O 2 + Ar mixture with a varied C 4 F 8 /O 2 mixing ratio under the…”
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Plasma Parameters and Kinetics of Reactive Ion Etching of SiO2 and Si3N4 in an HBr/Cl2/Ar Mixture by Efremov, A. M., Betelin, V. B., Kwon, K.-H.

“…The parameters of the gas phase and the kinetics of reactive ion etching of SiO 2 and Si 3 N 4 under conditions of an induction RF (13.56 MHz) discharge with a…”
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On the Mechanisms Regulating the Plasma Composition and Kinetics of Heterogeneous Processes in a CF4 + CHF3 + Ar Mixture by Efremov, A. M., Betelin, V. B., Kwon, K.-H.

“…The influence of the initial composition of a CF 4 + CHF 3 + Ar mixture and bias power on the electrical parameters of the plasma, the composition of the gas…”
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Plasma Parameters and Kinetics of Reactive-Ion Etching of Silicon in a C6F12O + Ar Mixture by Efremov, A. M., Betelin, V. B., Kwon, K.-H.

“…The characteristics of the gas phase and the kinetics of reactive-ion etching of silicon in a 50% C 6 F 12 O + 50% Ar plasma are studied. The study scheme…”
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Mechanisms of Plasma Etching of Titanium, Indium, Tin, and Zinc Oxides in a Mixture of HBr + Ar by Efremov, A. M., Smirnov, S. A., Betelin, V. B., Kwon, K.-H.

“…The kinetics and mechanisms of reactive ion etching of titanium oxides (TiO 2 ), indium (In 2 O 3 ), tin (SnO 2 ), and zinc (ZnO) in HBr + Ar plasma. It is…”
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Specific Features of the Kinetics of the Reactive-Ion Etching of Si and SiO2 in a CF4 + O2 Mixture in a Low Power Supply Mode by Efremov, A. M., Betelin, V. B., Kwon, K.-H.

“…The kinetics of reactive ion etching of Si and SiO 2 in the plasma of a high-frequency (13.56 MHz) inductive discharge in a CF 4 + O 2 mixture in the range of…”
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Kinetics of the Volumetric and Heterogeneous Processes in the Plasma of a C4F8 + O2 + Ar Mixture by Efremov, A. M., Murin, D. B., Sobolev, A. M., Kwon, K.-H.

“…In this paper, we investigate the relationship between the external and internal plasma parameters in a C 4 F 8 + O 2 + Ar mixture under conditions of an…”
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Kinetics and Mechanisms of Reactive-Ion Etching of Si and SiO2 in a Plasma of a Mixture of HBr + O2 by Efremov, A. M., Betelin, V. B., Kwon, K.-H.

“…In this paper, we investigate the kinetics and mechanisms of reactive-ion etching of Si and SiO 2 in the plasma of an HBr + O 2 mixture with a variable initial…”
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Special Aspects of the Kinetics of Reactive Ion Etching of SiO2 in Fluorine-, Chlorine-, and Bromine-Containing Plasma by Efremov, A. M., Murin, D. B., Betelin, V. B., Kwon, K.-H.

“…The influence of the type of active gas and the ratio of the concentration of the components of the CF 4 + Ar, Cl 2 + Ar, and HBr + Ar mixtures on the…”
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Concerning the Effect of Type of Fluorocarbon Gas on the Output Characteristics of the Reactive-Ion Etching Process by Efremov, A. M., Murin, D. B., Kwon, K.-H.

“…The comparative research of the parameters, steady-state composition, and the effects of heterogeneous interaction in the plasma of fluorocarbon gases C x H y…”
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Parameters of Plasma and Way of Etching Silicon in a CF4 + CHF3 + O2 Mixture by Efremov, A. M., Murin, D. B., Kwon, K.-H.

“…The effect of the CF 4 /CHF 3 ratio in a CF 4 + CHF 3 + 9% O 2 mixture on the parameters of the gaseous phase and kinetics of etching of silicon under the…”
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Plasma Parameters and Kinetics of Active Particles in the Mixture CHF3 + O2 + Ar by Efremov, A. M., Murin, D. B., Kwon, K.-H.

“…The effect of the O 2 /Ar component ratio in the CHF 3 + O 2 + Ar mixture on the electrical parameters of the plasma, kinetics of active particles, and their…”
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Effect of dentinal tubule occlusion by dentifrice containing nano-carbonate apatite by LEE, S. Y., KWON, H. K., KIM, B. I.

“…Summary  This study evaluated the effects of the short‐term use of a dentifrice containing nano‐sized carbonate apatite (n‐CAP) on the occlusion of the…”
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Oncological and functional results after the surgical treatment of parotid cancer by Chung, E.-J, Lee, S.-H, Baek, S.-H, Kwon, K.-H, Chang, Y.-J, Rho, Y.-S

“…Abstract The objective of this study was to analyze the oncological and functional outcomes after the surgical treatment of parotid cancer. We reviewed 80…”
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Parameters of Plasma and Kinetics of Active Particles in CF4 (CHF3) + Ar Mixtures of a Variable Initial Composition by Efremov, A. M., Murin, D. B., Kwon, K.-H.

“…— The electrophysical parameters of plasma and the kinetics of active particles in CF 4 + Ar and CHF 3 + Ar mixtures under induction RF (13.56 MHz) discharge…”
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