Search Results - "KRISHNAN, Siddarth"

Cytomegalovirus viral load in cord blood and impact of congenital infection on markers of hematopoietic progenitor cell potency by Albano, M. Susana, Ciubotariu, Rodica, Dobrila, Ludy, Tarnawski, Michal, DeLeon, Margely, Watanabe, Chiseko, Krishnan, Siddarth, Scaradavou, Andromachi, Rubinstein, Pablo

“…BACKGROUND The low incidence of cytomegalovirus (CMV) infection in neonates decreases the risk of viral transmission with cord blood transplantation. Cord…”
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Voltage Ramp Stress for Bias Temperature Instability Testing of Metal-Gate/High- k Stacks by Kerber, A., Krishnan, S.A., Cartier, E.A.

“…A novel voltage-ramp-stress (VRS) methodology is introduced for bias temperature instability testing of metal-gate/high- k (MG/HK) CMOS devices. Results from…”
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Thickness and temperature dependence of the leakage current in hafnium-based Si SOI MOSFETs by Kim, Jiseok, Krishnan, Siddarth A., Narayanan, Sudarshan, Chudzik, Michael P., Fischetti, Massimo V.

“…► Fowler–Nordheim tunneling at high gate voltages. ► Effective barrier lowering with increasing temperature. ► Poole–Frenkel emission around operating voltages…”
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Non-Contact, Sub-Surface Detection of Alloy Segregation in Back-End of Line Copper Dual-Damascene Structures by Nag, Joyeeta, Ray, Shishir, Kohli, Kriteshwar K., Simon, Andrew H., Cohen, Brian A., Tijiwa-Birk, Felipe, Parks, Christopher J., Krishnan, Siddarth A.

“…Alloy seedlayers for copper back-end of line interconnects have become common at technology groundrules of 45 nm and below, due to reliability requirements…”
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Metal Gate-HfO2 MOS structures on GaAs substrate with and without Si interlayer by OK, Injo, KIM, Hyoung-Sub, LEE, Jack C, MANHONG ZHANG, KANG, Chang-Yong, SE JONG RHEE, CHOI, Changhwan, KRISHNAN, Siddarth A, LEE, Tackhwi, FENG ZHU, THAREJA, Gaurav

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Electric-field-driven dielectric breakdown of metal-insulator-metal hafnium silicate by Lee, Byoung Hun, Kang, Chang Yong, Kirsch, Paul, Heh, Dawei, Young, Chadwin D., Park, Hongbae, Yang, Jiwoon, Bersuker, Gennadi, Krishnan, Siddarth, Choi, Rino, Lee, Hi-Deok

“…The breakdown characteristics of the crystalline and amorphous hafnium (Hf) silicates have been studied using metal-insulator-metal capacitors. It is found…”
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Mechanistic understanding of Breakdown and Bias Temperature Instability in High-K Metal devices using inline Fast Ramped Bias Test by Krishnan, Siddarth A, Cartier, Eduard, Stathis, James, Chudzik, Michael, Kerber, Andreas

“…Reliability Qualification has historically been a time consuming affair, taking up several months in each technology node's development cycle. The recent…”
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Aggressively scaled ultrathin undoped HfO2 gate dielectric (EOT < 0.7 nm) with TaN gate electrode using engineered interface layer by CHOI, Changhwan, KANG, Chang-Yong, LEE, Jack C, SE JONG RHEE, AKBAR, Mohammad Shahariar, KRISHNAN, Siddarth A, MANHONG ZHANG, KIM, Hyoung-Sub, LEE, Tackhwi, OK, Injo, FENG ZHU

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Hafnium Titanate bilayer structure multimetal dielectric nMOSCAPs by Se Jong Rhee, Feng Zhu, Hyoung-Sub Kim, Chang Hwan Choi, Chang Yong Kang, Manhong Zhang, Tackhwi Lee, Ok, I., Krishnan, S.A., Lee, J.C.

“…A novel approach of fabricating laminated TiO/sub 2//HfO/sub 2/ bilayer multimetal oxide dielectric has been developed for high-performance CMOS applications…”
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Bulk‐Switching Memristor‐Based Compute‐In‐Memory Module for Deep Neural Network Training by Wu, Yuting, Wang, Qiwen, Wang, Ziyu, Wang, Xinxin, Ayyagari, Buvna, Krishnan, Siddarth, Chudzik, Michael, Lu, Wei D.

“…The constant drive to achieve higher performance in deep neural networks (DNNs) has led to the proliferation of very large models. Model training, however,…”
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Positive bias temperature instability effects of Hf-based nMOSFETs with various nitrogen and silicon profiles by Changhwan Choi, Chang-Seok Kang, Chang Yong Kang, Se Jong Rhee, Akbar, M.S., Krishnan, S.A., Manhong Zhang, Lee, J.C.

“…Positive bias temperature instability (PBTI) effects of HfO/sub 2/-based nMOSFETs with various nitrogen profiles in HfO/sub 2/ were investigated. The nitrogen…”
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Improving channel carrier mobility and immunity to charge trapping of high-K NMOSFET by using stacked Y2O3/HfO2 gate dielectric by FENG ZHU, SE JONG RHEE, LEE, Jack C, CHANG YONG KANG, CHANG HWAN CHOI, AKBAR, Mohammad S, KRISHNAN, Siddarth A, MANHONG ZHANG, KIM, Hyoung-Sub, LEE, Tackwhi, OK, Injo

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Investigation of transient relaxation under static and dynamic stress in Hf-based gate oxides by Akbar, M.S., Changhwan Choi, Se Jong Rhee, Krishnan, S.A., Chang Yong Kang, Man Hong Zhang, Tackhwi Lee, Ok, I., Feng Zhu, Hyoung-Sub Kim, Lee, J.C.

“…Transient relaxation, which has been addressed as an undesirable issue in high-k alternate gate dielectrics, has been studied systematically. In Hf-based…”
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Modeling of SiC transistor with counter-doped channel by Vyas, Pratik B., Pal, Ashish, Weeks, Stephen, Holt, Joshua, Srivastava, Aseem K., Megalini, Ludovico, Krishnan, Siddarth, Chudzik, Michael, Bazizi, El Mehdi, Ayyagari-Sangamalli, Buvna

“…In this paper, we present a modeling framework to simulate the electrical characteristics of SiC MOSFET. Our model also describes the mobility improvement with…”
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Novel Materials and Processes in Replacement Metal Gate for Advanced CMOS Technology by Bao, Ruqiang, Hung, Steven, Wang, Miaomiao, Chung, Kisup, Barman, Soumendra, Krishnan, Siddarth A, Yang, Yixiong, Tang, Wei, Li, Luping, Lin, Yongjing, Chan, Michael S, Chen, Zhebo, Miao, Xin, Hopstaken, Marinus, Conti, Richard A, Jagannathan, Hemanth, Chudzik, Michael P, McHerron, Dalea, Haran, Bala S, Natarajan, Sanjay

“…This paper addresses novel approaches at material and integration fronts for gate applications. Material wise, new n work function metal (WFM) material is…”
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Cord Blood Units (CBU) Selected for Transplantation from a Single CB Bank over 10 Years: High Correlation of Potency/Quality Among Pre-Cryopreservation and Post-Thaw Segment Measurements and Time to Engraftment by Albano, Maria S., Dobrila, Ludy, Tarnawski, Michal, Sung, Dorothy, Masson Frenet, Emeline, Romeo, Cynthia, Zhu, Tracy, Watanabe, Chiseko, Zamfir, Dan, Krishnan, Siddarth, Rubinstein, Pablo, Scaradavou, Andromachi

“…Background: CBU selection for transplant is based on HLA match and potency/quality determinations associated with the speed of hematopoietic engraftment. Total…”
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An 8-bit 20.7 TOPS/W Multi-Level Cell ReRAM-based Compute Engine by Correll, Justin M., Jie, Lu, Song, Seungheun, Lee, Seungjong, Zhu, Junkang, Tang, Wei, Wormald, Luke, Erhardt, Jack, Breil, Nicolas, Quon, Roger, Kamalanathan, Deepak, Krishnan, Siddarth, Chudzik, Michael, Zhang, Zhengya, Lu, Wei D., Flynn, Michael P.

“…Analog compute in memory with Multi-Level Cell (MLC) ReRAM promises highly dense and efficient compute support for machine learning and scientific computing…”
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Systematic analysis of silicon oxynitride interfacial layer and its effects on electrical characteristics of high-k HfO2 transistor by Rhee, Se Jong, Zhu, Feng, Kim, Hyoung-Sub, Kang, Chang Yong, Choi, Chang Hwan, Zhang, Manhong, Lee, Tackhwi, Ok, Injo, Krishnan, Siddarth A., Lee, Jack C.

“…High-k hafnium oxide dielectric metal-oxide-semiconductor field-effect transistors with several physical thicknesses of silicon oxynitride interfacial layers…”
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Negative Bias Temperature Instability Dependence on Dielectric Thickness and Nitrogen Concentration in Ultra-scaled HfSiON Dielectric/TiN Gate Stacks by Krishnan, Siddarth A., Quevedo, Manuel, Harris, Rusty, Kirsch, Paul D., Choi, Rino, Lee, Byoung Hun, Bersuker, Gennadi, Lee, Jack C.

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Cytomegalovirus (CMV) Viral Load in Cord Blood (CB) Donors and Impact of Congenital Viremia on Markers of Hematopoietic Progenitor Cell (HPC) Potency by Albano, Maria S, Ciubotariu, Rodica, Watanabe, Chiseko, Krishnan, Siddarth, Tarnawski, Michal, Dobrila, Ludy, Scaradavou, Andromachi, Rubinstein, Pablo

“…CMV infection is an established risk factor in patients undergoing hematopoietic stem cell transplantation (HSCT). Hence, the status of the donor is carefully…”
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