Search Results - "KIM, Taeseung"
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Predicting synergy in atomic layer etching
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-09-2017)“…Atomic layer etching (ALE) is a multistep process used today in manufacturing for removing ultrathin layers of material. In this article, the authors report on…”
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Journal Article -
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Directional etch of magnetic and noble metals. II. Organic chemical vapor etch
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-09-2017)“…Surface oxidation states of transition (Fe and Co) and noble (Pd and Pt) metals were tailored by controlled exposure to O2 plasmas, thereby enabling their…”
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3
Ion beam assisted organic chemical vapor etch of magnetic thin films
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-05-2017)“…An ion beam-assisted organic vapor etch process is demonstrated for patterning magnetic metal elements for potential applications in magnetoresistive random…”
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4
Directional etch of magnetic and noble metals. I. Role of surface oxidation states
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-09-2017)“…An organic chemical etch process based on tailoring the surface oxidation state was found to be effective in realizing directional etch of magnetic and noble…”
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Viable chemical approach for patterning nanoscale magnetoresistive random access memory
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-03-2015)“…A reactive ion etching process with alternating Cl2 and H2 exposures has been shown to chemically etch CoFe film that is an integral component in…”
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6
Thermodynamic assessment and experimental verification of reactive ion etching of magnetic metal elements
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-07-2014)“…A thermodynamic analysis of etch chemistries for Co, Fe, and Ni using a combination of hydrogen, oxygen, and halogen gases suggested that a single etchant does…”
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Effect of residual H2O on epitaxial AlN film growth on 4H-SiC by alternating doses of TMA and NH3
Published in Applied surface science (30-09-2014)“…•An epitaxial AlN film was synthesized on 4H-SiC using alternate doses of trimethyl aluminum (TMA) and anhydrous ammonia (a-NH3) at 540°C.•The growth per cycle…”
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Naturally occurring radioactive materials (NORM) in the groundwater of two islands with various geologic settings in South Korea
Published in Geologia Croatica (01-06-2018)“…Since 2007, Naturally Occurring Radioactive Materials (NORM) such as uranium-238 and radon-222 etc. in groundwater from the Community Water-supply Systems…”
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Synthesis and Electrochemical Properties of Hydrosulfide Solid Electrolytes
Published in The Korean journal of chemical engineering (02-08-2024)Get full text
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10
X-ray-Initiated Metal-Promoted Thin Film Growth
Published in Journal of physical chemistry. C (19-04-2012)“…In many applications, the deposition of solid films requires control over thickness, conformality, and possibly spatial resolution. Polymeric films are often…”
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11
Surface Chemistry of Pentakis(dimethylamido)tantalum on Ta Surfaces
Published in Journal of physical chemistry. C (28-04-2011)“…The surface chemistry of pentakis(dimethylamido)tantalum (PDMAT), a precursor commonly used for atomic layer deposition (ALD), has been investigated on a Ta…”
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12
Enhanced battery capacity and cycle life due to suppressed side reactions on the surface of Ni-rich LiNi 0.8 Co 0.1 Mn 0.1 O 2 cathode materials coated with Co 3 (PO 4 ) 2
Published in Journal of colloid and interface science (15-09-2024)“…This study explores a strategy to mitigate capacity fading in secondary batteries, which is primarily attributed to side reactions caused by residual Li…”
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13
Enhanced battery capacity and cycle life due to suppressed side reactions on the surface of Ni-rich LiNi0.8Co0.1Mn0.1O2 cathode materials coated with Co3(PO4)2
Published in Journal of colloid and interface science (15-09-2024)“…This illustration demonstrates that coating NCM811 with Co3(PO4)2 effectively reduces residual Li+ ions on its surface, offering a practical solution to…”
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14
Predictive radon potential mapping in groundwater: a case study in Yongin, Korea
Published in Environmental earth sciences (01-08-2017)“…The purpose of this work was to calculate the relationships between radon levels in groundwater and spatial factors (e.g., geology, topography, soil, and…”
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Atomic layer deposition of YMnO3 thin films
Published in Journal of magnetism and magnetic materials (15-03-2020)“…•YMO thin films synthesized by radical-enhanced atomic layer deposition process.•The structural and morphological studies of films were carried out by XRD and…”
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Mechanistic study of atomic layer deposition of AlxSiyO thin film via in-situ FTIR spectroscopy
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-09-2015)“…A study of surface reaction mechanism on atomic layer deposition (ALD) of aluminum silicate (AlxSiyO) was conducted with trimethylaluminum (TMA) and…”
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17
Development of Flexible Dual-type Proximity Sensor with Resonant Frequency for Robotic Applications
Published in 2019 IEEE/RSJ International Conference on Intelligent Robots and Systems (IROS) (01-11-2019)“…This paper presents a flexible dual-type proximity sensor forrobotic applications such as human collaborative robots(HCRs) todetect the surroundings. The…”
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Conference Proceeding -
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Hydrogen-Rich Argyrodite Solid Electrolytes for NCM/Li All-Solid-State batteries
Published in ACS energy letters (13-09-2024)“…Argyrodite-type ionic conductors have received significant attention as solid electrolyte systems for all-solid-state batteries due to their high ionic…”
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In-situ etch rate study of HfxLayOz in Cl-2/BCl3 plasmas using the quartz crystal microbalance
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-05-2015)“…The etch rate of HfxLayOz films in Cl-2/BCl3 plasmas was measured in-situ in an inductively coupled plasma reactor using a quartz crystal microbalance and…”
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Elucidating the Surface Reaction Mechanisms During Atomic Layer Deposition of Li x Al y Si z O by in Situ Fourier Transform Infrared Spectroscopy
Published in Journal of physical chemistry. C (09-06-2016)“…Reaction mechanisms in the atomic layer deposition (ALD) of Li x Al y Si z O (LASO) using a LiOC(CH3)3/H2O–Al(CH3)3/H2O–Si(OCH2CH3)4/H2O chemistry were…”
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