Search Results - "KIM, Keeho"

Photoresist ashing technology using N2/O2 ferrite-core ICP in the dual damascene process by HYOUN WOO KIM, JU HYUN MYUNG, GEUN YOUNG YEOM, MYOUNG, Jae-Min, KIM, Hyoung-June, JONG WOO LEE, KIM, Hyung-Sun, KIM, Keeho, JANG, Jeong-Yeol, YOON, Tae-Ho, SUNG KYEONG KIM, CHOI, Dae-Kyu, CHUNG, Chin-Wook

“…In this paper, we have used the N2/O2 plasma and varied the O2/(N2 + O2) gas flow ratio in the range of 0.05-0.25 with respect to the PR ashing rate and low-k…”
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The influence of thiourea on copper electrodeposition: Adsorbate identification and effect on electrochemical nucleation by Kang, Moo Seong, Kim, Soo-Kil, Kim, Keeho, Kim, Jae Jeong

“…The effect of thiourea on copper deposition onto a copper seed layer from an electrolyte composed of CuSO 4, H 2SO 4, deionized water, and thiourea was…”
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From Neo-orthodox Theology to Rationalistic Deism: A Study of the Religious Influences on the Development of John Rawls's Political Philosophy by Kim, Keeho

“…The purpose of this dissertation is to demonstrate that John Rawls's early religious beliefs guided the development of his later political philosophy. By first…”
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A Curvilinear OPC Workflow for Highly Repetitive Structures and High Aspect Ratio Patterns by Gao, Xing, Chen, Ken, Li, Xiaomeng, Zhao, Xuan, Kim, Keeho, Zhang, Xima, Zhu, Cynthia

“…In this study, a workflow based on curvilinear OPC (CLOPC) & memory OPC (MEMOPC) is introduced. In the workflow, the curvilinear-based method is applied on…”
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OPC Methodology To Overcome Mask Error Effect On Below 0.25 um Lithography Generation by Keeho Kim, Madhavan, S., Lilygren, J.

“…In this paper, we try to build up new simulation methodology to obtain the better matching results between simulation and real experimental results…”
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A Workflow of Hotspot Prediction based on Semi-Supervised Machine Learning Methodology by Zhang, Wenwen, Chen, Ken, Li, Xiaomei, Ma, Yuansheng, Zhu, Cynthia, Chen, Baron, Gao, Xing, Kim, Keeho

“…Fast lithography hotspot (HS) detection flow becomes critical with continuously improving manufacturing conditions. A feature-vector-based machine learning…”
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Etching characteristics of photoresist and low- k dielectrics by Ar/O 2 ferrite-core inductively coupled plasmas by Kim, Hyoun Woo, Lee, Jong Woo, Hwang, Woon Suk, O, Beom Hoan, Lee, Seung Gol, Park, Se-Geun, Kim, Joohee, Chung, Duck Jin, Chang, Sung Pil, Joo, Young-Chang, Joo, Junghoon, Chung, Chin Wook, Park, Wan Jae, Kang, Chang-Jin, Joo, Sukho, Park, Soon Oh, Yoo, Chung-Gon, Kim, Sung Kyeong, Lee, Joung Ho, Cho, Sang-Deog, Choi, Dae-Kyu, Kim, Keeho, Jang, Jeong-Yeol

“…We have investigated the characteristics of Ar/O 2 plasmas in terms of the photoresist (PR) and low- k material etching using a ferrite-core inductively…”
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Etching characteristics of photoresist and low-k dielectrics by Ar/O2 ferrite-core inductively coupled plasmas by HYOUN WOO KIM, JONG WOO LEE, JOO, Junghoon, CHIN WOOK CHUNG, WAN JAE PARK, KANG, Chang-Jin, JOO, Sukho, SOON OH PARK, YOO, Chung-Gon, SUNG KYEONG KIM, JOUNG HO LEE, CHO, Sang-Deog, WOON SUK HWANG, CHOI, Dae-Kyu, KIM, Keeho, JANG, Jeong-Yeol, BEOM HOAN O, SEUNG GOL LEE, PARK, Se-Geun, KIM, Joohee, DUCK JIN CHUNG, SUNG PIL CHANG, JOO, Young-Chang

“…We have investigated the characteristics of Ar/O2 plasmas in terms of the photoresist (PR) and low-k material etching using a ferrite-core inductively coupled…”
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Optical Proximity Correction Methodology to Counteract Mask Error Effects in Sub-0.25 µm Lithography Generations by Kim, Keeho, Lilygren, John, Madhavan, Sriram

“…A new methodology for optical proximity correction design is required for sub-0.25 µm device generation, to predict and counteract mask error effects. We…”
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Examination of Tobin's q for Takeover Firms by Kim, Keeho, Henderson, Glenn V., Garrison, Sharon Hatten

“…This study investigates whether the Tobin's q's for firms involved in takeovers are significantly different from those of similar firms not involved in…”
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