Search Results - "Kärkkänen, Irina"

Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition by Kot, Małgorzata, Henkel, Karsten, Das, Chittaranjan, Brizzi, Simone, Kärkkänen, Irina, Schneidewind, Jessica, Naumann, Franziska, Gargouri, Hassan, Schmeißer, Dieter

“…A comparative study of thin titanium oxynitride (TiOxNy) films prepared by plasma enhanced atomic layer deposition using tetrakis(dimethylamino)titanium…”
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In-gap states in titanium dioxide and oxynitride atomic layer deposited films by Henkel, Karsten, Das, Chittaranjan, Kot, Małgorzata, Schmeißer, Dieter, Naumann, Franziska, Kärkkänen, Irina, Gargouri, Hassan

“…Valence band (VB) spectra of titanium dioxide (TiO2) and oxynitride (TiOxNy) films prepared by different atomic layer deposition (ALD) processes are compared…”
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Impedance spectroscopy study of the unipolar and bipolar resistive switching states of atomic layer deposited polycrystalline ZrO2 thin films by Kärkkänen, Irina, Shkabko, Andrey, Heikkilä, Mikko, Vehkamäki, Marko, Niinistö, Jaakko, Aslam, Nabeel, Meuffels, Paul, Ritala, Mikko, Leskelä, Markku, Waser, Rainer, Hoffmann-Eifert, Susanne

“…The polarity of the resistive switching (RS) characteristic of metal‐oxide‐metal devices from atomic layer deposited polycrystalline ZrO2 films was studied by…”
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Analysis of nitrogen species in titanium oxynitride ALD films by Sowińska, Małgorzata, Brizzi, Simone, Das, Chittaranjan, Kärkkänen, Irina, Schneidewind, Jessica, Naumann, Franziska, Gargouri, Hassan, Henkel, Karsten, Schmeißer, Dieter

“…Titanium oxynitride films are prepared by plasma enhanced atomic layer deposition method using two different precursors and nitrogen sources. Synchrotron…”
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Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study by Sowińska, Małgorzata, Henkel, Karsten, Schmeißer, Dieter, Kärkkänen, Irina, Schneidewind, Jessica, Naumann, Franziska, Gruska, Bernd, Gargouri, Hassan

“…The process parameters' impact of the plasma-enhanced atomic layer deposition (PE-ALD) method on the oxygen to nitrogen (O/N) ratio in titanium oxynitride…”
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Study of atomic layer deposited ZrO2 and ZrO2/TiO2 films for resistive switching application by Kärkkänen, Irina, Shkabko, Andrey, Heikkilä, Mikko, Niinistö, Jaakko, Ritala, Mikko, Leskelä, Markku, Hoffmann-Eifert, Susanne, Waser, Rainer

“…Thin ZrO2 films and ZrO2/TiO2 bilayers grown by atomic layer deposition (ALD) are integrated into metal–oxide–metal (MOM) structures for investigation of…”
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Modelling of gas sensitivity for p-type semiconducting thin films by Jaaniso, Raivo, Kärkkänen, Irina, Floren, Aare

“…A model is presented for describing the conductivity dependencies of p-type thin film sensors from oxygen and CO pressures. The model basis on the kinetic…”
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Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD” by Ahvenniemi, Esko, Akbashev, Andrew R., Ali, Saima, Bechelany, Mikhael, Berdova, Maria, Boyadjiev, Stefan, Cameron, David C., Chen, Rong, Chubarov, Mikhail, Cremers, Veronique, Devi, Anjana, Drozd, Viktor, Elnikova, Liliya, Gottardi, Gloria, Grigoras, Kestutis, Hausmann, Dennis M., Hwang, Cheol Seong, Jen, Shih-Hui, Kallio, Tanja, Kanervo, Jaana, Khmelnitskiy, Ivan, Kim, Do Han, Klibanov, Lev, Koshtyal, Yury, Krause, A. Outi I., Kuhs, Jakob, Kärkkänen, Irina, Kääriäinen, Marja-Leena, Kääriäinen, Tommi, Lamagna, Luca, Łapicki, Adam A., Leskelä, Markku, Lipsanen, Harri, Lyytinen, Jussi, Malkov, Anatoly, Malygin, Anatoly, Mennad, Abdelkader, Militzer, Christian, Molarius, Jyrki, Norek, Małgorzata, Özgit-Akgün, Çağla, Panov, Mikhail, Pedersen, Henrik, Piallat, Fabien, Popov, Georgi, Puurunen, Riikka L., Rampelberg, Geert, Ras, Robin H. A., Rauwel, Erwan, Roozeboom, Fred, Sajavaara, Timo, Salami, Hossein, Savin, Hele, Schneider, Nathanaelle, Seidel, Thomas E., Sundqvist, Jonas, Suyatin, Dmitry B., Törndahl, Tobias, van Ommen, J. Ruud, Wiemer, Claudia, Ylivaara, Oili M. E., Yurkevich, Oksana

“…Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas–solid reactions, has become the method of…”
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Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties by Das, Chittaranjan, Henkel, Karsten, Tallarida, Massimo, Schmeißer, Dieter, Gargouri, Hassan, Kärkkänen, Irina, Schneidewind, Jessica, Gruska, Bernd, Arens, Michael

“…Titanium oxide (TiO2) deposited by atomic layer deposition (ALD) is used as a protective layer in photocatalytic water splitting system as well as a dielectric…”
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Impedance spectroscopy study of the unipolar and bipolar resistive switching states of atomic layer deposited polycrystalline ZrO 2 thin films by Kärkkänen, Irina, Shkabko, Andrey, Heikkilä, Mikko, Vehkamäki, Marko, Niinistö, Jaakko, Aslam, Nabeel, Meuffels, Paul, Ritala, Mikko, Leskelä, Markku, Waser, Rainer, Hoffmann‐Eifert, Susanne

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Thermal and plasma enhanced atomic layer deposition of TiO{sub 2}: Comparison of spectroscopic and electric properties by Das, Chittaranjan, Henkel, Karsten, Tallarida, Massimo, Schmeißer, Dieter, Gargouri, Hassan, Kärkkänen, Irina, Schneidewind, Jessica, Gruska, Bernd, Arens, Michael

“…Titanium oxide (TiO{sub 2}) deposited by atomic layer deposition (ALD) is used as a protective layer in photocatalytic water splitting system as well as a…”
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Study of atomic layer deposited Zr O 2 and Zr O 2 / T i O 2 films for resistive switching application by Kärkkänen, Irina, Shkabko, Andrey, Heikkilä, Mikko, Niinistö, Jaakko, Ritala, Mikko, Leskelä, Markku, Hoffmann‐Eifert, Susanne, Waser, Rainer

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