Search Results - "Kääriäinen, T.O."
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An atomic layer deposition process for moving flexible substrates
Published in Chemical engineering journal (Lausanne, Switzerland : 1996) (15-06-2011)“…A new design of atomic layer deposition (ALD) system for deposition on to moving flexible substrates has been demonstrated. The basic design is a cylindrical…”
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Journal Article -
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Titanium dioxide thin films, their structure and its effect on their photoactivity and photocatalytic properties
Published in Thin solid films (30-10-2009)“…Atomic Layer Deposition has been used to deposit titanium dioxide thin films on soda-lime glass substrates. A series of films with thicknesses from 2.6 to…”
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Journal Article -
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Surface modification of polymers by plasma-assisted atomic layer deposition
Published in Surface & coatings technology (25-07-2011)“…The inhomogeneous and hydrophobic surface characteristics of many polymers can be incompatible with other substances which are required for their further…”
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