Search Results - "Jung, Wojciech"
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Enhancement of Ru-Si-O/In-Ga-Zn-O MESFET Performance by Reducing Depletion Region Trap Density
Published in IEEE electron device letters (01-05-2015)“…In this letter, we investigated the effect of magnetron cathode current (I c ) during reactive sputtering of In-Ga-Zn-O (a-IGZO) channel layer on properties of…”
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2
Temperature-dependent electrical characterization of high-voltage AlGaN/GaN-on-Si HEMTs with Schottky and ohmic drain contacts
Published in Solid-state electronics (01-09-2015)“…[Display omitted] •We fabricated HV AlGaN/GaN-on-Si HEMTs with Schottky and ohmic drain electrodes.•We examine impact of temperature on the electrical…”
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3
Transparent Amorphous Ru-Si-O Schottky Contacts to In-Ga-Zn-O
Published in Journal of display technology (01-06-2015)“…Transparent amorphous oxide semiconductors (TAOSs), such as In-Ga-Zn-O (a-IGZO), are the subject of intensive experimental and theoretical research aimed at…”
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In-Ga-Zn-O MESFET with transparent amorphous Ru-Si-O Schottky barrier
Published in Physica status solidi. PSS-RRL. Rapid research letters (01-07-2014)“…Rectifying transparent amorphous Ru–Si–O Schottky contacts to In–Ga–Zn–O have been fabricated by means of reactive sputtering without any annealing processes…”
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5
Influence of pressure annealing on electrical properties of Mn implanted silicon
Published in Vacuum (15-06-2007)“…The effect of annealing at 610–720 K under enhanced hydrostatic pressure (HP) on electrical properties of manganese implanted Czochralski grown silicon…”
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Study of defects in the near-surface layer created in silicon by H 2 + or He + implantation
Published in Vacuum (25-05-2007)“…Thermal donors formation in silicon implanted with H 2 + or He + ions or co-implanted with both kinds of ions and annealed at 720 K under atmospheric and…”
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7
Study of defects in the near-surface layer created in silicon by H2+ or He+ implantation
Published in Vacuum (25-05-2007)Get full text
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8
Dislocation-related photoluminescence from processed Si
Published in Journal of materials science. Materials in electronics (01-12-2008)“…Dislocation-related photoluminescence (PL) from oxygen containing Czochralski silicon (Cz-Si) processed at up to 1,400 K (HT) under atmospheric and enhanced Ar…”
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Journal Article Conference Proceeding -
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Growth of PbSe thin films on Si substrates by pulsed laser deposition method
Published in Journal of crystal growth (01-05-2003)“…Fabrication of p-type PbSe thin films on (1 1 1) and (1 0 0)-oriented silicon substrates by the pulsed laser deposition method is demonstrated. The PbSe films…”
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10
High-quality p–n junction fabrication by ion implantation using the LPCVD amorphous silicon films
Published in Vacuum (10-03-2003)“…A novel technique of manufacturing high electric performance p–n junctions has been investigated in this paper. In the first step, amorphous silicon films…”
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Journal Article Conference Proceeding -
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Electron eigen states in quantum dots revealed by temperature derivative capacitance spectroscopy
Published in 2010 3rd International Nanoelectronics Conference (INEC) (01-01-2010)“…A novel method is presented for detecting confined energy states of quantum dots embedded in junction space charge regions. By determining the temperature…”
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Conference Proceeding