Search Results - "Jun Suda"
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Impact Ionization Coefficients in 4H-SiC Toward Ultrahigh-Voltage Power Devices
Published in IEEE transactions on electron devices (01-10-2015)“…A temperature dependence of impact ionization coefficients in 4H-SiC was studied in a wide range of electric field toward the accurate designing of…”
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2
Nitrogen-displacement-related electron traps in n-type GaN grown on a GaN freestanding substrate
Published in Applied physics letters (04-01-2021)“…Energy levels due to intrinsic point defects are identified by deep-level transient spectroscopy (DLTS). Electron-beam (EB) irradiation created nitrogen…”
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3
Correlation between non-ionizing energy loss and production rate of electron trap at EC − (0.12–0.20) eV formed in gallium nitride by various types of radiation
Published in Applied physics letters (02-01-2023)“…Production rate (PR = trap concentration/incident fluence) of traps formed by energetic particles is important for predicting device degradation caused by…”
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Highly effective activation of Mg-implanted p-type GaN by ultra-high-pressure annealing
Published in Applied physics letters (30-09-2019)“…A high activation ratio of acceptors to Mg ions implanted into a homoepitaxial GaN layer was achieved through an ultra-high-pressure annealing (UHPA) process…”
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5
Dependence of Electrical Characteristics on Epitaxial Layer Structure of AlGaN/GaN HEMTs Fabricated on Freestanding GaN Substrates
Published in IEEE transactions on electron devices (01-01-2022)“…This article reports a systematic study on the effects of the epitaxial layer structure on the electrical characteristics of AlGaN/GaN high electron mobility…”
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RF characteristics of 150‐nm AlGaN/GaN high electron mobility transistors fabricated using i‐line stepper lithography
Published in Electronics letters (01-05-2023)“…This article reports radio frequency characteristics of 150‐nm gate aluminum gallium nitride (AlGaN)/gallium nitride (GaN) high electron mobility transistors…”
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7
Nitrogen-displacement-related recombination centers generated by electron beam irradiation in n-type and p-type homoepitaxial GaN layers
Published in Applied physics express (01-01-2024)“…Recombination centers originating from point defects generated by the displacement of N atoms in n-type and p-type GaN were investigated by analyzing…”
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Temperature dependence of the local electronic properties of n-type GaN crystals by micro-Raman spectroscopy and dielectric dispersion at high temperatures
Published in Japanese Journal of Applied Physics (01-04-2021)“…Raman spectra for longitudinal optical phonon-plasmon coupled mode in n-type GaN crystals were measured from room temperature to 200 °C by micro-Raman…”
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9
Fabrication of 150‐nm AlGaN/GaN field‐plated High Electron Mobility Transistors using i‐line stepper
Published in Electronics letters (01-11-2021)“…This article reports a high throughput 150‐nm‐gate AlGaN/GaN high electron mobility transistor (HEMT) process using i‐line stepper lithography and a thermal…”
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10
Space-Modulated Junction Termination Extension for Ultrahigh-Voltage p-i-n Diodes in 4H-SiC
Published in IEEE transactions on electron devices (01-02-2012)“…An edge termination method, referred to as space-modulated junction termination extension (SMJTE) combined with a mesa structure, is presented for…”
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11
Influence of fixed charges and trapped electrons on free electron mobility at 4H-SiC(0001)/SiO2 interfaces with gate oxides annealed in NO or POCl3
Published in Applied physics express (12-08-2024)“…Free electron mobility ( μ _free ) in 4H-SiC(0001) MOSFETs with gate oxides annealed in NO or POCl _3 was calculated in a wide range of effective normal field…”
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12
Improvement of AlSiO/GaN interface by a novel post deposition annealing using ultra high pressure
Published in Applied physics express (01-01-2024)“…In this study, a novel post-deposition annealing (PDA) technique employing ultra-high pressure was demonstrated for the first time. A 40 nm thick AlSiO gate…”
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13
Determination of Surface Recombination Velocity From Current-Voltage Characteristics in SiC p-n Diodes
Published in IEEE transactions on electron devices (01-11-2018)“…Surface recombination velocity on mesa sidewalls of SiC p-n diodes with various surface passivation conditions was evaluated from the device-size-dependent…”
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14
Realization of low specific-contact-resistance on N-polar GaN surfaces using heavily-Ge-doped n-type GaN films deposited by low-temperature reactive sputtering technique
Published in Applied physics express (01-03-2024)“…We developed a low-temperature ohmic contact formation process for N-polar GaN surfaces. Specific-contact-resistances of 9.4 × 10 −5 and 2.0 × 10 −5 Ω cm 2…”
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15
Correlation between shapes of Shockley stacking faults and structures of basal plane dislocations in 4H-SiC epilayers
Published in Philosophical magazine (Abingdon, England) (23-10-2017)“…Shockley-type stacking faults expanded in 4H-SiC epilayers induced by ultraviolet illumination were investigated using a photoluminescence imaging method, a…”
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Mg-implanted bevel edge termination structure for GaN power device applications
Published in Applied physics letters (01-03-2021)“…Herein, we propose and demonstrate the edge termination for GaN-based one-sided abrupt p–n junctions. The structure is comprised of a combination of a shallow…”
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17
Deep-level transient spectroscopy studies of electron and hole traps in n-type GaN homoepitaxial layers grown by quartz-free hydride-vapor-phase epitaxy
Published in Applied physics letters (01-07-2019)“…We studied deep levels in quartz-free hydride-vapor-phase epitaxy (QF-HVPE)-grown homoepitaxial n-type GaN layers within which three electron and eight hole…”
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18
Interface state density of SiO2/p-type 4H-SiC ( 0001 ), ( 11 2 ¯ 0 ), ( 1 1 ¯ 00 ) metal-oxide-semiconductor structures characterized by low-temperature subthreshold slopes
Published in Applied physics letters (11-04-2016)“…Interface properties of heavily Al-doped 4H-SiC ( 0001 ) (Si-face), ( 11 2 ¯ 0 ) (a-face), and ( 1 1 ¯ 00 ) (m-face) metal-oxide-semiconductor (MOS) structures…”
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Effects of ultra-high-pressure annealing on characteristics of vacancies in Mg-implanted GaN studied using a monoenergetic positron beam
Published in Scientific reports (15-10-2020)“…Vacancy-type defects in Mg-implanted GaN were probed by using a monoenergetic positron beam. Mg ions were implanted into GaN to obtain 0.3-μm-deep box profiles…”
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20
Characterization of stacking faults in 4H-SiC epilayers by room-temperature microphotoluminescence mapping
Published in Applied physics letters (02-06-2008)Get full text
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