Search Results - "Jo, Minseok"
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Rewritable Switching of One Diode-One Resistor Nonvolatile Organic Memory Devices
Published in Advanced materials (Weinheim) (19-03-2010)“…One diode–one resistor (1D–1R) hybrid‐type devices consisting of an inorganic Schottky diode and an organic unipolar memory show electrically rewritable…”
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Journal Article -
2
Domain Knowledge-Based Neural Network Architecture for End-to-End Multiuser Precoding in Massive MIMO System
Published in 2023 IEEE 97th Vehicular Technology Conference (VTC2023-Spring) (01-06-2023)“…This paper investigates an end-to-end multiuser precoding in massive multiple-input multiple-output (MIMO) system. We propose a novel neural network…”
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Conference Proceeding -
3
Clickable Object Detection Network for a Wide Range of Mobile Screen Resolutions
Published in IEEE access (2022)“…Recently, as the development cycle of applications has been shortened, it is important to develop rapid and accurate application testing technology. Since…”
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Journal Article -
4
Investigation of State Stability of Low-Resistance State in Resistive Memory
Published in IEEE electron device letters (01-05-2010)“…We investigated the state stability of the low-resistance state (LRS) in a resistive switching memory having a Pt/Cu:MoO x /GdO x /Pt structure. Various…”
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Journal Article -
5
Nonvolatile Memory Functionality of ZnO Nanowire Transistors Controlled by Mobile Protons
Published in ACS nano (25-01-2011)“…We demonstrated the nonvolatile memory functionality of ZnO nanowire field effect transistors (FETs) using mobile protons that are generated by high-pressure…”
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Journal Article -
6
Improved Switching Uniformity and Speed in Filament-Type RRAM Using Lightning Rod Effect
Published in IEEE electron device letters (01-01-2011)“…Improved switching uniformity and speed were demonstrated using a filament-type resistive memory. By using a gradual reset operation, a leaky high resistance,…”
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Journal Article -
7
Development of a Semiempirical Compact Model for DC/AC Cell Operation of HfOx-Based ReRAMs
Published in IEEE electron device letters (01-09-2013)Get full text
Journal Article -
8
Materials and process aspect of cross-point RRAM (invited)
Published in Microelectronic engineering (01-07-2011)“…A survey of non-volatile and highly scalable cross-point memory in nanoscale resistive switching device is introduced. We present the basic operation of…”
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Journal Article Conference Proceeding -
9
Transient reverse current phenomenon in a p-n heterojunction comprised of poly(3,4-ethylene-dioxythiophene):poly(styrene-sulfonate) and ZnO nanowall
Published in Applied physics letters (22-09-2008)“…We report the characteristics of a p-n heterojunction diode comprised of a poly(3,4-ethylene-dioxythiophene):poly(styrene-sulfonate) (PEDOT:PSS) as the…”
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Journal Article -
10
Development of a Semiempirical Compact Model for DC/AC Cell Operation of }-Based ReRAMs
Published in IEEE electron device letters (01-09-2013)“…A semiempirical model that can simulate dc and pulse (ac) characteristics of filament-type HfO x -based resistance change random access memory (ReRAM) devices…”
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Journal Article -
11
Self-formed Schottky barrier induced selector-less RRAM for cross-point memory applications
Published in Physica status solidi. PSS-RRL. Rapid research letters (01-11-2012)“…We propose a selector‐less Pr0.7Ca0.3MnO3 (PCMO) based resistive‐switching RAM (RRAM) for high‐density cross‐point memory array applications. First, we…”
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Journal Article -
12
New Set/Reset Scheme for Excellent Uniformity in Bipolar Resistive Memory
Published in IEEE electron device letters (01-03-2011)“…We proposed a new set/reset operation scheme to improve the switching uniformity of filament-type resistive memory. By controlling the magnitude of the sweep…”
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Journal Article -
13
Improved switching uniformity of a carbon-based conductive-bridge type ReRAM by controlling the size of conducting filament
Published in Microelectronic engineering (01-06-2011)“…We investigated the resistive switching properties of a amorphous carbon-based ReRAM device. In order to minimize the fluctuations of switching parameters, we…”
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Journal Article -
14
New Insight Into PBTI Evaluation Method for nMOSFETs With Stacked High- k/IL Gate Dielectric
Published in IEEE electron device letters (01-11-2012)“…In this letter, a strategy to minimize the error in lifetime projections using a positive bias temperature instability (PBTI) test has been proposed. Two…”
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Journal Article -
15
Noise-Analysis-Based Model of Filamentary Switching ReRAM With \hbox/\hbox Stacks
Published in IEEE electron device letters (01-07-2011)“…In this letter, we propose a model based on noise analysis for the filamentary switching mechanism in resistance random access memory having ZrOx/HfOx bilayer…”
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Journal Article -
16
Effects of channel-length scaling on In2O3 nanowire field effect transistors studied by conducting atomic force microscopy
Published in Applied physics letters (23-04-2007)“…Scaling effects of In2O3 nanowire field effect transistors (FETs) were examined as a function of channel length. The channel length was varied from 1μmto20nm…”
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Journal Article -
17
Contribution of Interface States and Oxide Traps to the Negative Bias Temperature Instability of High- k pMOSFETs
Published in IEEE electron device letters (01-03-2009)“…Negative bias temperature instability (NBTI) in MOSFETs with high-dielectric-constant ( k ) gate dielectrics has been investigated using a novel pulse NBTI…”
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Journal Article -
18
Impact of high-pressure deuterium oxide annealing on the blocking efficiency and interface quality of metal-alumina-nitride-oxide-silicon-type flash memory devices
Published in Applied physics letters (05-11-2007)“…We have investigated the effect of high-pressure deuterium oxide annealing (HPDOA) on metal-alumina-nitride-oxide-silicon-type flash memory device. HPDOA was…”
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Journal Article -
19
Droplet evaporation-induced ferritin self-assembled monolayer as a template for nanocrystal flash memory
Published in Applied physics letters (07-05-2007)“…A nonvolatile nanocrystal (NC) memory containing a ferritin core was fabricated. A ferritin monolayer was formed through a droplet evaporation technique…”
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Journal Article -
20
Effect of Fast Components in Threshold-Voltage Shift on Bias Temperature Instability in High- k MOSFETs
Published in IEEE electron device letters (01-04-2010)“…The effect of fast components in the threshold-voltage shift (¿V th ) induced by electrical stress on the lifetime of bias temperature instability (BTI) is…”
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