Search Results - "Jamba, D. M."
-
1
Molecular beam epitaxial growth and performance of HgCdTe-based simultaneous-mode two-color detectors
Published in Journal of electronic materials (01-06-1998)Get full text
Journal Article -
2
Molecular beam epitaxial growth and performance of integrated two-color HgCdTe detectors operating in the mid-wave infrared band
Published in Journal of electronic materials (01-06-1997)Get full text
Journal Article -
3
Integrated multi-sensor system for real-time monitoring and control of HgCdTe MBE
Published in Journal of electronic materials (01-06-1999)“…We describe an integrated real-time sensing and control system for monitoring and controlling substrate temperature, layer composition, and effusion cell flux…”
Get full text
Journal Article -
4
HgCdTe molecular beam epitaxy technology: a focus on material properties
Published in Journal of electronic materials (01-05-1995)Get full text
Conference Proceeding Journal Article -
5
High performance HgCdTe two-color infrared detectors grown by molecular beam epitaxy
Published in Journal of crystal growth (01-05-1997)“…High-performance in situ doped two-color detectors with the n-p-n architecture for the sequential detection of mid- and long-wave infrared radiation were grown…”
Get full text
Journal Article -
6
Chromium concentrations, depth distributions, and diffusion coefficient in bulk and epitaxial GaAs and in Si
Published in Applied physics letters (01-02-1980)“…Implantation of 200-keV chromium fluences from 4.5×1012 to 1.0×1015 cm−2 and SIMS profiling were used to measure the atom densities and depth distribution of…”
Get full text
Journal Article -
7
Molecular beam epitaxial growth and performance of integrated multispectral HgCdTe photodiodes for the detection of mid-wave infrared radiation
Published in Journal of crystal growth (01-02-1998)“…In situ doped HgCdTe two-color detectors with the n—p—n geometry were grown by molecular beam epitaxy, for the simultaneous detection of two closely spaced…”
Get full text
Journal Article -
8
Status of HgCdTe-MBE technology for producing dual-band infrared detectors
Published in Journal of crystal growth (01-06-2000)“…Progress on achieving reproducible growth of high performance, dual-band IR detector structures in HgCdTe grown by molecular beam epitaxy (MBE) is described…”
Get full text
Journal Article -
9
Secondary particle collection in ion implantation dose measurement
Published in Review of scientific instruments (01-05-1978)“…The measurement of ion implantation doses in the presence of secondary ions and electrons emitted from the target is discussed. A circuit and electrode…”
Get more information
Journal Article -
10
Dependence of implanted Se and S profiles on GaAs implantation temperature and crystallinity
Published in Applied physics letters (01-01-1981)“…Atom depth distributions of Se implanted into GaAs show that the deep sides of the depth distributions are the result of interstitial diffusion of Se during…”
Get full text
Journal Article -
11
Comparison of sources of boron, phosphorus, and arsenic ions
Published in Applied physics letters (15-02-1973)“…A number of boron, phosphorus, and arsenic compounds, viz., B2H6, B10H14, B3N3H6, B2S3, BF3, BCl3, BBr3, BI3, HBO2, P, PH3, PF3, PF5, PCl3, POCl3, P2O5, As,…”
Get full text
Journal Article -
12
Molecular beam epitaxial growth and properties of short‐wave infrared Hg0.3Cd0.7Te films
Published in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (01-05-1996)“…Hg1−x Cd x Te films with cut‐off wavelengths ranging from 1.25 to 1.65 μm (at 300 K) in the short wave infrared band were prepared by molecular beam epitaxy…”
Get full text
Conference Proceeding -
13
Status of HgCdTe-MBE technology for producing dual-band infrared detectors
Published in Journal of crystal growth (2000)Get full text
Conference Proceeding -
14
-
15
High performance HgCdTe two-color infrared detectors grown by molecular beam epitaxy
Published in Journal of crystal growth (1997)Get full text
Conference Proceeding -
16
Chromium Concentrations, Depth Distributions and Diffusion Coefficient in Bulk and Epitaxial GaAs and in Silicon
Published in Applied physics letters (01-02-1980)“…Implantation of 200 keV Cr fluences from 4.5 x 1012 to 1.0 x 1015 cm--2 and SIMS profiling were used to measure the atom densities and depth distribution of Cr…”
Get full text
Journal Article -
17
Ion-implanted double-drift Ka-band diodes
Published in Proceedings of the IEEE (01-07-1974)“…The application of a doubly charged boron ( 11 B +2 ) beam to the formation of p-type drift regions in symmetrical K a -band double-drift silicon IMPATT diodes…”
Get full text
Journal Article