Search Results - "Jamba, D"

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    Integrated multi-sensor system for real-time monitoring and control of HgCdTe MBE by Olson, G. L., Roth, J. A., Brewer, P. D., Rajavel, R. D., Jamba, D. M., Jensen, J. E., Johs, B.

    Published in Journal of electronic materials (01-06-1999)
    “…We describe an integrated real-time sensing and control system for monitoring and controlling substrate temperature, layer composition, and effusion cell flux…”
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    Journal Article
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    High performance HgCdTe two-color infrared detectors grown by molecular beam epitaxy by Rajavel, R.D., Jamba, D.M., Wu, O.K., Jensen, J.E., Wilson, J.A., Patten, E.A., Kosai, K., Goetz, P., Chapman, G.R., Radford, W.A.

    Published in Journal of crystal growth (01-05-1997)
    “…High-performance in situ doped two-color detectors with the n-p-n architecture for the sequential detection of mid- and long-wave infrared radiation were grown…”
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    Journal Article
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    Molecular beam epitaxial growth and performance of integrated multispectral HgCdTe photodiodes for the detection of mid-wave infrared radiation by Rajavel, R.D., Jamba, D.M., Jensen, J.E., Wu, O.K., Wilson, J.A., Johnson, J.L., Patten, E.A., Kosai, K., Goetz, P., Johnson, S.M.

    Published in Journal of crystal growth (01-02-1998)
    “…In situ doped HgCdTe two-color detectors with the n—p—n geometry were grown by molecular beam epitaxy, for the simultaneous detection of two closely spaced…”
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    Journal Article
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    Status of HgCdTe-MBE technology for producing dual-band infrared detectors by Rajavel, R.D, Brewer, P.D, Jamba, D.M, Jensen, J.E, LeBeau, C, Olson, G.L, Roth, J.A, Williamson, W.S, Bangs, J.W, Goetz, P, Johnson, J.L, Patten, E.A, Wilson, J.A

    Published in Journal of crystal growth (01-06-2000)
    “…Progress on achieving reproducible growth of high performance, dual-band IR detector structures in HgCdTe grown by molecular beam epitaxy (MBE) is described…”
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    Journal Article
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    Status of MBE technology for the flexible manufacturing of HgCdTe focal plane arrays by Rajavel, R D, Jamba, D, Wu, O K, Roth, J A

    Published in Journal of electronic materials (01-08-1996)
    “…A robust process has been developed for the reproducible growth of in-situ doped Hg^sub 1-x^Cd^sub x^Te:As alloys by molecular beam epitaxy. Net hole…”
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    Journal Article
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    Chromium concentrations, depth distributions, and diffusion coefficient in bulk and epitaxial GaAs and in Si by Wilson, R. G., Vasudev, P. K., Jamba, D. M., Evans, C. A., Deline, V. R.

    Published in Applied physics letters (01-02-1980)
    “…Implantation of 200-keV chromium fluences from 4.5×1012 to 1.0×1015 cm−2 and SIMS profiling were used to measure the atom densities and depth distribution of…”
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    Journal Article
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    Secondary particle collection in ion implantation dose measurement by Jamba, D M

    Published in Review of scientific instruments (01-05-1978)
    “…The measurement of ion implantation doses in the presence of secondary ions and electrons emitted from the target is discussed. A circuit and electrode…”
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    Journal Article
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    Dependence of implanted Se and S profiles on GaAs implantation temperature and crystallinity by Wilson, Robert G., Jamba, Douglas M.

    Published in Applied physics letters (01-01-1981)
    “…Atom depth distributions of Se implanted into GaAs show that the deep sides of the depth distributions are the result of interstitial diffusion of Se during…”
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    Journal Article
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    Comparison of sources of boron, phosphorus, and arsenic ions by Wilson, R.G., Jamba, D.M.

    Published in Applied physics letters (15-02-1973)
    “…A number of boron, phosphorus, and arsenic compounds, viz., B2H6, B10H14, B3N3H6, B2S3, BF3, BCl3, BBr3, BI3, HBO2, P, PH3, PF3, PF5, PCl3, POCl3, P2O5, As,…”
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    Journal Article
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    Molecular beam epitaxial growth and properties of short‐wave infrared Hg0.3Cd0.7Te films by Rajavel, R. D., Wu, O. K., Jamba, D. M., de Lyon, T. J.

    “…Hg1−x Cd x Te films with cut‐off wavelengths ranging from 1.25 to 1.65 μm (at 300 K) in the short wave infrared band were prepared by molecular beam epitaxy…”
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    Conference Proceeding
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    Chromium Concentrations, Depth Distributions and Diffusion Coefficient in Bulk and Epitaxial GaAs and in Silicon by Wilson, R G, Vasudev, P K, Jamba, D M, Evans, C A, Deline, V R

    Published in Applied physics letters (01-02-1980)
    “…Implantation of 200 keV Cr fluences from 4.5 x 1012 to 1.0 x 1015 cm--2 and SIMS profiling were used to measure the atom densities and depth distribution of Cr…”
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    Journal Article
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    Ion-implanted double-drift Ka-band diodes by Lee, D.H., Ying, R.S., Jamba, D.M.

    Published in Proceedings of the IEEE (01-07-1974)
    “…The application of a doubly charged boron ( 11 B +2 ) beam to the formation of p-type drift regions in symmetrical K a -band double-drift silicon IMPATT diodes…”
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    Journal Article