Search Results - "JUNG, Seungjae"
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Low temperature solution-processed graphene oxide/Pr0.7Ca0.3MnO3 based resistive-memory device
Published in Applied physics letters (25-07-2011)“…We propose a graphene oxide (GO)/Pr0.7Ca0.3MnO3 (PCMO) based resistance random access memory (RRAM) device. Both active layers were prepared by a sol-gel…”
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2
Improved Switching Variability and Stability by Activating a Single Conductive Filament
Published in IEEE electron device letters (01-05-2012)“…We successfully fabricated a single-filament-activated resistive memory having limited conductive filament (CF) source through a novel fabrication technique…”
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3
Improved Switching Uniformity and Speed in Filament-Type RRAM Using Lightning Rod Effect
Published in IEEE electron device letters (01-01-2011)“…Improved switching uniformity and speed were demonstrated using a filament-type resistive memory. By using a gradual reset operation, a leaky high resistance,…”
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4
Resistive switching characteristics of solution-processed TiOx for next-generation non-volatile memory application; transparency, flexibility, and nano-scale memory feasibility
Published in Microelectronic engineering (01-07-2011)Get full text
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5
Excellent State Stability of Cu/SiC/Pt Programmable Metallization Cells for Nonvolatile Memory Applications
Published in IEEE electron device letters (01-05-2011)“…We have investigated silicon carbide (SiC) as a new programmable metallization cell material for nonvolatile memory applications. Our Cu/SiC/Pt devices showed…”
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6
Operation Voltage Control in Complementary Resistive Switches Using Heterodevice
Published in IEEE electron device letters (01-04-2012)“…For the high-density memory application of resistive random access memory (ReRAM), we study the complementary resistive switch (CRS) behavior of a HfO x -based…”
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7
Excellent resistive switching in nitrogen-doped Ge2Sb2Te5 devices for field-programmable gate array configurations
Published in Applied physics letters (07-11-2011)“…The nitrogen-doped Ge2Sb2Te5 (GST) programmable metallization cell is investigated to address the low switching voltage and need for a high resistance ratio,…”
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8
Varistor-type bidirectional switch (JMAX>107A/cm2, selectivity∼104) for 3D bipolar resistive memory arrays
Published in 2012 Symposium on VLSI Technology (VLSIT) (01-06-2012)“…We demonstrate a varistor-type bidirectional switch (VBS) with excellent selection property for future 3D bipolar resistive memory array. A highly non-linear…”
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Conference Proceeding -
9
Self-formed Schottky barrier induced selector-less RRAM for cross-point memory applications
Published in Physica status solidi. PSS-RRL. Rapid research letters (01-11-2012)“…We propose a selector‐less Pr0.7Ca0.3MnO3 (PCMO) based resistive‐switching RAM (RRAM) for high‐density cross‐point memory array applications. First, we…”
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10
Asymmetric MIMO System Design Based on OFDMA-TDD for Unmanned Ground Systems
Published in 2016 IEEE 83rd Vehicular Technology Conference (VTC Spring) (01-05-2016)“…The unmanned ground system (UGS) demands the high data rate and link reliability in battlefield and hazardous environment. Also, more radio resources should be…”
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Conference Proceeding -
11
New Set/Reset Scheme for Excellent Uniformity in Bipolar Resistive Memory
Published in IEEE electron device letters (01-03-2011)“…We proposed a new set/reset operation scheme to improve the switching uniformity of filament-type resistive memory. By controlling the magnitude of the sweep…”
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12
Improved switching uniformity of a carbon-based conductive-bridge type ReRAM by controlling the size of conducting filament
Published in Microelectronic engineering (01-06-2011)“…We investigated the resistive switching properties of a amorphous carbon-based ReRAM device. In order to minimize the fluctuations of switching parameters, we…”
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13
In-Depth Study on the Effect of Active-Area Scale-Down of Solution-Processed \hbox
Published in IEEE electron device letters (01-06-2012)“…The effect of active-area scale-down and improved memory performance of solution-processed TiO_x were investigated using devices with active areas ranging from…”
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14
The effect of KrF laser annealing within an ultrashort time on metal-alumina-nitride-oxide-silicon-type flash memory devices
Published in Applied physics letters (27-10-2008)“…The effect of laser annealing (LA) within an ultrashort time on metal-alumina-nitride-oxide-silicon-type flash memory device is investigated. Conventional…”
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15
Effect of \hbox\hbox\hbox Thermal Barrier on Reset Operations in Filament-Type Resistive Memory
Published in IEEE electron device letters (01-11-2011)“…We have investigated the effect of a Ge 2 Sb 2 Te 5 (GST) thermal barrier on the reset operations in TiN/Cu/SiC/Pt devices. When the GST film was introduced as…”
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16
Excellent Selector Characteristics of Nanoscale \hbox for High-Density Bipolar ReRAM Applications
Published in IEEE electron device letters (01-11-2011)“…We herein present a nanoscale vanadium oxide (VO 2 ) device with excellent selector characteristics such as a high on/off ratio (>; 50), fast switching speed…”
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17
Impact of high-pressure deuterium oxide annealing on the blocking efficiency and interface quality of metal-alumina-nitride-oxide-silicon-type flash memory devices
Published in Applied physics letters (05-11-2007)“…We have investigated the effect of high-pressure deuterium oxide annealing (HPDOA) on metal-alumina-nitride-oxide-silicon-type flash memory device. HPDOA was…”
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18
Proton Irradiation Effects on Resistive Random Access Memory With ZrO /HfO Stacks
Published in IEEE transactions on nuclear science (01-12-2011)“…In this study, we investigated proton irradiation effects on resistive random access memory (ReRAM) comprising ZrO x /HfO x stacks. After irradiation, changes…”
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19
Self-Selective Characteristics of Nanoscale \hbox Devices for High-Density ReRAM Applications
Published in IEEE electron device letters (01-05-2012)“…We herein present a hybrid-type memory device in which threshold switching and bipolar resistive switching are combined. The nanoscale vanadium oxide (VO x )…”
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20
Multibit Operation of \hbox -Based ReRAM by Schottky Barrier Height Engineering
Published in IEEE electron device letters (01-04-2011)“…We demonstrated multibit operation using a 250-nm Ir/TiO x / TiN resistive random access memory by Schottky barrier height engineering. A Schottky barrier was…”
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