Search Results - "Jäger, H P"

Alternative lead positioning in the right ventricular outflow tract in transvenous implantation of ICDs by Wolfhard, U F, Jäger, H P, Knocks, M, Doetsch, N

“…Pacing and sensing failure in apical right ventricular coil electrode PCD implantation due to ventricular scars or aneurysma may force the implanting surgeon…”
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Mitigation of surface contamination from resist outgassing in EUV lithography by Mertens, B.M., van der Zwan, B., de Jager, P.W.H., Leenders, M., Werij, H.G.C., Benschop, J.P.H., van Dijsseldonk, A.J.J.

“…Contamination of optics and mask is one of the possible show stoppers for Extreme Ultraviolet Lithography. One of the important sources of hydrocarbon…”
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Comparison of experimental and Monte Carlo results of stochastic Coulomb interaction in projection beam lithography by de Jager, P.W.H., Mertens, B., Munro, E., Cekan, E., Lammer, G., Vonach, H., Buschbeck, H., Zeininger, M., Horner, C., Löschner, H., Stengl, G., Bleeker, A.J.

“…Coulomb interaction limits the beam current for a required resolution but it can be influenced by the layout of the optical system. Therefore it is necessary…”
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Development of Yeast Populations during Processing and Ripening of Blue Veined Cheese by Alison M. Knox, Paul H. De Jager, Analie Lourens-Hattingh, Bennie C. Viljoen

“…Varieties of blue veined cheese were analyzed regularly during different stages of manufacturing and ripening to determine the origin of contaminating the…”
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Influence of Coulomb interactions on current density distribution in a two-lens focused ion beam system by Bi, J., de Jager, P.W.H., Barth, J.E., Kruit, P.

“…Focused ion beam systems equipped with a liquid metal ion source suffer strongly from the Coulomb interactions between ions. The Coulomb interactions not only…”
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The influence of ion beam parameters on pattern resolution by de Jager, P.W.H., Hagen, C.W., Kruit, P.

“…In nanofabrication the generation of phonons and secondary electrons by an incoming ion in a specimen gets important in limiting the resolution of the…”
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A combined objective lens for electrons and ions by de Jager, P.W.H., Kelder, M.C.W., Kruit, P.

“…Nanofabrication is possible using focused ion beam technology, but the observation of these structures with the same ion beam is not possible because of its…”
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Optical design of a combined ion and electron beam system for nanotechnology by de Jager, P. W. H., Kruit, P.

“…Nanometer sized structures can be fabricated with an ion beam in several ways, but they would be destroyed if ions were used for observation of the newly made…”
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Experimental results of the stochastic Coulomb interaction in ion projection lithography by de Jager, P. W. H., Derksen, G., Mertens, B., Cekan, E., Lammer, G., Vonach, H., Buschbeck, H., Zeininger, M., Horner, C., Löschner, H., Stengl, G., Bleeker, A. J., Benschop, J., Shi, F., Volland, B., Hudek, P., Heerlein, H., Rangelow, I. W., Kaesmaier, R.

“…Throughput and resolution are connected in ion and electron projection lithography (IPL and EPL) because of the space charge and Coulomb interaction between…”
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