Search Results - "Ivlev, G. D."
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Crystallization of Amorphous Germanium Films and Multilayer a-Ge/a-Si Structures upon Exposure to Nanosecond Laser Radiation
Published in Semiconductors (Woodbury, N.Y.) (01-03-2019)“…The processes of the crystallization of amorphous germanium films and multilayer germanium/silicon structures upon exposure to nanosecond (70 ns) ruby laser…”
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Effect of Pulsed Laser Annealing on Optical Properties of Selenium-Hyperdoped Silicon
Published in Optics and spectroscopy (01-10-2021)“…Layers of selenium-hyperdoped silicon with dopant concentration of up to (4–6) × 10 20 cm –3 that exceeds the limit of equilibrium solubility of this impurity…”
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The Nanosecond Effect of Intense Laser Radiation on Thin TiAlN Films
Published in Optics and spectroscopy (2020)“…The spectral dependences (λ = 0.35–1.0 μm) of transmittance and reflectance R of binary TiAlN nitride thin films deposited by magnetron sputtering of the…”
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Photoelectric Properties of Composite Si Layers with Ag Nanoparticles Obtained by Ion Implantation and Laser Annealing
Published in Optics and spectroscopy (01-02-2019)“…Structural and photoelectric properties of composite Ag:Si layers formed in the near-surface area of a single-crystal c-Si substrate by a high-dose…”
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The Effect of Pulsed Laser Radiation on a Si Layer with a High Dose of Implanted Ag+ Ions
Published in Optics and spectroscopy (01-10-2018)“…With the purpose of creating a thin composite layer of Ag:Si containing Ag nanoparticles (NPs), the effect of a nanosecond pulse produced by ruby laser (λ =…”
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Nanosecond-Pulse Annealing of Heavily Doped Ge:Sb Layers on Ge Substrates
Published in Russian microelectronics (01-09-2018)“…To produce heavily doped epitaxial layers, amorphous Ge:Sb films with a thickness of 150 and 300 nm are vacuum-deposited on Ge substrates and are exposed to…”
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Solidification temperature of silicon surface layer melted by pulsed laser irradiation
Published in Applied surface science (01-04-1999)“…Pyrometric measurements of the epitaxial crystallization temperature of Si have been carried out for the (100), (110) and (111) crystallographic orientations…”
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Laser-induced melting and recrystallization of CVD grown polycrystalline Si/SiGe/Ge layers
Published in Physica. B, Condensed matter (15-12-2009)“…SiGe/Ge layers were deposited by CVD on either Si or Si/SiO2 substrates and were subjected with pulsed laser annealing (LA). In situ measurements of…”
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Photoemission measurements of temperature in pulsed laser heating of various materials
Published in Journal of engineering physics and thermophysics (2012)“…The possibilities for the photoemission method of measuring the temperature of various materials heated by millisecond laser pulses have been investigated. The…”
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Temperature measurements in the pulsed laser heating of metals
Published in Measurement techniques (01-03-2011)“…The results of an investigation of the temperature dynamics of certain metals, measured by a photoemission method with a time resolution of 1 μsec, when they…”
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Dynamics of photo-ionization, heating and crystallization of implanted silicon during laser annealing
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01-04-2007)“…The dynamics of the nanosecond laser annealing of the implanted silicon by probing the implanted layer with infrared radiation (1.06μm) in the conditions of…”
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Effect of pulsed laser action on hole-energy spectrum of Ge ∕ Si self-assembled quantum dots
Published in Physical review. B, Condensed matter and materials physics (01-09-2005)Get full text
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Influence of the initial temperature of silicon on crystallization of a layer melted by nanosecond laser heating
Published in Journal of engineering physics and thermophysics (01-09-1996)Get full text
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Laser annealing of epitaxial CaF2 films on Si
Published in Thin solid films (01-10-2021)“…•Pulsed laser annealing of the CaF2/Si(111) film leads to morphology changes.•Round-shaped nanohills are formed on the epitaxial film.•The nanohills contain…”
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Phase transformations initiated in thin layers of amorphous silicon by nanosecond excimer laser pulses
Published in Semiconductors (Woodbury, N.Y.) (01-05-2003)Get full text
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The dynamics of annealing of ion-amorphized silicon by nanosecond pulses of excimer laser UV radiation
Published in Technical physics letters (01-12-2002)Get full text
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Formation of cellular structure in SiGe layers under nanosecond laser irradiation
Published in Technical physics letters (2015)“…Heating, melting, and crystallization processes of SiGe solid solution on a silicon substrate occurring under the influence of nanosecond laser irradiation…”
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Influence of temperature-time parameters of heat treatment on the process of planarization of the surface relief of microelectron structures
Published in Journal of engineering physics and thermophysics (01-03-2001)“…The authors consider the process of fusion of phosphorosilicate and borophosphorosilicate glasses in planarization of the surface of integrated microcircuits…”
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Pulsed-laser modification of germanium nanoclusters in silicon
Published in Semiconductors (Woodbury, N.Y.) (01-11-2003)Get full text
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Liquid phase reflectivity under conditions of laser-induced silicon melting
Published in Semiconductors (Woodbury, N.Y.) (01-01-2000)Get full text
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