Search Results - "Iskhakzai, R. M. Kh"

Forming-Free Memristors Based on Hafnium Oxide Processed in Electron Cyclotron Resonance Hydrogen Plasma by Perevalov, T. V., Iskhakzai, R. M. Kh, Prosvirin, I. P., Aliev, V. Sh, Gritsenko, V. A.

“…It is shown that the treatment of stoichiometric HfO 2 , which is synthesized by atomic layer deposition, in electron cyclotron resonance hydrogen plasma leads…”
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Atomic and Electronic Structure of SiOx Films Obtained with Hydrogen Electron Cyclotron Resonance Plasma by Perevalov, T. V., Iskhakzai, R. M. Kh, Aliev, V. Sh, Gritsenko, V. A., Prosvirin, I. P.

“…The silicon oxide thin films obtained by thermal SiO 2 treatment in hydrogen electron cyclotron resonance plasma at various exposure times are investigated…”
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Optical Properties of the SiOx (x < 2) Thin Films Obtained by Hydrogen Plasma Processing of Thermal Silicon Dioxide by Kruchinin, V. N., Perevalov, T. V., Aliev, V. Sh, Iskhakzai, R. M. Kh, Spesivtsev, E. V., Gritsenko, V. A., Pustovarov, V. A.

“…The optical properties and composition of thermal silicon oxide thin films processed in a hydrogen electron cyclotron resonance plasma have been studied by…”
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Atomic and Electronic Structure of SiO.sub.x Films Obtained with Hydrogen Electron Cyclotron Resonance Plasma by Perevalov, T. V, Iskhakzai, R. M. Kh, Aliev, V. Sh, Gritsenko, V. A, Prosvirin, I. P

“…The silicon oxide thin films obtained by thermal SiO.sub.2 treatment in hydrogen electron cyclotron resonance plasma at various exposure times are…”
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