Search Results - "Ikhlassi, Amal"

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  1. 1

    Coulomb drag in topological wires separated by an air gap by Du, Lingjie, Zheng, Jianmin, Chou, Yang-Zhi, Zhang, Jie, Wu, Xingjun, Sullivan, Gerard, Ikhlassi, Amal, Du, Rui-Rui

    Published in Nature electronics (21-06-2021)
    “…Strong electron–electron interactions between adjacent nanoscale wires can lead to one-dimensional Coulomb drag, where current in one wire induces a voltage in…”
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    Journal Article
  2. 2

    LWIR Strained-Layer Superlattice Materials and Devices at Teledyne Imaging Sensors by Hood, Andrew D., Evans, Allan J., Ikhlassi, Amal, Lee, Donald L., Tennant, William E.

    Published in Journal of electronic materials (01-07-2010)
    “…Strained-layer superlattices (SLS) based on type II InAs/Ga(In)Sb materials are a rapidly maturing technology and are theoretically predicted to exceed the…”
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    Journal Article Conference Proceeding
  3. 3

    Tuning Edge States in Strained-Layer InAs/GaInSb Quantum Spin Hall Insulators by Du, Lingjie, Li, Tingxin, Lou, Wenkai, Wu, Xingjun, Liu, Xiaoxue, Han, Zhongdong, Zhang, Chi, Sullivan, Gerard, Ikhlassi, Amal, Chang, Kai, Du, Rui-Rui

    Published in Physical review letters (04-08-2017)
    “…We report on a class of quantum spin Hall insulators (QSHIs) in strained-layer InAs/GaInSb quantum wells, in which the bulk gaps are enhanced up to fivefold as…”
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    Journal Article
  4. 4
  5. 5

    Tuning Edge States in Strained-Layer InAs/GaInSb Quantum Spin Hall Insulators by Du, Lingjie, Li, Tingxin, Lou, Wenkai, Wu, Xingjun, Liu, Xiaoxue, Han, Zhongdong, Zhang, Chi, Sullivan, Gerard, Ikhlassi, Amal, Chang, Kai, Du, Rui-Rui

    Published 19-06-2017
    “…Phys. Rev. Lett. 119, 056803 (2017) We report on a class of quantum spin Hall insulators (QSHIs) in strained-layer InAs/GaInSb quantum wells, in which the bulk…”
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    Journal Article
  6. 6

    Low-voltage, high-performance InAs/AlSb HEMTs with power gain above 100 GHz at 100 mV drain bias by Bergman, J., Nagy, G., Sullivan, G., Ikhlassi, A., Brar, B.

    “…Ultra-low power circuits require transistors with usable RF gain at low bias voltages and currents. In the present paper, we report 100 nm gate-length…”
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    Conference Proceeding