Search Results - "Ievtushenko, A.I."

A Review of the some aspects for the development of ZnO based photocatalysts for a variety of applications by Baibara, O.E., Radchenko, M.V., Karpyna, V.A., Ievtushenko, A.I.

“…Today, one of the most important problems for humanity is the pollution of the environment with various organic compounds that worsen the health of the…”
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The study of the behavior of Al impurity in ZnO lattice by a fullerene like model by Ovsiannikova, L.I., Lashkarev, G.V., Kartuzov, V.V., Myroniuk, D.V., Dranchuk, M.V., Ievtushenko, A.I.

“…The fullerene like Zn32Al4O36 clusters were investigated and the oxygen interstitial Oi acceptor intrinsic defect formation energy as well as Al ionization…”
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The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method by Ievtushenko, A.I.

“…For the first time, Cu-Al-O films were grown using the reactive ion beam sputtering at temperatures ranging from 80 to 380 °C in 50 °C increments. Correlations…”
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The influence of manufacturing modes on the electrical and energy parameters of graphene/p-CdTe Schottky diodes by Koziarskyi, I.P., Ilashchuk, M.I., Orletskyi, I.G., Koziarskyi, D.P., Myroniuk, L.A., Myroniuk, D.V., Ievtushenko, A.I., Maistruk, E.V.

“…The paper investigated the electrical properties of graphene/p-CdTe structures, which were distinguished by different durations of graphene films application…”
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Argon and oxygen pressure influence on the properties of NiO films deposited by magnetron sputtering in layer-by-layer growth regime by Karpyna, V.A., Ievtushenko, A.I., Bykov, O.I., Kolomys, O.F., Strelchuk, V.V., Starik, S.P., Baturin, V.A., Karpenko, O.Yu, Lytvyn, O.S.

“…The influence of argon and oxygen partial pressure on the structure, morphology, and optical properties of NiO films deposited on glass substrate by…”
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Structural, vibrational and photodegradation properties of CuAl2O4 films by Myroniuk, L.A., Dusheyko, M.G., Karpyna, V.A., Myroniuk, D.V., Bykov, O.I., Olifan, O.I., Kolomys, O.F., Strelchuk, V.V., Korchovyi, A.A., Starik, S.P., Tkach, V.M., Ievtushenko, A.I.

“…Cu–Al–O thin films were grown on Si (111) substrates by using the reactive ion-beam sputtering (RIBS) method within the temperature range 80 to 380 °C. The…”
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The influence of substrate temperature on the structure and optical properties of NiO thin films deposited using the magnetron sputtering in the layer-by-layer growth regime by Ievtushenko, A.I., Karpyna, V.A., Bykov, O.I., Dranchuk, M.V., Kolomys, O.F., Maziar, D.M., Strelchuk, V.V., Starik, S.P., Baturin, V.A., Karpenko, О.Y., Lytvyn, O.S.

“…Vanadium oxide (VO x ) thin films are promising materials, exhibiting electrical, optical, and mechanical properties highly tunable by processing and…”
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High quality ZnO films deposited by radio-frequency magnetron sputtering using layer by layer growth method by Ievtushenko, A.I., Karpyna, V.A., Lazorenko, V.I., Lashkarev, G.V., Khranovskyy, V.D., Baturin, V.A., Karpenko, O.Y., Lunika, M.M., Avramenko, K.A., Strelchuk, V.V., Kutsay, O.M.

“…Three-layered ZnO films were deposited on Si substrates by radio-frequency magnetron sputtering using layer by layer growth method. The Raman scattering…”
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The Influence of Oxygen Pressure on ZnO:Al Thin Films Properties Grown by Layer by Layer Growth Method at Magnetron Sputtering by Ievtushenko, A.I., Klochkov, L.O., Lytvyn, O.S., Tkach, V.M., Kutsay, O.M., Starik, S.P., Baturin, V.A., Karpenko, A.Y., Dusheyko, M.G., Lashkarev, G.V., Bykov, O.I.

“…The influence of oxygen pressure in the deposition chamber on the structure, morphology, optical and electrical properties of aluminum doped ZnO films…”
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Detector with High Internal Photocurrent Gain Based on ZnO:N by Kosyachenko, L.A., Lashkarev, G.V., Ievtushenko, A.I., Lazorenko, V.I., Sklyarchuk, V.M., Sklyarchuk, O.F.

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