Search Results - "Ichimaru, Tomonori"
-
1
High-rate and wide-area deposition of epitaxial Si films by mesoplasma chemical vapor deposition
Published in Science and technology of advanced materials (01-06-2014)“…Homoepitaxial Si films have been deposited at a high rate of 200 nm s −1 over a wide area of 20 mm × 80 mm by cluster-assisted mesoplasma chemical vapor…”
Get full text
Journal Article -
2
P‐42: Novel Stress Profile for Chemically Strengthened Glass with High Drop Strength
Published in SID International Symposium Digest of technical papers (01-08-2020)“…Newly developed stress profile of chemically strengthened glass for smartphone cover glass is demonstrated in this study. This innovative stress profile, named…”
Get full text
Journal Article