Search Results - "IEEE transactions on electron devices"
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GaN-on-Si Power Technology: Devices and Applications
Published in IEEE transactions on electron devices (01-03-2017)“…In this paper, we present a comprehensive review and discussion of the state-of-the-art device technology and application development of GaN-on-Si power…”
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The Past, the Present, and the Future of Ferroelectric Memories
Published in IEEE transactions on electron devices (01-04-2020)“…Ferroelectric materials are characterized by two stable polarization states that can be switched from one to another by applying an electrical field. As one of…”
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3
Phase-Change Memory-Towards a Storage-Class Memory
Published in IEEE transactions on electron devices (01-11-2017)“…Phase-change memory (PCM) has undergone significant academic and industrial research in the last 15 years. After much development, it is now poised to enter…”
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Critical Role of Interlayer in Hf0.5Zr0.5O2 Ferroelectric FET Nonvolatile Memory Performance
Published in IEEE transactions on electron devices (01-06-2018)“…We fabricate, characterize, and establish the critical design criteria of Hf 0.5 Zr 0.5 O 2 (HZO)-based ferroelectric field effect transistor (FeFET) for…”
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Experimental Demonstration and Tolerancing of a Large-Scale Neural Network (165 000 Synapses) Using Phase-Change Memory as the Synaptic Weight Element
Published in IEEE transactions on electron devices (01-11-2015)“…Using two phase-change memory devices per synapse, a three-layer perceptron network with 164 885 synapses is trained on a subset (5000 examples) of the MNIST…”
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High Endurance Ferroelectric Hafnium Oxide-Based FeFET Memory Without Retention Penalty
Published in IEEE transactions on electron devices (01-09-2018)“…We report the integration of a ferroelectric (FE) silicon-doped hafnium oxide material in ferroelectric field-effect transistor (FeFET) devices fabricated with…”
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3-D NAND Technology Achievements and Future Scaling Perspectives
Published in IEEE transactions on electron devices (01-04-2020)“…Since the introduction of a 3-D NAND product in 2014, the areal density has increased by more than 8 times (from 0.96 to 7.80 Gb/mm 2 ) in the recent five…”
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ReRAM: History, Status, and Future
Published in IEEE transactions on electron devices (01-04-2020)“…This article reviews the resistive random-access memory (ReRAM) technology initialization back in the 1960s and its heavily focused research and development…”
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Superjunction Power Devices, History, Development, and Future Prospects
Published in IEEE transactions on electron devices (01-03-2017)“…Superjunction has arguably been the most creative and important concept in the power device field since the introduction of the insulated gate bipolar…”
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10
Current Status and Opportunities of Organic Thin-Film Transistor Technologies
Published in IEEE transactions on electron devices (01-05-2017)“…Attributed to its advantages of super mechanical flexibility, very low-temperature processing, and compatibility with low cost and high throughput…”
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11
The Influence of Top and Bottom Metal Electrodes on Ferroelectricity of Hafnia
Published in IEEE transactions on electron devices (01-02-2021)“…In recent years, several experimental approaches have been adopted to study and understand the mechanism and improve the ferroelectricity of fluorite-type…”
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12
Magnetoresistive Random Access Memory: Present and Future
Published in IEEE transactions on electron devices (01-04-2020)“…Magnetoresistive random access memory (MRAM) is regarded as a reliable persistent memory technology because of its long data retention and robust endurance…”
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13
High-Throughput In-Memory Computing for Binary Deep Neural Networks With Monolithically Integrated RRAM and 90-nm CMOS
Published in IEEE transactions on electron devices (01-10-2020)“…Deep neural network (DNN) hardware designs have been bottlenecked by conventional memories, such as SRAM due to density, leakage, and parallel computing…”
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14
Threshold Voltage Instability in p-GaN Gate AlGaN/GaN HFETs
Published in IEEE transactions on electron devices (01-06-2018)“…We investigate the impact of the gate contact on the threshold voltage stability in p-GaN gate AlGaN/GaN heterojunction field-effect transistors with double…”
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15
Vertical β-Ga₂O₃ Power Transistors: A Review
Published in IEEE transactions on electron devices (01-10-2020)“…With projected performance advantages over silicon and incumbent wide-bandgap compound semiconductors, gallium oxide (Ga 2 O 3 ) has garnered worldwide…”
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16
Charge-Trapping Phenomena in HfO2-Based FeFET-Type Nonvolatile Memories
Published in IEEE transactions on electron devices (01-09-2016)“…Ferroelectric field effect transistors (FeFETs) based on ferroelectric hafnium oxide (HfO 2 ) thin films show high potential for future embedded nonvolatile…”
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17
Device and Circuit-Level Assessment of GaSb/Si Heterojunction Vertical Tunnel-FET for Low-Power Applications
Published in IEEE transactions on electron devices (01-03-2020)“…This article investigates the performance of a vertically grown GaSb/Si tunnel field effect transistor (V-TFET) with a source pocket to enhance the performance…”
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Review on SiC MOSFETs High-Voltage Device Reliability Focusing on Threshold Voltage Instability
Published in IEEE transactions on electron devices (01-11-2019)“…An overview over issues and findings in SiC power MOSFET reliability is given. The focus of this article is on threshold instabilities and the differences to…”
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Prospects for Wide Bandgap and Ultrawide Bandgap CMOS Devices
Published in IEEE transactions on electron devices (01-10-2020)“…Power and RF electronics applications have spurred massive investment into a range of wide and ultrawide bandgap semiconductor devices which can switch large…”
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20
Cryogenic MOS Transistor Model
Published in IEEE transactions on electron devices (01-09-2018)“…This paper presents a physics-based analytical model for the MOS transistor operating continuously from room temperature down to liquid-helium temperature (4.2…”
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