Search Results - "IEEE transactions on electron devices"

Refine Results
  1. 1

    GaN-on-Si Power Technology: Devices and Applications by Chen, Kevin J., Haberlen, Oliver, Lidow, Alex, Chun Lin Tsai, Ueda, Tetsuzo, Uemoto, Yasuhiro, Yifeng Wu

    Published in IEEE transactions on electron devices (01-03-2017)
    “…In this paper, we present a comprehensive review and discussion of the state-of-the-art device technology and application development of GaN-on-Si power…”
    Get full text
    Journal Article
  2. 2

    The Past, the Present, and the Future of Ferroelectric Memories by Mikolajick, T., Schroeder, U., Slesazeck, S.

    Published in IEEE transactions on electron devices (01-04-2020)
    “…Ferroelectric materials are characterized by two stable polarization states that can be switched from one to another by applying an electrical field. As one of…”
    Get full text
    Journal Article
  3. 3

    Phase-Change Memory-Towards a Storage-Class Memory by Fong, Scott W., Neumann, Christopher M., Wong, H.-S Philip

    Published in IEEE transactions on electron devices (01-11-2017)
    “…Phase-change memory (PCM) has undergone significant academic and industrial research in the last 15 years. After much development, it is now poised to enter…”
    Get full text
    Journal Article
  4. 4

    Critical Role of Interlayer in Hf0.5Zr0.5O2 Ferroelectric FET Nonvolatile Memory Performance by Ni, Kai, Sharma, Pankaj, Zhang, Jianchi, Jerry, Matthew, Smith, Jeffery A., Tapily, Kandabara, Clark, Robert, Mahapatra, Souvik, Datta, Suman

    Published in IEEE transactions on electron devices (01-06-2018)
    “…We fabricate, characterize, and establish the critical design criteria of Hf 0.5 Zr 0.5 O 2 (HZO)-based ferroelectric field effect transistor (FeFET) for…”
    Get full text
    Journal Article
  5. 5
  6. 6

    High Endurance Ferroelectric Hafnium Oxide-Based FeFET Memory Without Retention Penalty by Ali, T., Polakowski, P., Riedel, S., Buttner, T., Kampfe, T., Rudolph, M., Patzold, B., Seidel, K., Lohr, D., Hoffmann, R., Czernohorsky, M., Kuhnel, K., Steinke, P., Calvo, J., Zimmermann, K., Muller, J.

    Published in IEEE transactions on electron devices (01-09-2018)
    “…We report the integration of a ferroelectric (FE) silicon-doped hafnium oxide material in ferroelectric field-effect transistor (FeFET) devices fabricated with…”
    Get full text
    Journal Article
  7. 7

    3-D NAND Technology Achievements and Future Scaling Perspectives by Goda, Akira

    Published in IEEE transactions on electron devices (01-04-2020)
    “…Since the introduction of a 3-D NAND product in 2014, the areal density has increased by more than 8 times (from 0.96 to 7.80 Gb/mm 2 ) in the recent five…”
    Get full text
    Journal Article
  8. 8

    ReRAM: History, Status, and Future by Chen, Yangyin

    Published in IEEE transactions on electron devices (01-04-2020)
    “…This article reviews the resistive random-access memory (ReRAM) technology initialization back in the 1960s and its heavily focused research and development…”
    Get full text
    Journal Article
  9. 9

    Superjunction Power Devices, History, Development, and Future Prospects by Udrea, Florin, Deboy, Gerald, Fujihira, Tatsuhiko

    Published in IEEE transactions on electron devices (01-03-2017)
    “…Superjunction has arguably been the most creative and important concept in the power device field since the introduction of the insulated gate bipolar…”
    Get full text
    Journal Article
  10. 10

    Current Status and Opportunities of Organic Thin-Film Transistor Technologies by Xiaojun Guo, Yong Xu, Ogier, Simon, Tse Nga Ng, Caironi, Mario, Perinot, Andrea, Ling Li, Jiaqing Zhao, Wei Tang, Sporea, Radu A., Nejim, Ahmed, Carrabina, Jordi, Cain, Paul, Feng Yan

    Published in IEEE transactions on electron devices (01-05-2017)
    “…Attributed to its advantages of super mechanical flexibility, very low-temperature processing, and compatibility with low cost and high throughput…”
    Get full text
    Journal Article
  11. 11

    The Influence of Top and Bottom Metal Electrodes on Ferroelectricity of Hafnia by Lee, Yongsun, Goh, Youngin, Hwang, Junghyeon, Das, Dipjyoti, Jeon, Sanghun

    Published in IEEE transactions on electron devices (01-02-2021)
    “…In recent years, several experimental approaches have been adopted to study and understand the mechanism and improve the ferroelectricity of fluorite-type…”
    Get full text
    Journal Article
  12. 12

    Magnetoresistive Random Access Memory: Present and Future by Ikegawa, Sumio, Mancoff, Frederick B., Janesky, Jason, Aggarwal, Sanjeev

    Published in IEEE transactions on electron devices (01-04-2020)
    “…Magnetoresistive random access memory (MRAM) is regarded as a reliable persistent memory technology because of its long data retention and robust endurance…”
    Get full text
    Journal Article
  13. 13

    High-Throughput In-Memory Computing for Binary Deep Neural Networks With Monolithically Integrated RRAM and 90-nm CMOS by Yin, Shihui, Sun, Xiaoyu, Yu, Shimeng, Seo, Jae-Sun

    Published in IEEE transactions on electron devices (01-10-2020)
    “…Deep neural network (DNN) hardware designs have been bottlenecked by conventional memories, such as SRAM due to density, leakage, and parallel computing…”
    Get full text
    Journal Article
  14. 14

    Threshold Voltage Instability in p-GaN Gate AlGaN/GaN HFETs by Sayadi, Luca, Iannaccone, Giuseppe, Sicre, Sebastien, Haberlen, Oliver, Curatola, Gilberto

    Published in IEEE transactions on electron devices (01-06-2018)
    “…We investigate the impact of the gate contact on the threshold voltage stability in p-GaN gate AlGaN/GaN heterojunction field-effect transistors with double…”
    Get full text
    Journal Article
  15. 15

    Vertical β-Ga₂O₃ Power Transistors: A Review by Wong, Man Hoi, Higashiwaki, Masataka

    Published in IEEE transactions on electron devices (01-10-2020)
    “…With projected performance advantages over silicon and incumbent wide-bandgap compound semiconductors, gallium oxide (Ga 2 O 3 ) has garnered worldwide…”
    Get full text
    Journal Article
  16. 16

    Charge-Trapping Phenomena in HfO2-Based FeFET-Type Nonvolatile Memories by Yurchuk, Ekaterina, Muller, Johannes, Muller, Stefan, Paul, Jan, Pesic, Milan, van Bentum, Ralf, Schroeder, Uwe, Mikolajick, Thomas

    Published in IEEE transactions on electron devices (01-09-2016)
    “…Ferroelectric field effect transistors (FeFETs) based on ferroelectric hafnium oxide (HfO 2 ) thin films show high potential for future embedded nonvolatile…”
    Get full text
    Journal Article
  17. 17

    Device and Circuit-Level Assessment of GaSb/Si Heterojunction Vertical Tunnel-FET for Low-Power Applications by Tripathy, Manas Ranjan, Singh, Ashish Kumar, Samad, A., Chander, Sweta, Baral, Kamalaksha, Singh, Prince Kumar, Jit, Satyabrata

    Published in IEEE transactions on electron devices (01-03-2020)
    “…This article investigates the performance of a vertically grown GaSb/Si tunnel field effect transistor (V-TFET) with a source pocket to enhance the performance…”
    Get full text
    Journal Article
  18. 18

    Review on SiC MOSFETs High-Voltage Device Reliability Focusing on Threshold Voltage Instability by Puschkarsky, K., Grasser, T., Aichinger, T., Gustin, W., Reisinger, H.

    Published in IEEE transactions on electron devices (01-11-2019)
    “…An overview over issues and findings in SiC power MOSFET reliability is given. The focus of this article is on threshold instabilities and the differences to…”
    Get full text
    Journal Article
  19. 19

    Prospects for Wide Bandgap and Ultrawide Bandgap CMOS Devices by Bader, Samuel James, Lee, Hyunjea, Chaudhuri, Reet, Huang, Shimin, Hickman, Austin, Molnar, Alyosha, Xing, Huili Grace, Jena, Debdeep, Then, Han Wui, Chowdhury, Nadim, Palacios, Tomas

    Published in IEEE transactions on electron devices (01-10-2020)
    “…Power and RF electronics applications have spurred massive investment into a range of wide and ultrawide bandgap semiconductor devices which can switch large…”
    Get full text
    Journal Article
  20. 20

    Cryogenic MOS Transistor Model by Beckers, Arnout, Jazaeri, Farzan, Enz, Christian

    Published in IEEE transactions on electron devices (01-09-2018)
    “…This paper presents a physics-based analytical model for the MOS transistor operating continuously from room temperature down to liquid-helium temperature (4.2…”
    Get full text
    Journal Article