Search Results - "Hwang Seong Cheol"
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The effects of crystallographic orientation and strain of thin Hf0.5Zr0.5O2 film on its ferroelectricity
Published in Applied physics letters (17-02-2014)“…To elucidate the origin of the formation of the ferroelectric phase in Hf0.5Zr0.5O2 films, the effects of film strain and crystallographic orientation on the…”
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2
Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature
Published in Applied physics letters (17-06-2013)“…The effects of annealing temperature (Tanneal) and film thickness (tf) on the crystal structure and ferroelectric properties of Hf0.5Zr0.5O2 films were…”
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3
Short-term memory of TiO2-based electrochemical capacitors: empirical analysis with adoption of a sliding threshold
Published in Nanotechnology (27-09-2013)“…Chemical synapses are important components of the large-scaled neural network in the hippocampus of the mammalian brain, and a change in their weight is…”
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4
Suppression in the negative bias illumination instability of Zn-Sn-O transistor using oxygen plasma treatment
Published in Applied physics letters (05-09-2011)“…This study examined the effect of oxygen plasma treatment on light-enhanced bias instability in Zn-Sn-O (ZTO) thin film transistors (TFTs). The treated ZTO TFT…”
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5
Interface engineering for improving reliability of resistance switching in Cu/HfO2/TiO2/Pt structure
Published in Applied physics letters (17-08-2015)“…Reliability and uniformity in resistance switching behaviours in top electrode Cu-sputtered TiO2-bottom electrode Pt memory structure were greatly improved by…”
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Prospective of Semiconductor Memory Devices: from Memory System to Materials
Published in Advanced electronic materials (01-06-2015)“…The ever‐increasing demand for higher‐capacity digital memory shows no sign of declining. The conventional strategy for meeting such demand, i.e. shrinking of…”
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Improved endurance of resistive switching TiO2 thin film by hourglass shaped Magnéli filaments
Published in Applied physics letters (27-06-2011)“…A modified biasing scheme was adopted to improve the electrical endurance characteristics of conducting filamentary resistive switching (RS) in a Pt/TiO2/Pt RS…”
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8
Threshold switching in Si-As-Te thin film for the selector device of crossbar resistive memory
Published in Applied physics letters (19-03-2012)“…Threshold-switching (TS) and selector performances of Si-As-Te thin films for crossbar resistive memory were studied. Composition of the film was the major…”
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Anomalous behavior of negative bias illumination stress instability in an indium zinc oxide transistor: A cation combinatorial approach
Published in Applied physics letters (27-08-2012)“…This study examined the effects of the indium fraction in indium zinc oxide (IZO) on the performance and stability of IZO thin film transistors (TFTs). The…”
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10
The fundamentals and applications of ferroelectric HfO2
Published in Nature reviews. Materials (01-08-2022)“…Since the first report of ferroelectricity in a Si-doped HfO 2 film in 2011, HfO 2 -based materials have attracted much interest from the ferroelectric…”
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11
Theoretical and experimental studies on the electronic structure of crystalline and amorphous ZnSnO3 thin films
Published in Applied physics letters (17-06-2013)“…The influence of structural disorder on the electronic structure of amorphous ZnSnO3 was examined by ab-initio calculations. The calculation results are…”
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12
Improved Electronic Performance of HfO2/SiO2 Stacking Gate Dielectric on 4H SiC
Published in IEEE transactions on electron devices (01-12-2007)Get full text
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13
Double-layered vertically integrated amorphous-In2Ga2ZnO7 thin-film transistor
Published in Applied physics letters (28-10-2013)“…Two serially connected and vertically integrated amorphous-In2Ga2ZnO7 thin film transistors (V-TFTs) with ∼600 and 400-nm channel lengths were fabricated. Top…”
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14
The charge trapping characteristics of Si3N4 and Al2O3 layers on amorphous-indium-gallium-zinc oxide thin films for memory application
Published in Applied physics letters (30-04-2012)“…The charge trapping characteristics of 30-nm-thick Si3N4 and 3-nm-thick Al2O3 layers between amorphous In-Ga-Zn-O thin films and 100-nm-thick blocking oxides…”
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15
An artificial nociceptor based on a diffusive memristor
Published in Nature communications (29-01-2018)“…A nociceptor is a critical and special receptor of a sensory neuron that is able to detect noxious stimulus and provide a rapid warning to the central nervous…”
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16
Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films
Published in Advanced materials (Weinheim) (18-03-2015)“…The recent progress in ferroelectricity and antiferroelectricity in HfO2‐based thin films is reported. Most ferroelectric thin film research focuses on…”
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17
Review of Semiconductor Flash Memory Devices for Material and Process Issues
Published in Advanced materials (Weinheim) (01-10-2023)“…Vertically integrated NAND (V-NAND) flash memory is the main data storage in modern handheld electronic devices, widening its share even in the data centers…”
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Efficient CH3NH3PbI3 Perovskite Solar Cells Employing Nanostructured p-Type NiO Electrode Formed by a Pulsed Laser Deposition
Published in Advanced materials (Weinheim) (15-07-2015)“…Highly transparent and nanostructured nickel oxide (NiO) films through pulsed laser deposition are introduced for efficient CH3NH3PbI3 perovskite solar cells…”
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19
Growth and electrical properties of silicon oxide grown by atomic layer deposition using Bis(ethyl-methyl-amino)silane and ozone
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-01-2012)“…Silicon oxide thin film grown at low temperatures (<300–500 °C) is essential for a range of applications in semiconductor devices. In this study, silicon oxide…”
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Thin HfxZr1-xO2 Films: A New Lead-Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability
Published in Advanced energy materials (01-11-2014)“…The promising energy storage properties of new lead‐free antiferroelectric HfxZr1‐xO2 (x = 0.1–0.4) films with high energy storage density are reported. The…”
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