Search Results - "Huet, Karim"
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Surface segregated Ga, In, and Al activation in high Ge content SiGe during UV melt laser induced non-equilibrium solidification
Published in Japanese Journal of Applied Physics (01-12-2019)“…The impact of solidification front velocity (SFV) on dopant segregation and activation surpassing the equilibrium solid solubility limit was investigated in…”
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Multiscale modeling of ultrafast melting phenomena
Published in npj computational materials (11-03-2022)“…Ultraviolet Nanosecond Laser Annealing (LA) is a powerful tool for both fundamental investigations of ultrafast, nonequilibrium phase-change phenomena and…”
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Optimized Laser Thermal Annealing on Germanium for High Dopant Activation and Low Leakage Current
Published in IEEE transactions on electron devices (01-12-2014)“…In this paper, state-of-the-art laser thermal annealing is used to fabricate Ge diodes. We compared the effect of laser thermal annealing (LTA) and rapid…”
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Excimer laser annealing for low-voltage power MOSFET
Published in Japanese Journal of Applied Physics (01-08-2016)“…Excimer laser annealing of lumped beam was performed to form the P-base junction for high-performance low-voltage-power MOSFET. An equivalent shallow-junction…”
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3D Simulation for Melt Laser Anneal Integration in FinFET's Contact
Published in IEEE journal of the Electron Devices Society (2020)“…Process integration feasibility of UV nanosecond melt laser annealing (MLA) in 14 nm node generation FinFET's contact for dopant surface segregation and…”
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Atomically Flat Low-Resistive Germanide Contacts Formed by Laser Thermal Anneal
Published in IEEE transactions on electron devices (01-07-2013)“…In this paper, state-of-the-art laser thermal annealing is used to form germanide contacts on n-doped Ge and is systematically compared with results generated…”
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Doping of semiconductor devices by Laser Thermal Annealing
Published in Materials science in semiconductor processing (01-05-2017)“…In today's highly competitive semiconductor industry, and due to the accelerating pace of technology development, the integration of new and disruptive…”
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Investigation of oxygen penetration during UV nanosecond laser annealing of silicon at high energy densities
Published in Applied surface science (30-04-2021)“…[Display omitted] •Oxygen and carbon impurities diffusion during melt laser annealing.•Identification and localization of optical defects signatures.•Impact of…”
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Extended Defects Formation in Nanosecond Laser-Annealed Ion Implanted Silicon
Published in Nano letters (09-04-2014)“…Damage evolution and dopant distribution during nanosecond laser thermal annealing of ion implanted silicon have been investigated by means of transmission…”
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On the anomalous generation of {0 0 1} loops during laser annealing of ion-implanted silicon
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01-11-2019)“…We combine focused experiments with molecular dynamics simulations to investigate in detail the formation of {0 0 1} loops in nanosecond laser-annealed…”
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Ultrafast Generation of Unconventional {001} Loops in Si
Published in Physical review letters (17-11-2017)“…Ultrafast laser annealing of ion implanted Si has led to thermodynamically unexpected large {001} self-interstitial loops, and the failure of Ostwald ripening…”
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Nickel silicide contacts formed by excimer laser annealing for high efficiency solar cells
Published in Progress in photovoltaics (01-05-2013)“…ABSTRACT Driven by the relatively high cost of silver (Ag), interest has grown in the photovoltaic (PV) industry to substitute conventional screen printed (SP)…”
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13
Advanced simulations on laser annealing: explosive crystallization and phonon transport corrections
Published in 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (23-09-2020)“…Current semiconductor device manufacturing often needs the integration of annealing process steps with a low thermal budget; and, among them, pulsed laser…”
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Conference Proceeding -
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Nanoscale measurements of phosphorous-induced lattice expansion in nanosecond laser annealed germanium
Published in APL materials (01-05-2018)“…Laser Thermal Annealing (LTA) at various energy densities was used to recrystallize and activate amorphized germanium doped with phosphorous by ion…”
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On the Ability of the Particle Monte Carlo Technique to Include Quantum Effects in Nano-MOSFET Simulation
Published in IEEE transactions on electron devices (01-09-2007)“…In this paper, we report on the possibility of using particle-based Monte Carlo (MC) techniques to incorporate all relevant quantum effects in the simulation…”
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Investigation of the enlargement of Ru grains and failure modes analysis in microsecond UV laser annealing
Published in Proceedings of the IEEE International Interconnect Technology Conference (03-06-2024)“…Interconnects based on Ru has been considered as a promising candidate to replace Cu-based interconnects for the future technology nodes thanks to its low bulk…”
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Recent Progresses and Perspectives of UV Laser Annealing Technologies for Advanced CMOS Devices
Published 12-09-2022“…The state-of-the-art CMOS technology has started to adopt three-dimensional (3D) integration approaches, enabling continuous chip density increment and…”
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Microsecond non-melt UV laser annealing for future 3D-stacked CMOS
Published 10-05-2022“…Three-dimensional (3D) CMOS technology encourages the use of UV laser annealing (UV-LA) because the shallow absorption of UV light into materials and the…”
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Super Activation of Highly Surface Segregated Dopants in High Ge Content SiGe Obtained by Melt UV Laser Annealing
Published in 2018 22nd International Conference on Ion Implantation Technology (IIT) (01-09-2018)“…Activation of surface segregated dopants above the solid solubility limit in a high Ge content SiGe substrate has been demonstrated by nanosecond melt UV laser…”
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Conference Proceeding