Search Results - "Huet, Karim"

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  1. 1

    Surface segregated Ga, In, and Al activation in high Ge content SiGe during UV melt laser induced non-equilibrium solidification by Tabata, Toshiyuki, Huet, Karim, Mazzamuto, Fulvio, La Magna, Antonino

    Published in Japanese Journal of Applied Physics (01-12-2019)
    “…The impact of solidification front velocity (SFV) on dopant segregation and activation surpassing the equilibrium solid solubility limit was investigated in…”
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    Journal Article
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    Multiscale modeling of ultrafast melting phenomena by Calogero, Gaetano, Raciti, Domenica, Acosta-Alba, Pablo, Cristiano, Fuccio, Deretzis, Ioannis, Fisicaro, Giuseppe, Huet, Karim, Kerdilès, Sébastien, Sciuto, Alberto, La Magna, Antonino

    Published in npj computational materials (11-03-2022)
    “…Ultraviolet Nanosecond Laser Annealing (LA) is a powerful tool for both fundamental investigations of ultrafast, nonequilibrium phase-change phenomena and…”
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    Journal Article
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    Excimer laser annealing for low-voltage power MOSFET by Chen, Yi, Okada, Tatsuya, Noguchi, Takashi, Mazzamuto, Fulvio, Huet, Karim

    Published in Japanese Journal of Applied Physics (01-08-2016)
    “…Excimer laser annealing of lumped beam was performed to form the P-base junction for high-performance low-voltage-power MOSFET. An equivalent shallow-junction…”
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    Journal Article
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    3D Simulation for Melt Laser Anneal Integration in FinFET's Contact by Tabata, Toshiyuki, Curvers, Benoit, Huet, Karim, Chew, Soon Aik, Everaert, Jean-Luc, Horiguchi, Naoto

    “…Process integration feasibility of UV nanosecond melt laser annealing (MLA) in 14 nm node generation FinFET's contact for dopant surface segregation and…”
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    Journal Article
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    Atomically Flat Low-Resistive Germanide Contacts Formed by Laser Thermal Anneal by Shayesteh, M., Huet, K., Toque-Tresonne, I., Negru, R., Daunt, C. L. M., Kelly, N., O'Connell, D., Yu, R., Djara, V., Carolan, P. B., Petkov, N., Duffy, R.

    Published in IEEE transactions on electron devices (01-07-2013)
    “…In this paper, state-of-the-art laser thermal annealing is used to form germanide contacts on n-doped Ge and is systematically compared with results generated…”
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    Journal Article
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    Doping of semiconductor devices by Laser Thermal Annealing by Huet, Karim, Mazzamuto, Fulvio, Tabata, Toshiyuki, Toqué-Tresonne, Ines, Mori, Yoshihiro

    “…In today's highly competitive semiconductor industry, and due to the accelerating pace of technology development, the integration of new and disruptive…”
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    Journal Article
  8. 8

    Investigation of oxygen penetration during UV nanosecond laser annealing of silicon at high energy densities by Monflier, R., Tabata, T., Rizk, H., Roul, J., Huet, K., Mazzamuto, F., Acosta Alba, P., Kerdilès, S., Boninelli, S., La Magna, A., Scheid, E., Cristiano, F., Bedel-Pereira, E.

    Published in Applied surface science (30-04-2021)
    “…[Display omitted] •Oxygen and carbon impurities diffusion during melt laser annealing.•Identification and localization of optical defects signatures.•Impact of…”
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    Journal Article
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    Extended Defects Formation in Nanosecond Laser-Annealed Ion Implanted Silicon by Qiu, Yang, Cristiano, Fuccio, Huet, Karim, Mazzamuto, Fulvio, Fisicaro, Giuseppe, La Magna, Antonino, Quillec, Maurice, Cherkashin, Nikolay, Wang, Huiyuan, Duguay, Sébastien, Blavette, Didier

    Published in Nano letters (09-04-2014)
    “…Damage evolution and dopant distribution during nanosecond laser thermal annealing of ion implanted silicon have been investigated by means of transmission…”
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    Journal Article
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    Ultrafast Generation of Unconventional {001} Loops in Si by Marqués, Luis A, Aboy, María, Santos, Iván, López, Pedro, Cristiano, Fuccio, La Magna, Antonino, Huet, Karim, Tabata, Toshiyuki, Pelaz, Lourdes

    Published in Physical review letters (17-11-2017)
    “…Ultrafast laser annealing of ion implanted Si has led to thermodynamically unexpected large {001} self-interstitial loops, and the failure of Ostwald ripening…”
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    Journal Article
  12. 12

    Nickel silicide contacts formed by excimer laser annealing for high efficiency solar cells by Tous, Loic, Lerat, Jean-Francois, Emeraud, Thierry, Negru, Razvan, Huet, Karim, Uruena, Angel, Aleman, Monica, Meersschaut, Johan, Bender, Hugo, Russell, Richard, John, Joachim, Poortmans, Jef, Mertens, Robert

    Published in Progress in photovoltaics (01-05-2013)
    “…ABSTRACT Driven by the relatively high cost of silver (Ag), interest has grown in the photovoltaic (PV) industry to substitute conventional screen printed (SP)…”
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    Journal Article
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    Nanoscale measurements of phosphorous-induced lattice expansion in nanosecond laser annealed germanium by Boninelli, S., Milazzo, R., Carles, R., Houdellier, F., Duffy, R., Huet, K., La Magna, A., Napolitani, E., Cristiano, F.

    Published in APL materials (01-05-2018)
    “…Laser Thermal Annealing (LTA) at various energy densities was used to recrystallize and activate amorphized germanium doped with phosphorous by ion…”
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    Journal Article
  15. 15

    On the Ability of the Particle Monte Carlo Technique to Include Quantum Effects in Nano-MOSFET Simulation by Querlioz, D., Saint-Martin, J., Huet, K., Bournel, A., Aubry-Fortuna, V., Chassat, C., Galdin-Retailleau, S., Dollfus, P.

    Published in IEEE transactions on electron devices (01-09-2007)
    “…In this paper, we report on the possibility of using particle-based Monte Carlo (MC) techniques to incorporate all relevant quantum effects in the simulation…”
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    Journal Article
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    Investigation of the enlargement of Ru grains and failure modes analysis in microsecond UV laser annealing by Chehadi, Zeinab, Daubriac, Richard, Lu, Lu, Huet, Karim, Tokei, Zsolt, Cancellara, Leonardo, Cristiano, Fuccio, Thuries, Louis

    “…Interconnects based on Ru has been considered as a promising candidate to replace Cu-based interconnects for the future technology nodes thanks to its low bulk…”
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    Conference Proceeding
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    Recent Progresses and Perspectives of UV Laser Annealing Technologies for Advanced CMOS Devices by Tabata, Toshiyuki, Rozé, Fabien, Thuries, Louis, Halty, Sébastien, Raynal, Pierre-Edouard, Karmous, Imen, Huet, Karim

    Published 12-09-2022
    “…The state-of-the-art CMOS technology has started to adopt three-dimensional (3D) integration approaches, enabling continuous chip density increment and…”
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    Microsecond non-melt UV laser annealing for future 3D-stacked CMOS by Tabata, Toshiyuki, Rozé, Fabien, Thuries, Louis, Halty, Sebastien, Raynal, Pierre-Edouard, Huet, Karim, Mazzamuto, Fulvio, Joshi, Abhijeet, Basol, Bulent M, Alba, Pablo Acosta, Kerdilès, Sébastien

    Published 10-05-2022
    “…Three-dimensional (3D) CMOS technology encourages the use of UV laser annealing (UV-LA) because the shallow absorption of UV light into materials and the…”
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    Journal Article
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    Super Activation of Highly Surface Segregated Dopants in High Ge Content SiGe Obtained by Melt UV Laser Annealing by Tabata, Toshiyuki, Aubin, Joris, Huet, Karim, Mazzamuto, Fulvio, Mori, Yoshihiro, La Magna, Antonino, Rubin, Leonard M., Kopalidis, Petros, Tsai, Hao-Cheng, Roh, Dwight, Reece, Ronald

    “…Activation of surface segregated dopants above the solid solubility limit in a high Ge content SiGe substrate has been demonstrated by nanosecond melt UV laser…”
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    Conference Proceeding