Influence of the formation conditions of TiN coatings on their electrochemical behaviour in sulphuric acid and sodium chloride solutions
The corrosion protective properties of TiN coatings deposited on low carbon and stainless steel substrates have been studied by electrochemical methods in 3% NaCl and 0.5 M H 2SO 4. The coatings have been deposited by arc plasma evaporation. The discharge current and N 2 pressure were varied in the...
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| Published in: | Thin solid films Vol. 295; no. 1; pp. 178 - 184 |
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| Main Authors: | , , |
| Format: | Journal Article |
| Language: | English |
| Published: |
Elsevier B.V
28-02-1997
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| Subjects: | |
| Online Access: | Get full text |
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| Summary: | The corrosion protective properties of TiN coatings deposited on low carbon and stainless steel substrates have been studied by electrochemical methods in 3% NaCl and 0.5 M H
2SO
4. The coatings have been deposited by arc plasma evaporation. The discharge current and N
2 pressure were varied in the range from 100 A to 160 A and from 5 × 10
−4 mbar to 8 × 10
−3 mbar respectively. Ion implantation of some thin coatings has been carried out with boron ions at doses 1 × 10
16, 5 × 10
16 and 1 × 10
17 ions cm
−2. The film structure has been analysed by X-ray diffraction and scanning electron microscopy.
Coatings thicker than 8
μm, deposited at nitrogen pressures of 1 × 10
−3 and 5 × 10
−4 mbar have some protective effect. TiN thin layers with thickness 4–5
μm accelerate the substrate dissolution in 0.5 M H
2SO
4. All TiN coatings reduce considerably the values of the anodic current density measured for the system “low-carbon steel substrate-TiN coating” in 3% NaCl and change the corrosion and the pitting formation potentials to more positive values. Implantation of thin titanium nitride coatings shows negligible positive effect on the electrochemical behaviour. |
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| ISSN: | 0040-6090 1879-2731 |
| DOI: | 10.1016/S0040-6090(96)09207-3 |