A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography

A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography

An ultra-short pulsed, ultra-broadband (∼ 13run-∼13 μm) light-source has been developed to drive atto- to femto- second time-resolved studies on EUV photo-resist materials. The same source will also be used to investigate EUV driven nano-lithography.

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Bibliographic Details
Published in:2020 Conference on Lasers and Electro-Optics (CLEO) pp. 1 - 2
Main Authors: Cousin, Seth L., Bargsten, Clayton, Rinard, Eric, Ward, Rod, Hosier, Erik, Petersen, Brennan, Kapteyn, Henry, Vanelderen, Pieter, Petersen, John, van der Heide, Paul
Format: Conference Proceeding
Language:English
Published: OSA 01-05-2020
Subjects:
Physics
Online Access:Get full text
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Description
Summary:An ultra-short pulsed, ultra-broadband (∼ 13run-∼13 μm) light-source has been developed to drive atto- to femto- second time-resolved studies on EUV photo-resist materials. The same source will also be used to investigate EUV driven nano-lithography.
DOI:10.1364/CLEO_AT.2020.ATh1K.5