Search Results - "Horn, M.W."

A review of tin (II) monosulfide and its potential as a photovoltaic absorber by Banai, R.E., Horn, M.W., Brownson, J.R.S.

“…Research groups around the world are investigating tin (II) monosulfide (SnS) via various deposition methods and heterostructures for thin film solar cells…”
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Dielectric Response of Tantalum Oxide Deposited on Polyethylene Terephthalate (PET) Film by Low-Temperature Pulsed-DC Sputtering for Wound Capacitors by Sethi, G., Sahul, R., Min, C., Tewari, P., Furman, E., Horn, M.W., Lanagan, M.T.

“…Deposition of high-k tantalum oxide thin films on thin polymer substrates was investigated, using low-temperature (-100degC) pulsed-dc reactive sputtering…”
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Control of Phase in Tin Sulfide Thin Films Produced via RF-Sputtering of SnS2 Target with Post-deposition Annealing by Banai, R.E., Cordell, J.C., Lindwall, G., Tanen, N.J., Shang, S.-L., Nasr, J.R., Liu, Z.-K., Brownson, J.R. S., Horn, M.W.

“…Tin (II) Monosulfide (SnS) has become an interesting new material for thin film photovoltaics. SnS-based devices have achieved limited success in improved…”
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Optical properties of transparent conducting oxide sculptured thin films for application in thin film silicon photovoltaics by Podraza, N.J., Chi Chen, Flores, J.M., Sainju, D., An, I., Ferreira, G.M., Wronski, C.R., Horn, M.W., Messier, R., Collins, R.W.

“…Oxide thin films serving dual roles of transparent conductor and optical filter have been proposed on the basis of the sculptured thin film (STF) concept. This…”
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The ultimate in real-time ellipsometry: Multichannel Mueller matrix spectroscopy by Chen, Chi, Horn, M.W., Pursel, Sean, Ross, C., Collins, R.W.

“…A review of the techniques and applications of multichannel ellipsometry in the dual-rotating-compensator configuration is given. This ellipsometric approach…”
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Utilizing self-assembled multilayers in lithographic processing for nanostructure fabrication: Initial evaluation of the electrical integrity of nanogaps by Anderson, M.E., Srinivasan, Charan, Jayaraman, Raviprakesh, Weiss, P.S., Horn, M.W.

“…We apply self-assembly to form multilayers on gold structures formed by lithographic techniques to create patterns with spacings in the 10–100 nm regime…”
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Roughness and Phase Evolution in Si1-xGex:H: Guidance for Multijunction Photovoltaics by Podraza, N.J., Wronski, C.R., Horn, M.W., Collins, R.W.

“…In this study, the amorphous-phase roughening transition thickness has been determined as a function of process variables in plasma-enhanced chemical vapor…”
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193-nm lithography by Rothschild, M., Forte, A.R., Horn, M.W., Kunz, R.R., Palmateer, S.C., Sedlacek, J.H.C.

“…The trend in microelectronics toward printing features 0.25 /spl mu/m and below has motivated the development of lithography at the 193-nm wavelength of argon…”
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Amorphous carbon films as planarization layers deposited by plasma-enhanced chemical vapor deposition by Pang, S.W., Horn, M.W.

“…A dry planarization process utilizing plasma-enhanced chemical vapor deposition (PECVD) of amorphous carbon (a-C:H) films has been developed. The degree of…”
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Structure and dielectric properties of amorphous tantalum pentoxide thin film capacitors by Sethi, G., Olszta, M., Jing Li, Sloppy, J., Horn, M.W., Dickey, E.C., Lanagan, M.T.

“…Amorphous tantalum pentoxide films are currently being studied as a high-k dielectric for high energy-density metal-insulator-metal capacitors. Tantalum…”
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Hardening process for plasma deposited planar amorphous carbon films used in bilayer resists by Pang, S.W., Goodman, R.B., Horn, M.W.

“…A dry planarization process has been developed to produce planar amorphous carbon (a-C:H) films. These films provide a high degree of planarization over large…”
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Planarizing a-C:H and SiO/sub 2/ films prepared by bias electron cyclotron resonance plasma deposition by Horn, M.W., Pang, S.W., Rothschild, M.

“…Room-temperature bias electron cyclotron resonance plasma deposition of both carbon- and silicon-based planarization materials has been demonstrated…”
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