Search Results - "Hong, MunPyo"
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Digital Interventions for Reducing Loneliness and Depression in Korean College Students: Mixed Methods Evaluation
Published in JMIR formative research (12-09-2024)“…The COVID-19 pandemic has exacerbated the prevalence of loneliness and depression among college students. Digital interventions, such as Woebot (Woebot Health,…”
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Poly(3,4-ethylenedioxythiophene) Derived from Poly(ionic liquid) for the Use as Hole-Injecting Material in Organic Light-Emitting Diodes
Published in Macromolecular rapid communications. (01-09-2009)“…We report that poly(3,4‐ethylenedioxythiophene) derived from poly(ionic liquid) (PEDOT:PIL) constitutes a unique polymeric hole‐injecting material capable of…”
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Effect of boron and silicon doping on the surface and electrical properties of diamond like carbon films by magnetron sputtering technique
Published in Surface & coatings technology (01-09-2013)Get full text
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Low-temperature fabrication (<150 °C) of amorphous IGZO TFTs via high density CVD and superimposed rf/dc magnetron sputtering
Published in Current applied physics (20-12-2012)“…This paper presents a low temperature fabrication of amorphous IGZO TFTs (a-IGZO TFTs) via high density CVD and superimposed rf/dc magnetron sputtering below…”
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Reactive particle beam based deposition process of nano-crystalline silicon thin film at low temperature for the flexible AM-OLED backplane
Published in Thin solid films (01-09-2010)“…A novel deposition process for depositing nano-crystalline silicon (nc-Si) thin films at low temperature was developed using reactive particle beam assisted…”
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The deposition of amorphous carbon thin films for hard mask applications by reactive particle beam assisted sputtering process
Published in Thin solid films (29-05-2009)“…In this work, amorphous carbon thin films for hard mask applications were deposited by a reactive particle beam (RPB) assisted sputtering system at room…”
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Development of higher performance indium tin oxide films at a very low temperature (< 80 °C) by the neutral beam-assisted sputtering process
Published in Thin solid films (31-01-2011)“…At very low temperatures (< 80 °C), improved performance indium tin oxide (ITO) thin films with a low resistivity of 4.22 × 10 −4 Ωcm and high transmittance >…”
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Study of the inductively coupled plasma assisted DC magnetron sputtering (ICPDMS) during ITO deposition
Published in Thin solid films (29-05-2009)“…An inductively coupled plasma (ICP) assisted DC magnetron sputtering (ICPDMS) method for the deposition of indium tin oxide (ITO) thin films was developed to…”
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9
Depletion-mode TFT made of low-temperature poly-Si
Published in IEEE transactions on electron devices (01-05-2006)“…This brief reports the fabrication and characterization of a depletion-mode p-channel low-temperature polycrystalline silicon (poly-Si) thin-film transistor…”
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Etch mechanism of In2O3 and SnO2 thin films in HBr-based inductively coupled plasmas
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-03-2010)“…The investigations of etch characteristics and mechanisms for both In2O3 and SnO2 thin films in the HBr-based inductively coupled plasmas were carried out. The…”
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Development and Evaluation of a Mental Health Chatbot Using ChatGPT 4.0: Pilot Study of Dr. CareSam with Korean Users (Preprint)
Published in JMIR medical informatics (23-06-2024)Get full text
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Proposal of Fast-Moving Ball Actuator Mode for Electronic-Paper Displays
Published in Japanese Journal of Applied Physics (01-03-2011)“…We propose a new display mode using a fast-moving ball actuator (FMBA) for reflective electronic paper displays. To realize ball position stability, we…”
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Proposal of Fast-Moving Ball Actuator Mode for Electronic-Paper Displays
Published in Japanese Journal of Applied Physics (01-03-2011)Get full text
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14
New approaches for high doping and high crystal fraction in the mixed phase nano-crystal silicon thin film with low angle laterally grown grain by near room temperature deposition process with neutral beam assisted CVD
Published in 2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) (01-06-2013)“…The NBaCVD system can control the crystalline phase and the doping efficiency simultaneously by the energy of impinge neutral particles. During the deposition…”
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Conference Proceeding -
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Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl2/Ar and BCl3/Ar Inductively Coupled Plasmas
Published in Jpn J Appl Phys (01-08-2010)“…This paper reports the results of a model-based analysis of the etch mechanism for the Y 2 O 3 thin films in the Cl 2 /Ar and BCl 3 /Ar inductively coupled…”
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A single gas barrier layer of high-density Al2O3 formed by neutral beam-assisted sputtering at room temperature
Published in Thin solid films (31-03-2019)“…This paper reveals the formation of high-density Al2O3 thin films at low temperatures for inorganic gas barriers using neutral beam-assisted sputtering (NBAS)…”
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Novel Carbazole-Based Hole-Transporting Materials with Star-Shaped Chemical Structures for Perovskite-Sensitized Solar Cells
Published in ACS applied materials & interfaces (14-10-2015)“…Novel carbazole-based hole-transporting materials (HTMs), including extended π-conjugated central core units such as 1,4-phenyl, 4,4′-biphenyl, or…”
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Stoichiometric silicon nitride thin films for gas barrier, with applications to flexible and stretchable OLED encapsulation
Published in Applied physics letters (03-05-2021)“…This study reveals that the stoichiometricity of silicon nitride thin films (SiNx-TFs) significantly governs the packing density and water vapor transmission…”
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Analysis of deformation of thin polyimide film by pre-strained silicone elastomer
Published in Materials today communications (01-03-2024)“…In this study, we analyze the deformation of the thin polyimide (PI) film on the pre-strained elastomer. When pre-strained elastomer bonded with…”
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3.3: Large Area Full Color Transmissive a-Si TFT-LCD Using Low Temperature Processes on Plastic Substrate
Published in SID International Symposium Digest of technical papers (01-05-2005)“…A 5.0‐inch transmissive type plastic TFT‐LCD was developed at the resolution of 400 × 3 × 300 lines (100ppi). All of the processes of TFT, color filter and LC…”
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