Search Results - "Holland, A.S."
-
1
Accurate Estimation of Low ( ≪ \hbox^\ \Omega \cdot \hbox^) Values of Specific Contact Resistivity
Published in IEEE electron device letters (01-03-2008)“…Advancements in nanotechnology have created the need for efficient means of communication of electrical signals to nanostructures, which can be addressed using…”
Get full text
Journal Article -
2
Analytical and Finite-Element Modeling of a Cross Kelvin Resistor Test Structure for Low Specific Contact Resistivity
Published in IEEE transactions on electron devices (01-10-2009)“…Various test structures have been employed to determine the specific contact resistivity (rho c ) of ohmic contacts, and cross Kelvin resistor (CKR) test…”
Get full text
Journal Article -
3
Universal error corrections for finite semiconductor resistivity in cross-Kelvin resistor test structures
Published in IEEE transactions on electron devices (01-06-2004)“…The Cross-Kelvin Resistor test structure is commonly used for the extraction of the specific contact resistance of ohmic contacts. Analysis using this…”
Get full text
Journal Article -
4
Rectifying electrical contacts to n-type 6H–SiC formed from energetically deposited carbon
Published in Carbon (New York) (01-06-2016)“…Electrical contacts to n-type 6H–SiC deposited from carbon fluxes with differing energies (0.12–1.0 keV) have exhibited deposition energy dependent…”
Get full text
Journal Article -
5
Degassing processes during lava dome growth: Insights from Santiaguito lava dome, Guatemala
Published in Journal of volcanology and geothermal research (30-04-2011)“…Eruptions of intermediate magma may be explosive or effusive. The development of open system degassing has been proposed as a pre-requisite for effusion of…”
Get full text
Journal Article -
6
Simulation of graphitic contacts to p‐type Si using a metal‐resistor‐semiconductor (M‐R‐S) model implemented in TCAD
Published in International journal of numerical modelling (01-05-2018)“…In this paper, we describe simulations of highly rectifying carbon/p‐Si junctions using Sentaurus TCAD from Synopsys. 2‐D and 3‐D models were constructed and…”
Get full text
Journal Article -
7
In situ micro-Raman analysis and X-ray diffraction of nickel silicide thin films on silicon
Published in Micron (Oxford, England : 1993) (2009)“…This article reports on the in situ analysis of nickel silicide (NiSi) thin films formed by thermal processing of nickel thin films deposited on silicon…”
Get full text
Journal Article -
8
Effect of multi-layered bottom electrodes on the orientation of strontium-doped lead zirconate titanate thin films
Published in Thin solid films (30-09-2008)“…This article discusses the results from X-ray diffraction (XRD) analysis of piezoelectric strontium-doped lead zirconate titanate (PSZT) thin films deposited…”
Get full text
Journal Article Conference Proceeding -
9
SAW-based gas sensors with rf sputtered InOx and PECVD SiNx films: Response to H2 and O3 gases
Published in Sensors and actuators. B, Chemical (25-10-2006)“…Surface acoustic wave (SAW)-based sensors, with InOx and SiNx layers on 36° YX LiTaO3 substrates were investigated for the detection of hydrogen (H2) and ozone…”
Get full text
Journal Article -
10
Patterning of PLZT and PSZT thin films by excimer laser
Published in Applied physics. A, Materials science & processing (01-06-2008)“…The patterning of lanthanum-doped lead zirconate titanate (PLZT) and strontium-doped lead zirconate titanate (PSZT) thin films has been examined using a 5-ns…”
Get full text
Journal Article -
11
Characterisation of nickel silicide thin films by spectroscopy and microscopy techniques
Published in Micron (Oxford, England : 1993) (2009)“…This article discusses the formation and detailed materials characterisation of nickel silicide thin films. Nickel silicide thin films have been formed by…”
Get full text
Journal Article -
12
Influence of oxygen partial pressure on the composition and orientation of strontium-doped lead zirconate titanate thin films
Published in Micron (Oxford, England : 1993) (2009)“…The influence of oxygen partial pressure during the deposition of piezoelectric strontium-doped lead zirconate titanate thin films is reported. The thin films…”
Get full text
Journal Article -
13
SAW-based gas sensors with rf sputtered InO x and PECVD SiN x films: Response to H 2 and O 3 gases
Published in Sensors and actuators. B, Chemical (2006)“…Surface acoustic wave (SAW)-based sensors, with InO x and SiN x layers on 36° YX LiTaO 3 substrates were investigated for the detection of hydrogen (H 2) and…”
Get full text
Journal Article -
14
Microstructural investigation of nickel silicide thin films and the silicide–silicon interface using transmission electron microscopy
Published in Micron (Oxford, England : 1993) (2009)“…This article discusses the results of transmission electron microscopy (TEM)-based investigation of nickel silicide (NiSi) thin films grown on silicon. Nickel…”
Get full text
Journal Article -
15
Thin film piezoelectric response characterisation using atomic force microscopy with standard contact mode imaging
Published in Micron (Oxford, England : 1993) (2009)“…This article introduces a technique for observing and quantifying the piezoelectric response of thin films, using standard atomic force microscopes (AFMs). The…”
Get full text
Journal Article -
16
Ion beam etching of CVD diamond film in Ar, Ar/O2 and Ar/CF4 gas mixtures
Published in Diamond and related materials (01-03-2002)“…The Ar+ ion beam etching of diamond in the presence of O2 or CF4 gases was examined as a function of ion energy and gas composition. The details of etch rate…”
Get full text
Journal Article Conference Proceeding -
17
Frequency Agile 90° Hybrid Coupler Using Barium Strontium Titanate Varactors
Published in 2007 IEEE/MTT-S International Microwave Symposium (01-06-2007)“…This paper presents a tunable quadrature hybrid coupler realized using integrated lumped components. The centre frequency of the hybrid is tuned by controlling…”
Get full text
Conference Proceeding -
18
Effect of prior C, Si and Sn implantation on the etch rate of CVD diamond
Published in Diamond and related materials (01-09-2006)“…Diamond films were implanted with C +, Si + or Sn + ions at multiple energies in order to generate a uniform layer of implantation-induced disorder. The…”
Get full text
Journal Article -
19
New challenges to the modelling and electrical characterisation of ohmic contacts for ULSI devices
Published in Microelectronics and reliability (01-06-2000)“…Continuing developments in semiconductor process and materials technology have enabled significant reductions to be achieved in the contact resistance R c of…”
Get full text
Journal Article -
20
Enhancement of the etch rate of CVD diamond by prior C and Ge implantation
Published in Diamond and related materials (01-03-2002)“…Polycrystalline diamond films have been irradiated with C+ or Ge+ ions at doses in the range 5×1013–5×1015 ions/cm2. Analysis of the implanted surfaces by…”
Get full text
Journal Article Conference Proceeding