Formation of (100)-Textured Si Film Using an Excimer Laser on a Glass Substrate

Formation of (100)-Textured Si Film Using an Excimer Laser on a Glass Substrate

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Bibliographic Details
Published in:Japanese Journal of Applied Physics Vol. 42; no. Part 2, No. 2B; pp. L135 - L137
Main Authors: Gosain, Dharam Pal, Machida, Akio, Fujino, Toshio, Hitsuda, Yukihisa, Nakano, Kazushi, Sato, Junichi
Format: Journal Article
Language:English
Published: 15-02-2003
Online Access:Get full text
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Description
ISSN:0021-4922
DOI:10.1143/JJAP.42.L135