Accurate topographic images using a measuring atomic force microscope

A real-time measuring atomic force microscope (AFM) equipped with a high-resolution three-axis laser interferometer has been constructed. A three-sided mirror as a sample holder is placed on a three-dimensional (3D) scanner which was designed for axis-independent scanning. The mirror is scanned so t...

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Bibliographic Details
Published in:	Applied surface science Vol. 144; pp. 505 - 509
Main Authors:	Gonda, S, Doi, T, Kurosawa, T, Tanimura, Y, Hisata, N, Yamagishi, T, Fujimoto, H, Yukawa, H
Format:	Journal Article Conference Proceeding
Language:	English
Published:	Amsterdam Elsevier B.V 01-04-1999 Elsevier Science
Subjects:	AFM (atomic force microscope) Atomic force microscopes Calibration Exact sciences and technology Instruments, apparatus, components and techniques common to several branches of physics and astronomy Interferometry Nanometrology Physics Scanning probe microscopes, components and techniques AFM (atomic force microscope) Nanometrology 06 07.79.−v Calibration 07.79.Lh Interferometry 42.60.−v APN Light interferometers Atomic force microscopy Measurement systems Experimental study Real time Nanotechnology
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Summary:	A real-time measuring atomic force microscope (AFM) equipped with a high-resolution three-axis laser interferometer has been constructed. A three-sided mirror as a sample holder is placed on a three-dimensional (3D) scanner which was designed for axis-independent scanning. The mirror is scanned so that the cantilever traces the surface form. The traces of the mirror are monitored along the X/ Y/ Z-axis independently and simultaneously by the laser interferometers and fed back to the X– Y servo-scan and Z-height control. Each interferometer unit has a four-pass optical arrangement and homodyne detection system. After the digital signal processing of the four-phase output (phase-shifted by 90°) from the detectors, the signal is introduced into a fringe counter, which has an electrical phase resolution of 2048. A final system resolution of 0.04 nm ( λ/16 384) has been realized. Topographic images of a standard sample of a precisely etched grid pattern (pitch and height) were taken with an without interferometric calibration. Piezo distortions along the X– Y plane caused by hysteresis or creep were almost eliminated.
Bibliography:	SourceType-Scholarly Journals-2 ObjectType-Feature-2 ObjectType-Conference Paper-1 content type line 23 SourceType-Conference Papers & Proceedings-1 ObjectType-Article-3
ISSN:	0169-4332 1873-5584
DOI:	10.1016/S0169-4332(98)00851-4