Search Results - "Hetzer, Dave"
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Material and process improvements towards sub 36nm pitch EUV single exposure
Published in 2019 IEEE Albany Nanotechnology Symposium (ANS) (01-11-2019)“…With the insertion of EUV lithography into high volume manufacturing, mature lithographic materials and processes are required on multiple fronts. Not only do…”
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Conference Proceeding -
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Integrated ODP metrology as an APC enabler for complex high aspect ratio 3D deep trench device structures
Published in 2006 IEEE International Symposium on Semiconductor Manufacturing (01-09-2006)“…The current technology node and the complexity of device design and processing demand metrology systems that can provide profile and underlying layer…”
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Conference Proceeding -
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Hot melt ink technology for crystalline silicon solar cells
Published in Conference Record of the Twenty-Ninth IEEE Photovoltaic Specialists Conference, 2002 (2002)“…This paper presents a new thick film system for forming front and rear contacts on crystalline solar cells; the aim is to improve manufacturing throughput,…”
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Conference Proceeding