Search Results - "Hershkowitz, N."

Kinetic theory of plasma sheaths surrounding electron-emitting surfaces by Sheehan, J P, Hershkowitz, N, Kaganovich, I D, Wang, H, Raitses, Y, Barnat, E V, Weatherford, B R, Sydorenko, D

“…A one-dimensional kinetic theory of sheaths surrounding planar, electron-emitting surfaces is presented which accounts for plasma electrons lost to the surface…”
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First experimental measurements of the plasma potential throughout the presheath and sheath at a boundary in a weakly collisional plasma by Oksuz, L, Hershkowitz, N

“…Experimental data obtained with emissive probes and Langmuir probes show that the plasma potential profile in the presheath scales as -ephi /T(e)= sqrt[(x(0)…”
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Experimental studies of the Bohm criterion in a two-ion-species plasma using laser-induced fluorescence by Severn, G D, Wang, Xu, Ko, Eunsuk, Hershkowitz, N

“…The Bohm criterion is studied experimentally in the case of a two ion species plasma. Measurements are carried out in Ar and Ar+He plasmas (PA(r I)…”
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Microdischarge propagation and expansion in a surface dielectric barrier discharge by Hoskinson, A. R., Oksuz, L., Hershkowitz, N.

“…We have recorded light emission from a surface dielectric barrier discharge with one exposed and one insulated electrode using an intensified digital camera…”
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Comment on "Ar+ and Xe+ velocities near the presheath-sheath boundary in an Ar/Xe discharge" by Hershkowitz, N, Severn, G D, Baalrud, S D, Hegna, C C, Callen, J D

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Coaxial rf atmospheric pressure dielectric barrier air–helium plasma characteristics by Gulec, A., Oksuz, L., Hershkowitz, N.

“…The electrical and optical characteristics of a coaxial rf atmospheric pressure dielectric barrier discharge (DBD) with one electrode covered with glass and…”
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Role of plasma-aided manufacturing in semiconductor fabrication by Hershkowitz, N.

“…A brief review is presented of the application of plasma-aided manufacturing to semiconductor fabrication. Emphasis is placed on current state-of-the-art…”
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Ion flow and sheath physics studies in multiple ion species plasmas using diode laser based laser-induced fluorescence by Severn, G.D., Wang, Xu, Ko, Eunsuk, Hershkowitz, N., Turner, M.M., McWilliams, R.

“…Diode lasers have proved to be a valuable light source for laser-induced fluorescence (LIF) measurements for plasma science since the early 1990s, and they…”
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Presheath environment in weakly ionized single and multispecies plasmas by Hershkowitz, N., Ko, E., Xu Wang, Hala, A.M.A.

“…The presheath located near boundaries in weakly ionized plasmas is a rich environment in which charge exchange, and ion-ion streaming instabilities combine to…”
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Early anoxia-induced vesicular glutamate release results from mobilization of calcium from intracellular stores by Katchman, A N, Hershkowitz, N

“…1. The cause of the increased frequency of glutamatergic miniature excitatory postsynaptic currents (mEPSCs) resulting from anoxia was investigated in CA1…”
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How does the potential get from A to B in a plasma? by Hershkowitz, N.

“…Solutions to the question of how the plasma potential varies from point A to point B, at which the values are specified, are discussed. Each answer depends on…”
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Deposition of highly hydrogenated carbon films by a modified plasma assisted chemical vapor deposition technique by Shi, B., Meng, W.J., Evans, R.D., Hershkowitz, N.

“…Highly hydrogenated carbon films, with hydrogen content approaching 60 at.%, were deposited with a modified, inductively coupled plasma (ICP) assisted,…”
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43 years of fun basic plasma physics experiments by Hershkowitz, Noah

“…This paper presents an overview of some of the most enjoyable low-temperature plasma experiments I have carried out with my students over the course of my…”
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Site of synaptic depression during hypoxia: a patch-clamp analysis by Hershkowitz, N, Katchman, A N, Veregge, S

“…1. The effect of hypoxia on synaptic physiology was investigated in hippocampal slices from 16- to 23-day-old rats. CA1 pyramidal cells were examined by whole…”
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Experimental Observation of rf Driven Plasma Flow in the Phaedrus-T Tokamak by Wukitch, S, Litwin, C, Harper, M, Parker, R, Hershkowitz, N

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Review of recent laboratory double layer experiments by Hershkowitz, N.

“…Recent laboratory measurements of double layers are reviewed. Most experiments that are considered employed triple plasma devices or Q-machines. It is shown…”
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Etching rate characterization of SiO2 and Si using ion energy flux and atomic fluorine density in a CF4/O2/Ar electron cyclotron resonance plasma by Ding, J., Jenq, J.‐S., Kim, G.‐H., Maynard, H. L., Hamers, J. S., Hershkowitz, N., Taylor, J. W.

“…SiO2 and Si etching in a CF4/O2/Ar plasma has been carried out in an electron cyclotron resonance etcher over a wide range of conditions. The etch rate has…”
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Magnetic-field-enhanced rf argon plasma for ionized sputtering of copper by Wang, W., Foster, J., Wendt, A. E., Booske, J. H., Onuoha, T., Sandstrom, P. W., Liu, H., Gearhart, S. S., Hershkowitz, N.

“…A multipole magnetic field was used to increase the ion density of an inductively coupled rf (13.5 MHZ) argon plasma for ionized magnetron sputtering of copper…”
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Wide Solitons in an Ion-Beam-Plasma System by Lee, S, Diebold, DA, Hershkowitz, N, Moroz, P

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Plasma characterization and process control diagnostics by Hershkowitz, N., Maynard, H. L.

“…Diagnostics are needed both for plasma characterization and for plasma processing control. Normally, different diagnostics are employed. Process control relies…”
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