Search Results - "Heikman, S."

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  1. 1

    A 97.8% Efficient GaN HEMT Boost Converter With 300-W Output Power at 1 MHz by Yifeng Wu, Jacob-Mitos, M., Moore, M.L., Heikman, S.

    Published in IEEE electron device letters (01-08-2008)
    “…A 175-to-350 V hard-switched boost converter was constructed using a high-voltage GaN high-electron-mobility transistor grown on SiC substrate. The high speed…”
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    Journal Article
  2. 2

    High breakdown voltage AlGaN-GaN HEMTs achieved by multiple field plates by Huili Xing, Dora, Y., Chini, A., Heikman, S., Keller, S., Mishra, U.K.

    Published in IEEE electron device letters (01-04-2004)
    “…High-voltage Al/sub 0.22/Ga/sub 0.78/N-GaN high-electron mobility transistors have been fabricated using multiple field plates over dielectric passivation…”
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    Journal Article
  3. 3

    AlGaN/GaN high electron mobility transistors with InGaN back-barriers by Palacios, T., Chakraborty, A., Heikman, S., Keller, S., DenBaars, S.P., Mishra, U.K.

    Published in IEEE electron device letters (01-01-2006)
    “…A GaN/ultrathin InGaN/GaN heterojunction has been used to provide a back-barrier to the electrons in an AlGaN/GaN high-electron mobility transistor (HEMT). The…”
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    Journal Article
  4. 4

    AlGaN/AlN/GaN high-power microwave HEMT by Shen, L., Heikman, S., Moran, B., Coffie, R., Zhang, N.-Q., Buttari, D., Smorchkova, I.P., Keller, S., DenBaars, S.P., Mishra, U.K.

    Published in IEEE electron device letters (01-10-2001)
    “…In this letter, a novel heterojunction AlGaN/AlN/GaN high-electron mobility transistor (HEMT) is discussed. Contrary to normal HEMTs, the insertion of the very…”
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    Journal Article
  5. 5

    Power and linearity characteristics of field-plated recessed-gate AlGaN-GaN HEMTs by Chini, A., Buttari, D., Coffie, R., Shen, L., Heikman, S., Chakraborty, A., Keller, S., Mishra, U.K.

    Published in IEEE electron device letters (01-05-2004)
    “…Record power density and high-efficiency operation with AlGaN-GaN high-electron mobility transistor (HEMT) devices have been achieved by adopting a…”
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    Journal Article
  6. 6

    Effect of ohmic contacts on buffer leakage of GaN transistors by Dora, Y., Chakraborty, A., Heikman, S., McCarthy, L., Keller, S., DenBaars, S.P., Mishra, U.K.

    Published in IEEE electron device letters (01-07-2006)
    “…The effect of ohmic contacts on the buffer leakage of GaN transistors is presented. The buffer leakage for AlGaN/GaN high-electron mobility transistors and GaN…”
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    Journal Article
  7. 7

    High-power polarization-engineered GaN/AlGaN/GaN HEMTs without surface passivation by Shen, L., Coffie, R., Buttari, D., Heikman, S., Chakraborty, A., Chini, A., Keller, S., DenBaars, S.P., Mishra, U.K.

    Published in IEEE electron device letters (01-01-2004)
    “…In this paper, a high-power GaN/AlGaN/GaN high electron mobility transistor (HEMT) has been demonstrated. A thick cap layer has been used to screen surface…”
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    Journal Article
  8. 8

    A high-efficiency class-E GaN HEMT power amplifier at 1.9 GHz by Hongtao Xu, Gao, S., Heikman, S., Long, S.I., Mishra, U.K., York, R.A.

    “…A single stage class-E power amplifier in GaN high electron mobility transistor (HEMT) technology is reported. The circuit operates at 1.9 GHz. At 30-V drain…”
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    Journal Article
  9. 9

    Use of double-channel heterostructures to improve the access resistance and linearity in GaN-based HEMTs by Palacios, T., Chini, A., Buttari, D., Heikman, S., Chakraborty, A., Keller, S., DenBaars, S.P., Mishra, U.K.

    Published in IEEE transactions on electron devices (01-03-2006)
    “…Double-channel structures have been used in AlGaN/GaN high electron mobility transistors to reduce the access resistance. Carrier densities as high as 2.9/spl…”
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    Journal Article
  10. 10

    High breakdown GaN HEMT with overlapping gate structure by Zhang, N.-Q., Keller, S., Parish, G., Heikman, S., DenBaars, S.P., Mishra, U.K.

    Published in IEEE electron device letters (01-09-2000)
    “…GaN high electron mobility transistors (HEMTs) were fabricated using an overlapping-gate technique in which the drain-side edge of the metal gate overlaps on a…”
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    Journal Article
  11. 11

    p-capped GaN-AlGaN-GaN high-electron mobility transistors (HEMTs) by Coffie, R., Buttari, D., Heikman, S., Keller, S., Chini, A., Shen, L., Mishra, U.K.

    Published in IEEE electron device letters (01-10-2002)
    “…A novel p-capped GaN-AlGaN-GaN high-electron mobility transistor has been developed to minimize radio-frequency-to-dc (RF-DC) dispersion before passivation…”
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    Journal Article
  12. 12

    Growth and characteristics of Fe-doped GaN by Heikman, S., Keller, S., Mates, T., DenBaars, S.P., Mishra, U.K.

    Published in Journal of crystal growth (01-02-2003)
    “…The Fe doping of GaN by metalorganic chemical vapor deposition was studied. Si–Fe co-doping experiments revealed that the compensation activity of Fe was 34%…”
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    Journal Article Conference Proceeding
  13. 13

    Indium-surfactant-assisted growth of high-mobility AlN/GaN multilayer structures by metalorganic chemical vapor deposition by Keller, S., Heikman, S., Ben-Yaacov, I., Shen, L., DenBaars, S. P., Mishra, U. K.

    Published in Applied physics letters (19-11-2001)
    “…AlN/GaN single and multilayer structures with various AlN and GaN layer thicknesses were grown by metalorganic chemical vapor deposition. Step flow growth of…”
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    Journal Article
  14. 14

    Two-dimensional electron-gas AlN/GaN heterostructures with extremely thin AlN barriers by Smorchkova, I. P., Keller, S., Heikman, S., Elsass, C. R., Heying, B., Fini, P., Speck, J. S., Mishra, U. K.

    Published in Applied physics letters (11-12-2000)
    “…Plasma-assisted molecular-beam epitaxy is used to grow a set of two-dimensional electron-gas AlN/GaN structures with AlN barrier thicknesses varied between 24…”
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    Journal Article
  15. 15

    Power and linearity characteristics of GaN MISFETs on sapphire substrate by Chini, A., Wittich, J., Heikman, S., Keller, S., DenBaars, S.P., Mishra, U.K.

    Published in IEEE electron device letters (01-02-2004)
    “…The improvement of device performance arising from the adoption of a MIS gate structure in GaN field-effect transistor (FET) is presented. GaN MISFET/MESFET…”
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    Journal Article
  16. 16

    Systematic characterization of Cl2 reactive ion etching for improved ohmics in AlGaN/GaN HEMTs by Buttari, D., Chini, A., Meneghesso, G., Zanoni, E., Moran, B., Heikman, S., Zhang, N.Q., Shen, L., Coffie, R., DenBaars, S.P., Mishra, U.K.

    Published in IEEE electron device letters (01-02-2002)
    “…Pre-metal-deposition reactive ion etching (RIE) was performed on an Al/sub 0.3/Ga/sub 0.7/N/AlN/GaN heterostructure in order to improve the…”
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    Journal Article
  17. 17

    High linearity and high efficiency of class-B power amplifiers in GaN HEMT technology by Paidi, V., Shouxuan Xie, Coffie, R., Moran, B., Heikman, S., Keller, S., Chini, A., DenBaars, S.P., Mishra, U.K., Long, S., Rodwell, M.J.W.

    “…A 36-dBm high-linearity single-ended common-source class-B monolithic-microwave integrated-circuit power amplifier is reported in GaN high electron-mobility…”
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    Journal Article
  18. 18

    GaN–GaN junctions with ultrathin AlN interlayers: Expanding heterojunction design by Keller, S., Heikman, S., Shen, L., Smorchkova, I. P., DenBaars, S. P., Mishra, U. K.

    Published in Applied physics letters (10-06-2002)
    “…The formation of a two-dimensional electron gas (2DEG) was observed at GaN–GaN junctions, when an AlN layer of a thickness greater than or equal to 0.5 nm was…”
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    Journal Article
  19. 19

    A 3-10-GHz GaN-based flip-chip integrated broad-band power amplifier by Xu, J.J., Keller, S., Parish, G., Heikman, S., Mishra, U.K., York, R.A.

    “…In this paper, we report the latest progress of a GaN-based broad-band power amplifier using AlGaN/GaN high electron mobility transistors (HEMTs), grown on…”
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    Journal Article
  20. 20

    Vapor-phase epitaxy of gallium nitride by gallium arc discharge evaporation by Heikman, S., Keller, S., Mishra, U.K.

    Published in Journal of crystal growth (01-08-2006)
    “…Vapor-phase epitaxy of GaN was performed by combining ammonia with gallium evaporated into an inert gas stream by a DC arc discharge, and letting the mixture…”
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    Journal Article