Plasma characteristics in Ne/Xe/HCl gas mixtures: A parametric study
An important class of exciplex molecules consists of rare gas halides (RgH) such as the monochloride of xenon (XeCl). This excimer emits photons with energies of about eV at wavelength of 308 nm. The present work examines the effects of external circuit parameters and total gas pressure on the chara...
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Published in: | Materials today : proceedings Vol. 49; pp. 970 - 975 |
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Main Authors: | , , , |
Format: | Journal Article |
Language: | English |
Published: |
Elsevier Ltd
2022
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Subjects: | |
Online Access: | Get full text |
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Summary: | An important class of exciplex molecules consists of rare gas halides (RgH) such as the monochloride of xenon (XeCl). This excimer emits photons with energies of about eV at wavelength of 308 nm. The present work examines the effects of external circuit parameters and total gas pressure on the characteristic properties of excimer discharge plasma in Ne/Xe/HCl gas mixture. The numerical investigation is carried using a zero-dimensional model, in which the electric circuit, the kinetic processes in the active medium, and the electron Boltzmann equation are considered. We find that increasing values of capacitance, inductance, charging voltage, and gas pressure affects significantly the discharge plasma behavior. |
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ISSN: | 2214-7853 2214-7853 |
DOI: | 10.1016/j.matpr.2021.08.101 |