High throughput parallel micro and nano-scale replication - a low cost alternative for the fabrication of electronic-, optic- and microfluidic devices

Nanoimprint Lithography (NIL) is a fast replication technology for structures with sizes ranging from micrometers down to a few nanometers. This paper describes a novel approach for the simultaneous imprinting of multiple polymer substrates simultaneously with multiple polymer stamps defining a new...

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Bibliographic Details
Published in:	2012 12th IEEE International Conference on Nanotechnology (IEEE-NANO) pp. 1 - 7
Main Authors:	Kreindl, G., Miller, R., Thanner, C., Schachinger, M., Hangweier, P.
Format:	Conference Proceeding
Language:	English
Published:	IEEE 01-08-2012
Subjects:	Embossing Heating Manganese Photonics Substrates
Online Access:	Get full text
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Summary:	Nanoimprint Lithography (NIL) is a fast replication technology for structures with sizes ranging from micrometers down to a few nanometers. This paper describes a novel approach for the simultaneous imprinting of multiple polymer substrates simultaneously with multiple polymer stamps defining a new process modality called "Parallel Hot Embossing". This technique is demonstrated on both bulk thermoplastic materials as well as on spin-on polymers. High-aspect ratio, micro-scale features - as needed for microfluidic lab-on-chip applications - as well as high resolution features down to sub 50 nm - that can be used as etching templates for plasmonic or photonic structuring - are demonstrated.
ISBN:	9781467321983 1467321982
ISSN:	1944-9399 1944-9380
DOI:	10.1109/NANO.2012.6321935